公开(公告)号：WO2018098002A1

公开(公告)日：2018-05-31

申请号：PCT/US2017/061920

申请日：2017-11-16

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  HSIEH, Tseh-Jen

IPC: C23C14/48 ,  H01J37/317

CPC classification number: H01L21/265 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/08 ,  H01J2237/31701

Abstract: Processes and systems for carbon ion implantation include utilizing phosphine as a co-gas with a carbon oxide gas in an ion source chamber 300. In one or more embodiments, carbon implantation with the phosphine co-gas is in combination with the lanthanated tungsten alloy ion source components, which advantageously results in minimal oxidation of the cathode 306 and cathode shield 316, among other components within the ion source chamber.

公开(公告)号：WO2017197378A1

公开(公告)日：2017-11-16

申请号：PCT/US2017/032603

申请日：2017-05-15

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  HSIEH, Tseh-Jen ,  SILVERSTEIN, Paul

IPC: H01J37/08 ,  H01J37/317

CPC classification number: H01J37/3002 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/061

Abstract: An ion implantation system is provided having one or more conductive components comprised of one or more of lanthanated tungsten and a refractory metal alloyed with a predetermined percentage of a rare earth metal. The conductive component may be a component of an ion source, such as one or more of a cathode, cathode shield, a repeller, a liner, an aperture plate, an arc chamber body, and a strike plate. The aperture plate may be associated with one or more of an extraction aperture, a suppression aperture and a ground aperture.

Abstract translation: 提供了一种离子注入系统，其具有由一种或多种镧系元素的钨和难熔金属组成的一种或多种导电组分，该导电组分与预定百分比的稀土金属形成合金。 导电部件可以是离子源的部件，例如阴极，阴极护罩，推斥极，衬垫，孔板，电弧室主体和冲击板中的一个或多个。 孔板可以与提取孔，抑制孔和接地孔中的一个或多个相关联。

公开(公告)号：WO2017079588A1

公开(公告)日：2017-05-11

申请号：PCT/US2016/060570

申请日：2016-11-04

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil K. ,  HSIEH, Tseh-Jen

IPC: H01J27/02 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J27/022 ,  H01J37/3171 ,  H01J2237/31705

Abstract: An ion source liner 204 comprises a plate having an exposure surface. The plate comprises a hole and a lip 234 surrounding the hole and extending outward from the exposure surface, and optionally a recess having a second surface recessed from the exposure surface and surrounding the hole. Further disclosed are an arc chamber 202, comprising said said ion source liner and an electrode 208 (e.g. a repeller 248) having a shaft 218 and a head 250, wherein the electrode passes though said hole and defines an annular gap 206 between the plate and the shaft; as well as an ion source comprising said arc chamber, wherein the arc chamber has body defining an interior region 212, in which said exposure surface is exposed to a plasma generated within said arc chamber, and wherein the electrode is electrically isolated from the body. The lip 234 generally prevents particulate contaminants 248' from entering the annular gap 206.

Abstract translation: 离子源衬里204包括具有曝光表面的板。 该板包括孔和围绕该孔并从该暴露表面向外延伸的唇部234，并且可选地具有凹部，该凹部具有从该暴露表面凹陷并围绕该孔的第二表面。 还公开了一种电弧室202，其包括所述离子源衬里和具有轴218和头部250的电极208（例如推斥极248），其中电极穿过所述孔并且限定在所述板和 轴; 以及包括所述电弧室的离子源，其中电弧室具有限定内部区域212的主体，其中所述暴露表面暴露于在所述电弧室内产生的等离子体，并且其中电极与主体电隔离。 唇部234通常防止颗粒污染物248'进入环形间隙206中。

公开(公告)号：WO2017176675A1

公开(公告)日：2017-10-12

申请号：PCT/US2017/025845

申请日：2017-04-04

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  HSIEH, Tseh-Jen ,  SILVERSTEIN, Paul

IPC: H01J27/08 ,  H01J9/32 ,  H01J37/08

CPC classification number: H01J37/32431 ,  G21F1/06 ,  H01J9/32 ,  H01J11/28 ,  H01J27/08 ,  H01J37/08 ,  H01J37/3171 ,  H01J37/32541 ,  H01J37/32559 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/31701

Abstract: An arc chamber has a liner having a recessed surface and a hole having a first diameter. The liner has a lip extending upwardly from the surface toward the surface that surrounds the hole and has a second diameter. An electrode has a shaft and head. The shaft has a third diameter that is less than the first diameter and passes through the body and hole and is electrically isolated from the liner by an annular gap. The head has a fourth diameter and a third surface having an electrode lip extending downwardly from the third surface toward the second surface. The electrode lip has a fifth diameter that is between the second and fourth diameters. A spacing between the liner lip and electrode lip defines a labyrinth seal and generally prevents contaminants from entering the annular gap.

