公开(公告)号：EP3454127A1

公开(公告)日：2019-03-13

申请号：EP17190433.7

申请日：2017-09-11

Applicant: ASML Netherlands B.V.

Inventor： DE WINTER, Laurentius Cornelius ,  STOLK, Roland Pieter ,  STAALS, Frank

IPC: G03F7/20 ,  G03F1/24 ,  G21K1/06

Abstract: Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more printed structures using a reflective patterning device onto a substrate. The reflective patterning device comprises first reticle structures and second reticle structures. A first angular reflectivity curve of the one or more first reticle structures is different from a second angular reflectivity curve of the one or more second reticle structures. The one or more printed structures comprise first printed structures corresponding to the first reticle structures and second printed structures corresponding to the second reticle structures. A focus dependent parameter related to a focus- dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based on the focus dependent parameter is derived therefrom.