公开(公告)号：WO2019120826A1

公开(公告)日：2019-06-27

申请号：PCT/EP2018/081872

申请日：2018-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： RIJPSTRA, Manouk ,  LAMBREGTS, Cornelis, Johannes, Henricus ,  TEL, Wim, Tjibbo ,  ROY, Sarathi ,  GROUWSTRA, Cédric, Désiré ,  NIEN, Chi-Fei ,  KOU, Weitian ,  CHEN, Chang-Wei ,  SMORENBERG, Pieter, Gerardus, Jacobus

IPC: G03F7/20

Abstract: Described herein is a method for determining correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.

公开(公告)号：WO2022111967A2

公开(公告)日：2022-06-02

申请号：PCT/EP2021/080602

申请日：2021-11-04

Applicant: ASML NETHERLANDS B.V.

Inventor： GOORDEN, Sebastianus, Adrianus ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  KARSSEMEIJER, Leendert, Jan ,  RIJPSTRA, Manouk ,  BRINKHOF, Ralph ,  BHATTACHARYYA, Kaustuve

IPC: G03F7/20 ,  G03F9/00 ,  G03F7/70616 ,  G03F7/70633 ,  G03F9/7046

Abstract: Disclosed is a method to determine a performance indicator for a metrology process, comprising obtaining first measurement data relating to a first set of measurement conditions and determining a first measurement recipe based on said first measurement data. The at least one performance indicator is determined from one or more components of said first measurement data obtained from a component analysis or statistical decomposition. Alternatively, the at least one performance indicator is determined from a comparison of one or more first measurement values relating to said first measurement recipe and one or more second measurement values relating to a second measurement recipe, where second measurement recipe is different to said first measurement data and relates a second set of measurement conditions, said second set of measurement conditions being different to said first set of measurement conditions.

公开(公告)号：WO2022214258A1

公开(公告)日：2022-10-13

申请号：PCT/EP2022/055858

申请日：2022-03-08

Applicant: ASML NETHERLANDS B.V.

Inventor： WERKMAN, Roy ,  WILDENBERG, Jochem, Sebastiaan ,  RIJPSTRA, Manouk

IPC: G03F7/20

Abstract: Disclosed is a method of optimizing a target layout for a patterning device and a sampling scheme for measuring the targets of said target layout exposed on a substrate, the method comprising co-optimizing said target layout and said sampling scheme to obtain an optimized target layout for the patterning device and an optimized sampling scheme for measuring the targets of the optimized target layout exposed on a substrate.

公开(公告)号：WO2019063245A1

公开(公告)日：2019-04-04

申请号：PCT/EP2018/073663

申请日：2018-09-04

Applicant: ASML NETHERLANDS B.V.

Inventor： TINNEMANS, Patricius, Aloysius Jacobus ,  HULSEBOS, Edo, Maria ,  MEGENS, Henricus, Johannes, Lambertus ,  ERDAMAR, Ahmet Koray ,  VERHEES, Loek, Johannes, Petrus ,  ROELOFS, Willem, Seine, Christian ,  VAN DE VEN, Wendy, Johanna, Martina ,  YAGUBIZADE, Hadi ,  CEKLI, Hakki, Ergun ,  BRINKHOF, Ralph ,  VU, Tran, Thanh, Thuy ,  GOOSEN, Maikel, Robert ,  VAN T WESTEINDE, Maaike ,  KOU, Weitian ,  RIJPSTRA, Manouk ,  COX, Matthijs ,  BIJNEN, Franciscus, Godefridus, Casper

IPC: G03F9/00 ,  G03F7/20

Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.

公开(公告)号：EP4320482A1

公开(公告)日：2024-02-14

申请号：EP22710613.5

申请日：2022-03-08

Applicant: ASML Netherlands B.V.

Inventor： WERKMAN, Roy ,  WILDENBERG, Jochem, Sebastiaan ,  RIJPSTRA, Manouk

IPC: G03F7/20

公开(公告)号：EP3504593A1

公开(公告)日：2019-07-03

申请号：EP18768811.4

申请日：2018-09-04

Applicant: ASML Netherlands B.V.

