公开(公告)号：US20250053099A1

公开(公告)日：2025-02-13

申请号：US18797716

申请日：2024-08-08

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Sihui HE ,  Ludovic GODET

IPC: G03F7/00

Abstract: Embodiments described herein provide an asymmetric optical metrology system for evaluating and inspecting the performance of optical devices, such as augmented reality (AR) waveguide combiners. The system utilizes an asymmetric optical configuration and fly-eye illumination to enhance the detection limit of image sharpness and the accuracy of luminance uniformity. By employing different lenses with various focal lengths, the system increases the sampling rate in the angular space, addressing the challenges of form factor limitations and pixel density inherent in conventional metrology tools. Embodiments described herein offer improved contrast and sharp image details, as well as a compact design, making it suitable for the development, optimization, and quality control of optical devices, such as AR waveguide combiners.

公开(公告)号：US20220291082A1

公开(公告)日：2022-09-15

申请号：US17653785

申请日：2022-03-07

Applicant: Applied Materials, Inc.

Inventor： Jinxin FU ,  Yangyang SUN ,  Kazuya DAITO ,  Ludovic GODET

IPC: G01M11/02 ,  G01S17/89 ,  G01S7/481

Abstract: Embodiments of the present disclosure relate to measurement systems and methods of measuring efficiency of optical devices. In one example, the measurement systems include a light source, a mirror, an illumination source, and a sensor. The light source provides a light beam to the optical device to be diffracted into diffraction beams having diffraction orders. The diffractions beams form a diffraction pattern. The method includes positioning the optical device in the measurement system and directing the diffraction beams to the sensor. The sensor is operable to measure the efficiency of the optical device by measuring the diffraction pattern.

公开(公告)号：US20250054171A1

公开(公告)日：2025-02-13

申请号：US18930188

申请日：2024-10-29

Applicant: Applied Materials, Inc.

Inventor： Jinxin FU ,  Yangyang SUN ,  Ludovic GODET

IPC: G06T7/521 ,  G06T1/00

Abstract: Embodiments herein provide for a method of determining an optical device modulation transfer function (MTF). The method described herein includes projecting a first instance of an image from a light engine to a detector. The first instance of the image is analyzed to determine a first function. A first fast Fourier transform (FFT) or a first MTF of the first function is obtained. The method further includes projecting a second instance of the image from the light engine to detector via one or more optical devices. The second instance of the image is analyzed to determine a second function. A second FFT or a second MTF is obtained of the second function. An optical device MTF of the one or more optical devices is determined by comparing the first FFT and the second FFT or by comparing the first MTF and the second MTF.

公开(公告)号：US20240329322A1

公开(公告)日：2024-10-03

申请号：US18625979

申请日：2024-04-03

Applicant: Applied Materials, Inc.

Inventor： Jinyu LU ,  Ludovic Godet ,  Jinxin FU ,  Kenichi OHNO ,  Shangyi Chen ,  Takashi KURATOMI ,  Erica CHEN ,  Rami HURARNI ,  Yangyang SUN

IPC: G02B6/34 ,  C23C16/40 ,  C23C16/455

CPC classification number: G02B6/34 ,  C23C16/403 ,  C23C16/45553

Abstract: Embodiments described herein relate to improved waveguides with materials layers improving the optical properties of one or more surface regions of waveguides and methods of forming the same. In one embodiment, a waveguide is provided. The waveguide including a substrate, a grating disposed in or on the substrate, the grating comprising a plurality of structures defined by a plurality of trenches, a layer of silicon oxide or aluminum oxide disposed over the structures on the substrate. The layer is disposed over sidewalls and top surfaces of the structures, and a bottom surface of the trenches. The waveguide further includes a high index layer disposed over the layer. The high index layer is disposed over the sidewalls and the top surfaces of the structures, and the bottom surface of the trenches with the layer disposed in between the structures and the high index layer.

