LOW CONDUCTANCE SELF-SHIELDING INSULATOR FOR ION IMPLANTATION SYSTEMS
    1.
    发明申请
    LOW CONDUCTANCE SELF-SHIELDING INSULATOR FOR ION IMPLANTATION SYSTEMS 审中-公开
    用于离子注入系统的低导电自保护绝缘体

    公开(公告)号:WO2017083516A1

    公开(公告)日:2017-05-18

    申请号:PCT/US2016/061331

    申请日:2016-11-10

    CPC classification number: H01J27/022 H01J37/08 H01J2237/022 H01J2237/038

    Abstract: An elongate insulator (302). The insulator may be positioned between the apertured ground electrode (308) and apertured suppression electrode (306) of an ion source. The insulator has an elongate body having a first end (316) and a second end (316), where one or more features (312) are defined in the elongate body and increase a gas conductance path along a surface of the elongate body from the first end to the second end. One or more of the features (312) is an undercut (314) extending generally axially or at a non-zero angle from an axis of the elongate body into the elongate body. One of the features (312) can be a rib extending from a radius of the elongate body.

    Abstract translation: 细长绝缘体(302)。 绝缘体可以位于离子源的有孔接地电极(308)和有孔抑制电极(306)之间。 绝缘体具有细长主体,该细长主体具有第一端部(316)和第二端部(316),其中一个或多个特征部件(312)被限定在细长主体中并且增加沿着细长主体的表面的气体传导路径从 第一端到第二端。 一个或多个特征(312)是底切(314),其从细长主体的轴线大致轴向地或以非零角度延伸到细长主体中。 其中一个特征(312)可以是从细长主体的半径延伸的肋。

    ION SOURCE LINER HAVING A LIP FOR ION IMPLANTION SYSTEMS
    2.
    发明申请
    ION SOURCE LINER HAVING A LIP FOR ION IMPLANTION SYSTEMS 审中-公开
    用于离子注入系统的带离子源的离子源衬垫

    公开(公告)号:WO2017079588A1

    公开(公告)日:2017-05-11

    申请号:PCT/US2016/060570

    申请日:2016-11-04

    CPC classification number: H01J37/08 H01J27/022 H01J37/3171 H01J2237/31705

    Abstract: An ion source liner 204 comprises a plate having an exposure surface. The plate comprises a hole and a lip 234 surrounding the hole and extending outward from the exposure surface, and optionally a recess having a second surface recessed from the exposure surface and surrounding the hole. Further disclosed are an arc chamber 202, comprising said said ion source liner and an electrode 208 (e.g. a repeller 248) having a shaft 218 and a head 250, wherein the electrode passes though said hole and defines an annular gap 206 between the plate and the shaft; as well as an ion source comprising said arc chamber, wherein the arc chamber has body defining an interior region 212, in which said exposure surface is exposed to a plasma generated within said arc chamber, and wherein the electrode is electrically isolated from the body. The lip 234 generally prevents particulate contaminants 248' from entering the annular gap 206.

    Abstract translation: 离子源衬里204包括具有曝光表面的板。 该板包括孔和围绕该孔并从该暴露表面向外延伸的唇部234,并且可选地具有凹部,该凹部具有从该暴露表面凹陷并围绕该孔的第二表面。 还公开了一种电弧室202,其包括所述离子源衬里和具有轴218和头部250的电极208(例如推斥极248),其中电极穿过所述孔并且限定在所述板和 轴; 以及包括所述电弧室的离子源,其中电弧室具有限定内部区域212的主体,其中所述暴露表面暴露于在所述电弧室内产生的等离子体,并且其中电极与主体电隔离。 唇部234通常防止颗粒污染物248'进入环形间隙206中。

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