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公开(公告)号:US20200283900A1
公开(公告)日:2020-09-10
申请号:US16808046
申请日:2020-03-03
Applicant: Applied Materials, Inc.
Inventor: Sumit AGARWAL , Chad PETERSON , Marc SHULL
IPC: C23C16/455
Abstract: A showerhead assembly includes a support structure and a porous plate. The support structure includes a support feature. The porous plate has a thermal conductivity of at least about 50 W/(mK) and includes a plurality of pores having an average diameter of less than about 100 um, wherein at least a portion of a perimeter of the porous plate rests on the support feature. The showerhead may be included within a processing chamber that is utilized to process a substrate.
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公开(公告)号:US20220380898A1
公开(公告)日:2022-12-01
申请号:US17745156
申请日:2022-05-16
Applicant: Applied Materials, Inc.
Inventor: Sumit AGARWAL , Sanjeev BALUJA , Chad PETERSON , Michael R. RICE
IPC: C23C16/455 , B23K1/00
Abstract: A gas distribution plate for a showerhead assembly of a processing chamber may include at least a first plate and second plate. The first plate may include a first plurality holes each having a diameter of at least about 100 um. The second plate may include a second plurality of holes each having a diameter of at least about 100 um. Further, each of the first plurality of holes is aligned with a respective one of the second plurality of holes forming a plurality of interconnected holes. Each of the interconnected holes is isolated from each other interconnected holes.
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公开(公告)号:US20200308703A1
公开(公告)日:2020-10-01
申请号:US16802293
申请日:2020-02-26
Applicant: Applied Materials, Inc.
Inventor: Sumit AGARWAL , Sanjeev BALUJA , Chad PETERSON , Michael R. RICE
IPC: C23C16/455 , B23K1/00
Abstract: A gas distribution plate for a showerhead assembly of a processing chamber may include at least a first plate and second plate. The first plate may include a first plurality holes each having a diameter of at least about 100 um. The second plate may include a second plurality of holes each having a diameter of at least about 100 um. Further, each of the first plurality of holes is aligned with a respective one of the second plurality of holes forming a plurality of interconnected holes. Each of the interconnected holes is isolated from each other interconnected holes.
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