公开(公告)号：US20220122240A1

公开(公告)日：2022-04-21

申请号：US17492905

申请日：2021-10-04

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Kazuya DAITO ,  Ludovic GODET

IPC: G06T7/00 ,  G02B5/00 ,  G01J1/44 ,  H04N5/247 ,  H04N5/225 ,  G06T7/90 ,  G06T7/80

Abstract: Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of first metrics and one or more second metrics for optical devices, the one or more second metrics including a display leakage metric.

公开(公告)号：US20230251161A1

公开(公告)日：2023-08-10

申请号：US18163766

申请日：2023-02-02

Applicant: Applied Materials, Inc.

Inventor： Baochen WU ,  Yangyang SUN ,  Ravi KOMANDURI ,  Jinxin FU ,  Ludovic GODET

IPC: G01M11/02

CPC classification number: G01M11/0207

Abstract: Embodiments described herein relate to an optical device metrology system including a light source to emit a light and a non-polarizing beam splitter to split the light into a first photodetector light path and an optical light path. A first photodetector is disposed in the first photodetector light path and measures a total power of the light. The optical device substrate is disposed in the optical light path and splits the light into a second and a third photodetector light path. A second photodetector is disposed in the second photodetector light path from the optical device substrate. The second photodetector measures a reflected power of the light. A third photodetector is disposed in the third photodetector light path. The third photodetector measures a transmitted power of the light. The controller receives measurements from the first, second, and third photodetectors to calculate a percentage light loss within the optical device substrate.

公开(公告)号：US20220164972A1

公开(公告)日：2022-05-26

申请号：US17534167

申请日：2021-11-23

Applicant: Applied Materials, Inc.

Inventor： Jinxin FU ,  Yangyang SUN ,  Ludovic GODET

IPC: G06T7/521 ,  G06T1/00

Abstract: Embodiments herein provide for a method of determining an optical device modulation transfer function (MTF). The method described herein includes projecting a baseline image of a pattern from a light engine to a detector. The baseline image is analyzed to determine a baseline function. A baseline fast Fourier transform (FFT) or a baseline MTF of the baseline function is obtained. The method further includes projecting an image of the pattern from the light engine to one or more optical devices. The pattern is outcoupled from the one or more optical devices to the detector. The image is analyzed to determine a function. A function FFT or a function MTF is obtained corresponding to the image. An optical device MTF of the one or more optical devices is determined by comparing the baseline FFT and the function FFT determined by analyzing the image or by comparing the baseline MTF and the function MTF determined by analyzing the image.

公开(公告)号：US20220163423A1

公开(公告)日：2022-05-26

申请号：US17456240

申请日：2021-11-23

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Kazuya DAITO ,  Ludovic GODET

IPC: G01M11/02 ,  G02B27/30 ,  G02B19/00 ,  H04N5/225 ,  G06T7/00

Abstract: Embodiments described herein provide for light engines of a measurement system and methods of using the light engines. The measurement system includes a light engine operable to illuminate a first grating of an optical device. The light engine projects a pattern with a light from a light engine. The light engine projects a pattern to the first grating such that a metrology metric may be extracted from one or more images captured by a detector of the measurement system. The metrology metrics are extracted by processing the image. The metrology metrics determine if the optical device meets image quality standards.

公开(公告)号：US20220122241A1

公开(公告)日：2022-04-21

申请号：US17492958

申请日：2021-10-04

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Kazuya DAITO ,  Ludovic GODET

IPC: G06T7/00 ,  G02B26/10 ,  G02B26/08 ,  G01B11/26 ,  H04N5/247 ,  H04N5/225 ,  H04N5/235 ,  G06T7/90 ,  G06T7/80

Abstract: Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of first metrics and one or more second metrics for optical devices, the one or more second metrics including a display leakage metric.

公开(公告)号：US20220121030A1

公开(公告)日：2022-04-21

申请号：US17492826

申请日：2021-10-04

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Kazuya DAITO ,  Ludovic GODET

IPC: G02B27/01 ,  G01J1/42

Abstract: Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of see-through metrics for optical devices.