Abstract translation: 弧室具有具有凹入表面和具有第一直径的孔的衬套。 该衬里具有从该表面向着围绕该孔的表面向上延伸并具有第二直径的唇缘。 一个电极有一个轴和头。 轴具有第三直径，其小于第一直径并且穿过主体和孔并且通过环形间隙与衬套电隔离。 头部具有第四直径和第三表面，第三表面具有从第三表面朝向第二表面向下延伸的电极唇缘。 电极唇具有在第二和第四直径之间的第五直径。 衬套唇缘和电极唇缘之间的间距限定了迷宫式密封，并且通常防止污染物进入环形间隙。

公开(公告)号：WO2017127525A1

公开(公告)日：2017-07-27

申请号：PCT/US2017/014106

申请日：2017-01-19

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  HSIEH, Tseh-Jen ,  SILVERSTEIN, Paul

IPC: H01J27/02 ,  H01J27/08

CPC classification number: H01J17/06 ,  H01J17/186 ,  H01J27/022 ,  H01J27/08 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/006 ,  H01J2237/061

Abstract: An ion source has an arc chamber having an arc chamber body. An electrode extends into an interior region of the arc chamber body, and a cathode shield has a body that is cylindrical having an axial hole. The axial hole is configured to pass the electrode therethrough. First and second ends of the body have respective first and second gas conductance limiters. The first gas conductance limiter extends from an outer diameter of the body and has a U-shaped lip. The second gas conductance limiter has a recess for a seal to protect the seal from corrosive gases and maintain an integrity of the seal. A gas source introduces a gas to the arc chamber body. A liner has an opening configured to pass the cathode shield therethrough, where the liner has a recess.

Abstract translation: 离子源具有具有电弧室主体的电弧室。 电极延伸到电弧室主体的内部区域中，并且阴极护罩具有具有轴向孔的圆柱形主体。 轴向孔构造成使电极穿过其中。 本体的第一和第二端具有相应的第一和第二气体传导限制器。 第一气体传导限制器从主体的外径延伸并具有U形唇缘。 第二气体传导限制器具有用于密封件的凹槽，以保护密封件免受腐蚀性气体影响并保持密封件的完整性。 气源将气体引入电弧室主体。 衬里具有开口，该开口构造成使阴极护罩穿过其中，其中衬里具有凹部。

公开(公告)号：WO2019217953A1

公开(公告)日：2019-11-14

申请号：PCT/US2019/031970

申请日：2019-05-13

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  HSIEH, Tseh-Jen

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/32

Abstract: A terminal system (102) for an ion implantation system has an ion source (108) with a housing and extraction electrode assembly having one or more aperture plates. A gas box (152) is electrically coupled to the ion source. A gas source (148) is within the gas box to provide a gas at substantially the same electrical potential as the ion source assembly. A bleed gas conduit (154, 172, 174) introduces the gas to a region internal to the housing of the ion source and upstream of at least one of the aperture plates. The bleed gas conduit has one or more feed-throughs extending through a body of the ion source assembly, such as a hole in a mounting flange of the ion source. The mounting flange may be a tubular portion having a channel. The bleed gas conduit can further have a gas distribution apparatus (172) defined as a gas distribution ring (174). The gas distribution ring can generally encircle the tubular portion of the mounting flange.

公开(公告)号：WO2017127521A1

公开(公告)日：2017-07-27

申请号：PCT/US2017/014098

申请日：2017-01-19

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  HSIEH, Tseh-Jen ,  SILVERSTEIN, Paul

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/063 ,  H01J37/09 ,  H01J37/08 ,  H01J37/05 ,  H01J37/12 ,  H01J37/147

CPC classification number: H01J37/045 ,  H01J37/04 ,  H01J37/05 ,  H01J37/08 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147 ,  H01J37/3171 ,  H01J2237/083

Abstract: An optics plate for an ion implantation system, the optics plate comprising a pair of aperture assemblies. Each pair of aperture assemblies respectively comprises a first aperture member, a second aperture member; and an aperture fastener, wherein the aperture fastener fastens the first aperture member to the second aperture member. An aperture tip may be also fastened to the second aperture member. One or more of the first aperture member, second aperture member, aperture tip, and aperture fastener is made of one or more of a refractory metal, tungsten, lanthanated tungsten alloy, yttrium tungsten alloy, and/or graphite and silicon carbide. The aperture assemblies may define an extraction electrode assembly, a ground electrode assembly, or other electrode assembly in the ion implantation system.