Inventor： TINNEMANS, Patricius, Aloysius Jacobus ,  HULSEBOS, Edo, Maria ,  MEGENS, Henricus, Johannes, Lambertus ,  ERDAMAR, Ahmet Koray ,  VERHEES, Loek, Johannes, Petrus ,  ROELOFS, Willem, Seine, Christian ,  VAN DE VEN, Wendy, Johanna, Martina ,  YAGUBIZADE, Hadi ,  CEKLI, Hakki, Ergun ,  BRINKHOF, Ralph ,  VU, Tran, Thanh, Thuy ,  GOOSEN, Maikel, Robert ,  VAN T WESTEINDE, Maaike ,  KOU, Weitian ,  RIJPSTRA, Manouk ,  COX, Matthijs ,  BIJNEN, Franciscus, Godefridus, Casper

IPC: G03F9/00 ,  G03F7/20

Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured to measure a property of a substrate is disclosed. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameter values for the plurality of substrates using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameter values; and determining the one or more optimized values of the operational parameter based on the comparing.

公开(公告)号：EP3729197A1

公开(公告)日：2020-10-28

申请号：EP18807597.2

申请日：2018-11-20

Applicant: ASML Netherlands B.V.

Inventor： RIJPSTRA, Manouk ,  LAMBREGTS, Cornelis, Johannes, Henricus ,  TEL, Wim, Tjibbo ,  ROY, Sarathi ,  GROUWSTRA, Cédric, Désiré ,  NIEN, Chi-Fei ,  KOU, Weitian ,  CHEN, Chang-Wei ,  SMORENBERG, Pieter, Gerardus, Jacobus

IPC: G03F7/20

公开(公告)号：EP3627228A1

公开(公告)日：2020-03-25

申请号：EP19206439.2

申请日：2018-09-04

Applicant: ASML Netherlands B.V.

Inventor： BIJNEN, Franciscus Godefridus Casper ,  BRINKHOF, Ralph ,  CEKLI, Hakki, Ergun ,  COX, Matthijs ,  ERDAMAR, Ahmet Koray ,  GOOSEN, Maikel Robert ,  HULSEBOS, Edo Maria ,  KOU, Weitian ,  MEGENS, Henricus Johannes Lambertus ,  RIJPSTRA, Manouk ,  ROELOFS, Willem Seine Christian ,  TINNEMANS, Patricius Aloysius Jacobus ,  VAN DE VEN, Wendy Johanna Martina ,  VAN T WESTEINDE, Maaike ,  VERHEES, Loek Johannes Petrus ,  VU, Tran Thanh Thuy ,  YAGUBIZADE, Hadi

IPC: G03F9/00 ,  G03F7/20

Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.

公开(公告)号：EP4071553A1

公开(公告)日：2022-10-12

申请号：EP21167239.9

申请日：2021-04-07

Applicant: ASML Netherlands B.V.

Inventor： WERKMAN, Roy ,  WILDENBERG, Jochem, Sebastiaan ,  RIJPSTRA, Manouk

IPC: G03F7/20

Abstract: Disclosed is a method of optimizing a target layout for a patterning device and a sampling scheme for measuring the targets of said target layout exposed on a substrate, the method comprising co-optimizing said target layout and said sampling scheme to obtain an optimized target layout for the patterning device and an optimized sampling scheme for measuring the targets of the optimized target layout exposed on a substrate..

公开(公告)号：EP3504593B1

公开(公告)日：2019-12-11

申请号：EP18768811.4

申请日：2018-09-04

Applicant: ASML Netherlands B.V.

Inventor： TINNEMANS, Patricius, Aloysius Jacobus ,  HULSEBOS, Edo, Maria ,  MEGENS, Henricus, Johannes, Lambertus ,  ERDAMAR, Ahmet Koray ,  VERHEES, Loek, Johannes, Petrus ,  ROELOFS, Willem, Seine, Christian ,  VAN DE VEN, Wendy, Johanna, Martina ,  YAGUBIZADE, Hadi ,  CEKLI, Hakki, Ergun ,  BRINKHOF, Ralph ,  VU, Tran, Thanh, Thuy ,  GOOSEN, Maikel, Robert ,  VAN T WESTEINDE, Maaike ,  KOU, Weitian ,  RIJPSTRA, Manouk ,  COX, Matthijs ,  BIJNEN, Franciscus, Godefridus, Casper

IPC: G03F9/00 ,  G03F7/20