公开(公告)号：EP2937314A1

公开(公告)日：2015-10-28

申请号：EP15171765.9

申请日：2011-08-16

Applicant: Advanced Technology Materials, Inc.

Inventor： Kaim, Robert ,  Sweeney, Joseph D. ,  Byl, Oleg ,  Yedave, Sharad N. ,  Jones, Edward E. ,  Zou, Peng ,  Tang, Ying ,  Chambers, Barry Lewis ,  Ray, Richard S.

IPC: C01B35/06 ,  C01B9/08

CPC classification number: C01B35/061 ,  C01P2006/88 ,  H01J2237/006 ,  H01J2237/08 ,  H01J2237/31701 ,  Y02P20/134

Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B 2 F 4 . Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.

Abstract translation: 包含两个或多个硼原子和至少一个氟原子的同位素富集的含硼化合物，其中至少一个硼原子含有所需的硼同位素，其浓度或比例大于天然丰度浓度或比例 。 化合物可以具有B 2 F 4的化学式。 对这些化合物的合成方法和使用这种化合物的离子注入方法进行了描述，以及存储和分配容器，其中有利地含有同位素富集的含硼化合物用于随后的分配用途。