公开(公告)号：WO2021249784A1

公开(公告)日：2021-12-16

申请号：PCT/EP2021/064255

申请日：2021-05-27

Applicant: ASML NETHERLANDS B.V.

Inventor： KEULEN, Luuc ,  GOSEN, Jeroen, Gerard ,  VAN BANNING, Dennis, Herman, Caspar ,  ARORA, Sampann ,  RONDE, Michaël, Johannes, Christiaan ,  KUINDERSMA, Lucas ,  DE VOS, Youssef ,  VAN DE GROES, Henricus, Martinus, Johannes ,  KOOIKER, Allard, Eelco ,  PRIL, Wouter, Onno ,  VAN GEND, Johan

IPC: G03F7/20 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70883 ,  G03F7/70933

Abstract: The invention provides an apparatus for use in a metrology process or a lithographic process, the apparatus comprising: an object support module adapted to hold an object; a first gas shower arranged on a first side of the object support module and adapted to emit a gas with a first velocity in a first gas direction which is a horizontal direction to cause a net gas flow in the apparatus to be a substantially horizontal gas flow in the first gas direction at least above the object support module.

公开(公告)号：WO2019068601A1

公开(公告)日：2019-04-11

申请号：PCT/EP2018/076571

申请日：2018-10-01

Applicant: ASML NETHERLANDS B.V.

Inventor： BAGGEN, Marcel, Koenraad, Marie ,  PRIL, Wouter, Onno ,  VAN DER PASCH, Engelbertus, Antonius, Fransiscus

IPC: H01J37/20

Abstract: A stage apparatus for an e-beam inspection apparatus comprising: - an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; - a positioning device (180) configured to a position the object table; a position measurement system (5) comprising a position sensor (8-10) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (9,10,22), wherein a measurement beam (11,15) of the interferometer sensor is configured to irradiate a reflective surface (13,17) of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.

公开(公告)号：WO2016083039A1

公开(公告)日：2016-06-02

申请号：PCT/EP2015/074515

申请日：2015-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： PRIL, Wouter, Onno ,  BAARTMAN, Jan, Peter ,  KOOIKER, Allard, Eelco ,  COSIJNS, Suzanne, Johanna, Antonetta, Geertruda ,  TONG-MINH, Bryan

IPC: G01D5/38 ,  G03F7/20

CPC classification number: G01D5/38 ,  G01B9/02 ,  G01B11/02 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70933

Abstract: An encoder comprises an optical component and an enclosing device having a first surface portion and a second surface portion. The first surface portion is arranged to receive from an ambient environment a first radiation beam. The second surface portion is arranged to receive from the ambient environment a second radiation beam. The optical component is arranged to combine the first radiation beam and the second radiation beam. The enclosing device is arranged to propagate the first radiation beam along a first path. The first path is between the first surface portion and the optical component. The enclosing device is arranged to propagate the second radiation beam along a second path. The second path is between the second surface portion and the optical component. The enclosing device is arranged to enclose a space, so as to isolate the first path and the second path from the ambient environment.

Abstract translation: 编码器包括光学部件和具有第一表面部分和第二表面部分的封闭装置。 第一表面部分布置成从环境环境接收第一辐射束。 第二表面部分布置成从周围环境接收第二辐射束。 光学部件布置成组合第一辐射束和第二辐射束。 封闭装置布置成沿着第一路径传播第一辐射束。 第一路径在第一表面部分和光学部件之间。 包围装置被布置成沿着第二路径传播第二辐射束。 第二路径在第二表面部分和光学部件之间。 封闭装置被布置成包围空间，以便将第一路径和第二路径与周围环境隔离。

公开(公告)号：EP3923075A1

公开(公告)日：2021-12-15

申请号：EP20178785.0

申请日：2020-06-08

Applicant: ASML Netherlands B.V.

Inventor： KEULEN, Luuc ,  GOSEN, Jeroen, Gerard ,  VAN BANNING, Dennis, Herman, Caspar ,  ARORA, Sampann ,  RONDE, Michaël, Johannes, Christiaan ,  KUINDERSMA, Lucas ,  DE VOS, Youssef, Karel, Maria ,  VAN DE GROES, Henricus, Martinus, Johannes ,  KOOIKER, Allard, Eelco ,  PRIL, Wouter, Onno ,  VAN GEND, Johan

IPC: G03F7/20

Abstract: The invention provides an apparatus for use in a metrology process or a lithographic process, the apparatus comprising: an object support module adapted to hold an object; a first gas shower arranged on a first side of the object support module and adapted to emit a gas with a first velocity in a first gas direction which is a horizontal direction to cause a net gas flow in the apparatus to be a substantially horizontal gas flow in the first gas direction at least above the object support module.

