公开(公告)号：US20030150530A1

公开(公告)日：2003-08-14

申请号：US10071869

申请日：2002-02-08

Applicant: Applied Materials, Inc.

Inventor： Yixing Lin ,  Brian T. West ,  Hong Wang ,  Shun Jackson Wu ,  Jennifer Y. Sun ,  Clifford C. Stow ,  Senh Thach

IPC: C25D003/44

CPC classification number: C25D11/16 ,  C25D11/04 ,  C25D11/045

Abstract: We have discovered that the formation of particulate inclusions at the surface of an aluminum alloy article, which inclusions interfere with a smooth transition from the alloy surface to an overlying aluminum oxide protective film can be controlled by maintaining the content of mobile impurities within a specific range and controlling the particulate size and distribution of the mobile impurities and compounds thereof; by heat-treating the aluminum alloy at a temperature less than about 330null C.; and by creating the aluminum oxide protective film by employing a particular electrolytic process. When these factors are taken into consideration, an improved aluminum oxide protective film is obtained.

Abstract translation: 我们已经发现，通过将移动杂质的含量保持在特定范围内，可以控制在铝合金制品表面形成的夹杂物，其夹杂物干扰从合金表面到上覆的氧化铝保护膜的平滑过渡 并控制可移动杂质及其化合物的颗粒尺寸和分布; 通过在低于约330℃的温度下对铝合金进行热处理; 并通过使用特定的电解工艺制备氧化铝保护膜。 当考虑这些因素时，获得改进的氧化铝保护膜。