公开(公告)号：EP3518040A1

公开(公告)日：2019-07-31

申请号：EP18154053.5

申请日：2018-01-30

Applicant: ASML Netherlands B.V.

Inventor： BIJNEN, Franciscus Godefridus Casper ,  HULSEBOS, Edo Maria

IPC: G03F7/20 ,  G03F9/00

Abstract: A measurement apparatus (10) and method for determining a substrate grid describing a deformation of a substrate (12) prior to exposure of the substrate (12) in a lithographic apparatus (LA) configured to fabricate one or more features on the substrate (12). Position data for a plurality of first features and/or a plurality of second features on the substrate (12) is obtained. Asymmetry data for at least a feature of the plurality of first features and/or the plurality of second features is obtained. The substrate grid based on the position data and the asymmetry data is determined. The substrate grid and asymmetry data is passed to the lithographic apparatus LA for controlling at least part of an exposure process to fabricate one or more features on the substrate (12).

公开(公告)号：EP3627228A1

公开(公告)日：2020-03-25

申请号：EP19206439.2

申请日：2018-09-04

Applicant: ASML Netherlands B.V.

Inventor： BIJNEN, Franciscus Godefridus Casper ,  BRINKHOF, Ralph ,  CEKLI, Hakki, Ergun ,  COX, Matthijs ,  ERDAMAR, Ahmet Koray ,  GOOSEN, Maikel Robert ,  HULSEBOS, Edo Maria ,  KOU, Weitian ,  MEGENS, Henricus Johannes Lambertus ,  RIJPSTRA, Manouk ,  ROELOFS, Willem Seine Christian ,  TINNEMANS, Patricius Aloysius Jacobus ,  VAN DE VEN, Wendy Johanna Martina ,  VAN T WESTEINDE, Maaike ,  VERHEES, Loek Johannes Petrus ,  VU, Tran Thanh Thuy ,  YAGUBIZADE, Hadi

IPC: G03F9/00 ,  G03F7/20

Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.

公开(公告)号：EP3807720A1

公开(公告)日：2021-04-21

申请号：EP19786562.9

申请日：2019-10-09

Applicant: ASML Netherlands B.V.

Inventor： ROY, Sarathi ,  HULSEBOS, Edo Maria ,  WERKMAN, Roy ,  RUAN, Junru

IPC: G03F7/20 ,  G05B13/02 ,  H01L21/66