Abstract translation: 一种用于离子注入系统的光学板，所述光学板包括一对孔组件。 每对孔组件分别包括第一孔构件，第二孔构件; 和孔眼紧固件，其中孔眼紧固件将第一光圈构件紧固到第二光圈构件。 孔顶端也可以固定到第二孔构件。 第一孔构件，第二孔构件，孔口顶端和孔眼紧固件中的一个或多个由难熔金属，钨，镧系钨合金，钇钨合金和/或石墨和碳化硅中的一种或多种制成。 孔组件可限定离子注入系统中的引出电极组件，接地电极组件或其他电极组件。

公开(公告)号：WO2012067652A1

公开(公告)日：2012-05-24

申请号：PCT/US2011/001912

申请日：2011-11-17

Applicant: AXCELIS TECHNOLOGIES, INC. ,  COLVIN, Neil ,  HSIEH, Tseh-Jen

Inventor： COLVIN, Neil ,  HSIEH, Tseh-Jen

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J27/022 ,  H01J37/08 ,  H01J2237/006 ,  H01J2237/08

Abstract: A system, apparatus and method for increasing ion source lifetime in an ion implanter are provided. Oxidation of the ion source and ion source chamber poisoning resulting from a carbon and oxygen-containing source gas is controlled by utilizing a hydrogen co-gas, which reacts with free oxygen atoms to form hydroxide and water.

Abstract translation: 提供了一种用于增加离子注入机中离子源寿命的系统，装置和方法。 通过利用与游离氧原子反应形成氢氧化物和水的氢气体来控制由含碳和含氧源气体产生的离子源和离子源室中毒的氧化。

公开(公告)号：WO2020197938A1

公开(公告)日：2020-10-01

申请号：PCT/US2020/023664

申请日：2020-03-19

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： BASSOM, Neil ,  COLVIN, Neil ,  HSIEH, Tseh-Jen ,  AMEEN, Michael

IPC: H01J37/08 ,  H01J27/02 ,  H01J49/10

Abstract: An ion source is configured to form an ion beam and has an arc chamber enclosing an arc chamber environment. A reservoir apparatus can be configured as a repeller and provides a liquid metal to the arc chamber environment. A biasing power supply electrically biases the reservoir apparatus with respect to the arc chamber to vaporize the liquid metal to form a plasma in the arc chamber environment. The reservoir apparatus has a cup and cap defining a reservoir environment for the liquid metal that is fluidly coupled to the arc chamber environment by holes in the cap. Features extend from the cup into the reservoir and contact the liquid metal to feed the liquid metal toward the arc chamber environment by capillary action. A structure, surface area, roughness, and material modifies the capillary action. The feature can be an annular ring, rod, or tube extending into the liquid metal.

公开(公告)号：WO2019144093A1

公开(公告)日：2019-07-25

申请号：PCT/US2019/014474

申请日：2019-01-22

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  HSIEH, Tseh-Jen ,  RZESZUT, Richard ,  COLBY, Wendy

IPC: H01J37/317 ,  H01J37/08

Abstract: A terminal for an ion implantation system is provided, wherein the terminal has a terminal housing (154) for supporting an ion source (108) configured to form an ion beam. A gas box (146) within the terminal housing has a hydrogen generator (144) configured to produce hydrogen gas for the ion source. The gas box is electrically insulated from the terminal housing, and is further electrically coupled to the ion source. The ion source and gas box are electrically isolated from the terminal housing by a plurality of electrical insulators. A plurality of insulating standoffs (156) electrically isolate the terminal housing from an earth ground. A terminal power supply electrically biases the terminal housing to a terminal potential with respect to the earth ground. An ion source power supply electrically biases the ion source to an ion source potential with respect to the terminal potential. Electrically conductive tubing (148) electrically couples the gas box and ion source.