公开(公告)号：EP4137889A1

公开(公告)日：2023-02-22

申请号：EP21192381.8

申请日：2021-08-20

Applicant: ASML Netherlands B.V.

Inventor： NIENHUYS, Han-Kwang ,  HELFENSTEIN, Patrick Philipp ,  ROOBOL, Sander Bas

IPC: G03F7/20

Abstract: Disclosed is a method of measuring a target on a substrate using a metrology tool comprising an illumination source operable to emit an illumination beam for illuminating the target and a metrology sensor for collecting the scattered radiation having been scattered by the target. The method comprises calculating a target angle based on cell dimensions of a unit cell of said target in a first direction and a second direction orthogonal to said first direction; and order numbers of a selected pair of complementary diffraction orders in said first direction and second direction. At least one pair of measurement acquisitions is performed at a first target orientation and a second target orientation with respect to the illumination beam, wherein said target angle for at least one of said at least one pair of measurement acquisitions is an oblique angle.

公开(公告)号：EP3703114A1

公开(公告)日：2020-09-02

申请号：EP19159257.5

申请日：2019-02-26

Applicant: ASML Netherlands B.V.

Inventor： ROOBOL, Sander Bas ,  VAN DER POST, Sietse Thijmen

IPC: H01L23/00 ,  H01L25/065 ,  H01L33/10 ,  G03F7/20 ,  B29C65/48 ,  B32B17/06 ,  B32B38/18

Abstract: Disclosed is a method of manufacturing a reflector. The method comprises polishing at least the uppermost surface of the uppermost substantially flat substrate of a plurality of substantially flat substrates, deforming each substantially flat substrate into the desired shape, and bonding the deformed substrates together to form said reflector. In an embodiment, the deforming and bonding is performed together using a mold.

公开(公告)号：EP3276419A1

公开(公告)日：2018-01-31

申请号：EP16181778.8

申请日：2016-07-28

Applicant: ASML Netherlands B.V.

Inventor： TINNEMANS, Patricius Aloysius Jacobus ,  LIN, Nan ,  ROOBOL, Sander Bas ,  MATHIJSSEN, Simon Gijsbert Josephus

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G01N21/47 ,  G03F7/70633

Abstract: Disclosed is an illumination source for generating measurement radiation for an inspection apparatus. The source generates at least first measurement radiation and second measurement radiation such that the first measurement radiation and the second measurement radiation interfere to form combined measurement radiation modulated with a beat component. The illumination source may be a HHG source. Also disclosed is an inspection apparatus comprising such a source and an associated inspection method.

Abstract translation: 公开了一种用于为检查设备产生测量辐射的照明源。 源产生至少第一测量辐射和第二测量辐射，使得第一测量辐射和第二测量辐射干涉以形成用差拍分量调制的组合测量辐射。 照明源可以是HHG源。 还公开了包括这样的源和相关联的检查方法的检查设备。

公开(公告)号：EP3851915A1

公开(公告)日：2021-07-21

申请号：EP20151585.5

申请日：2020-01-14

Applicant: ASML Netherlands B.V.

Inventor： NIENHUYS, Han-Kwang ,  COENEN, Teis Johan ,  ROOBOL, Sander Bas

IPC: G03F7/20

Abstract: Disclosed is a method of metrology. The method comprises obtaining measurement data relating to at least one measurement of each of one or more structures on a substrate. The measurement data is dependent upon one or more drift parameters, said drift parameters comprising at least one interdependent drift parameter for which each measurement is dependent on a structure response metric which varies with an illumination setting and said at least one interdependent drift parameter interdependently. The measurement data is corrected based on an approximately invariant transformation of said structure response metric or related metric.

公开(公告)号：EP3629086A1

公开(公告)日：2020-04-01

申请号：EP18196626.8

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： COENEN, Teis, Johan ,  NIENHUYS, Han-Kwang ,  SCHOLZ, Sandy Claudia ,  ROOBOL, Sander Bas

IPC: G03F7/20

Abstract: Methods and apparatus for determining an intensity profile of a radiation beam. The method comprises providing a diffraction structure, causing relative movement of the diffraction structure relative to the radiation beam from a first position wherein the radiation beam does not irradiate the diffraction structure to a second position wherein the radiation beam irradiates the diffraction structure, measuring, with a radiation detector, diffracted radiation signals produced from diffraction of the radiation beam by the diffraction structure as the diffraction structure transitions from the first position to the second position or vice versa, and determining the intensity profile of the radiation beam based on the measured diffracted radiation signals.

公开(公告)号：EP3528048A1

公开(公告)日：2019-08-21

申请号：EP18156870.0

申请日：2018-02-15

Applicant: ASML Netherlands B.V.

Inventor： BRUSSAARD, Gerrit Jacobus Hendrik ,  SMORENBURG, Petrus Wilhelmus ,  COENEN, Teis, Johan ,  GEYPEN, Niels ,  VAN VOORST, Peter Danny ,  ROOBOL, Sander Bas

IPC: G03F7/20 ,  G01N21/47 ,  G01J3/02 ,  G01J3/36 ,  G01N21/95 ,  G01N21/956 ,  G03F9/00 ,  G01J3/28

Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.

公开(公告)号：EP3367165A1

公开(公告)日：2018-08-29

申请号：EP17157671.3

申请日：2017-02-23

Applicant: ASML Netherlands B.V.

Inventor： ROOBOL, Sander Bas ,  MATHIJSSEN, Simon Gijsbert Josephus ,  BÄUMER, Stefan Michael Bruno

IPC: G03F7/20 ,  G01B11/00 ,  G02B5/18 ,  G11B7/1353

CPC classification number: G02B27/4255 ,  G02B27/62 ,  G03F7/70158 ,  G03F7/70258 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70591 ,  G03F7/7085

Abstract: A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element (604 - 616) optimized to diffract the alignment beam and the operating beam in the same, or a predetermined, direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (p IR ) and a second periodic structure with a second pitch (p SXR ). After alignment, the vacuum system is pumped down and in operation the SXR operating beam is generated by a high harmonic generation (HHG) optical source pumped by the IR alignment beam' optical source.