公开(公告)号：EP4552149A1

公开(公告)日：2025-05-14

申请号：EP23735025.1

申请日：2023-06-26

Applicant: ASML Netherlands B.V.

Inventor： HAARTSEN, Thomas Izaak Fred ,  BOSCH, Niels, Johannes, Maria ,  GRASMAN, Jasper, Hendrik ,  SMEETS, Martin, Frans, Pierre ,  SLOT, Erwin ,  PRIL, Wouter, Onno ,  HEMPENIUS, Peter, Paul ,  CHEN, Te-Yu

IPC: H01J37/21

公开(公告)号：EP4303908A1

公开(公告)日：2024-01-10

申请号：EP22183148.0

申请日：2022-07-05

Applicant: ASML Netherlands B.V.

Inventor： HAARTSEN, Thomas Izaak Fred ,  BOSCH, Niels, Johannes, Maria ,  GRASMAN, Jasper, Hendrik ,  SMEETS, Martin, Frans, Pierre ,  SLOT, Erwin ,  PRIL, Wouter, Onno ,  HEMPENIUS, Peter, Paul

IPC: H01J37/21

Abstract: The present disclosure relates to apparatus and methods for assessing samples using a plurality of charged particle beams. In one arrangement, at least a subset of a beam grid of a plurality of charged particle beams and respective target portions of a sample surface are scanned relative to each other to process the target portions. Signal charged particles from the sample are detected to generate detection signals. A sample surface topographical map is generated that represents a topography of the sample surface by analyzing the detection signals.

公开(公告)号：EP3224577B1

公开(公告)日：2019-08-07

申请号：EP15784669.2

申请日：2015-10-22

Applicant: ASML Netherlands B.V.

Inventor： PRIL, Wouter, Onno ,  BAARTMAN, Jan, Peter ,  KOOIKER, Allard, Eelco ,  COSIJNS, Suzanne, Johanna, Antonetta, Geertruda ,  TONG-MINH, Bryan

IPC: G01D5/38 ,  G03F7/20

公开(公告)号：EP3224577A1

公开(公告)日：2017-10-04

申请号：EP15784669.2

申请日：2015-10-22

Applicant: ASML Netherlands B.V.

Inventor： PRIL, Wouter, Onno ,  BAARTMAN, Jan, Peter ,  KOOIKER, Allard, Eelco ,  COSIJNS, Suzanne, Johanna, Antonetta, Geertruda ,  TONG-MINH, Bryan

IPC: G01D5/38 ,  G03F7/20

CPC classification number: G01D5/38 ,  G01B9/02 ,  G01B11/02 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70933

Abstract: An encoder includes an optical component and an enclosing device having a first surface portion and a second surface portion. The first surface portion is arranged to receive from an ambient environment a first radiation beam. The second surface portion is arranged to receive from the ambient environment a second radiation beam. The optical component is arranged to combine the first and second radiation beams. The enclosing device is arranged to propagate the first radiation beam along a first path. The first path is between the first surface portion and the optical component. The enclosing device is arranged to propagate the second radiation beam along a second path. The second path is between the second surface portion and the optical component. The enclosing device is arranged to enclose a space, so as to isolate the first path and the second path from the ambient environment.

Abstract translation: 编码器包括光学部件和具有第一表面部分和第二表面部分的封装装置。 第一表面部分被布置为从周围环境接收第一辐射束。 第二表面部分被布置成从周围环境接收第二辐射束。 光学部件被布置成组合第一辐射束和第二辐射束。 封闭装置被布置为沿着第一路径传播第一辐射束。 第一路径位于第一表面部分和光学部件之间。 封闭装置被布置成沿着第二路径传播第二辐射束。 第二路径在第二表面部分和光学部件之间。 封闭装置布置成封闭空间，以将第一路径和第二路径与周围环境隔离。