Support cylinder for thermal processing chamber

    公开(公告)号:US10128144B2

    公开(公告)日:2018-11-13

    申请号:US15600336

    申请日:2017-05-19

    Abstract: Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder includes a hollow cylindrical body comprising an inner peripheral surface, an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder, and a lateral portion extending radially from the outer peripheral surface to the inner peripheral surface, wherein the lateral portion comprises a first end having a first beveled portion, a first rounded portion, and a first planar portion connecting the first beveled portion and the first rounded portion, and a second end opposing the first end, the second end having a second beveled portion, a second rounded portion, and a second planar portion connecting the second beveled portion and the second rounded portion.

    Support cylinder for thermal processing chamber

    公开(公告)号:US09659809B2

    公开(公告)日:2017-05-23

    申请号:US15188706

    申请日:2016-06-21

    CPC classification number: H01L21/68735 H01L21/324 H01L21/67115 H01L21/68757

    Abstract: Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder includes a hollow cylindrical body comprising an inner peripheral surface, an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder, and a lateral portion extending radially from the outer peripheral surface to the inner peripheral surface, wherein the lateral portion comprises a first end having a first beveled portion, a first rounded portion, and a first planar portion connecting the first beveled portion and the first rounded portion, and a second end opposing the first end, the second end having a second beveled portion, a second rounded portion, and a second planar portion connecting the second beveled portion and the second rounded portion.

    Support cylinder for thermal processing chamber
    3.
    发明授权
    Support cylinder for thermal processing chamber 有权
    支撑筒用于热处理室

    公开(公告)号:US09385004B2

    公开(公告)日:2016-07-05

    申请号:US14298389

    申请日:2014-06-06

    CPC classification number: H01L21/68735 H01L21/324 H01L21/67115 H01L21/68757

    Abstract: Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder comprises a ring body having an inner peripheral surface and an outer peripheral surface, wherein the ring body comprises an opaque quartz glass material and wherein the ring body is coated with an optical transparent layer. The optical transparent layer has a coefficient of thermal expansion that is substantially matched or similar to the opaque quartz glass material to reduce thermal expansion mismatch that may cause thermal stress under high thermal loads. In one example, the opaque quartz glass material is synthetic black quartz and the optical transparent layer comprises a clear fused quartz material.

    Abstract translation: 本公开的实施例一般涉及在热处理室中使用的支撑筒。 在一个实施例中,支撑筒包括具有内周表面和外周表面的环体,其中环体包括不透明的石英玻璃材料,并且其中环体涂覆有光学透明层。 光学透明层的热膨胀系数基本上与不透明的石英玻璃材料匹配或类似,以减少在高热负荷下可能引起热应力的热膨胀失配。 在一个实例中,不透明石英玻璃材料是合成黑色石英,光学透明层包括透明的熔融石英材料。

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