公开(公告)号：WO2016029321A1

公开(公告)日：2016-03-03

申请号：PCT/CA2015/050829

申请日：2015-08-28

Applicant: AURORA CONTROL TECHNOLOGIES INC.

Inventor： BLAINE, Stephen Warren

IPC: H01L21/66 ,  G01J3/433 ,  H01L31/18 ,  H01L33/00

CPC classification number: G01N21/9501 ,  G01J3/0254 ,  G01J3/433 ,  G01N21/55 ,  G01N2201/06113 ,  G01N2201/062 ,  G01N2201/065 ,  H01L22/12 ,  H01L31/18

Abstract: A system and method of non-contact measurement of the dopant content of semiconductor material by reflecting infrared (IR) radiation off of the material into an integrating sphere to scatter the received radiation and passing portions of the radiation through band pass filters of differing wavelength ranges, comparing the level of energy passed through each filter and calculating the dopant content by referencing a correlation curve made up of known wafer dopant content for that system.

Abstract translation: 通过将材料中的红外（IR）辐射反射到积分球中来对半导体材料的掺杂剂含量进行非接触测量的系统和方法，以散射所接收的辐射并使辐射的部分通过不同波长范围的带通滤波器 比较通过每个滤波器的能量水平，并通过参考由该系统的已知晶片掺杂剂含量组成的相关曲线来计算掺杂剂含量。

公开(公告)号：WO2011137512A1

公开(公告)日：2011-11-10

申请号：PCT/CA2011/000508

申请日：2011-05-03

Applicant: AURORA CONTROL TECHNOLOGIES INC. ,  HEAVEN, E. Michael ,  DEANS, Gordon Matthew ,  CADIEN, Kenneth ,  BLAINE, Stephen Warren

Inventor： HEAVEN, E. Michael ,  DEANS, Gordon Matthew ,  CADIEN, Kenneth ,  BLAINE, Stephen Warren

IPC: G01N21/35 ,  H01L21/66

CPC classification number: H01L22/12 ,  G01N21/3563 ,  G01N21/9501 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A system and method of non-contact measurement of the dopant content of semiconductor material by reflecting infrared (IR) radiation off of the material and splitting the radiation into two beams, passing each beam through pass band filters of differing wavelength ranges, comparing the level of energy passed through each filter and calculating the dopant content by referencing a correlation curve made up of known wafer dopant content for that system.

Abstract translation: 通过将红外（IR）辐射反射离开材料并将辐射分解成两束，将每个光束通过不同波长范围的通带滤光片，来对半导体材料的掺杂剂含量进行非接触式测量的系统和方法， 的能量通过每个滤波器并且通过参考由该系统的已知晶片掺杂剂含量组成的相关曲线来计算掺杂剂含量。

公开(公告)号：EP2567217A1

公开(公告)日：2013-03-13

申请号：EP11777046.1

申请日：2011-05-03

Applicant: Aurora Control Technologies Inc.

Inventor： HEAVEN, E. Michael ,  DEANS, Gordon Matthew ,  CADIEN, Kenneth ,  BLAINE, Stephen Warren

IPC: G01N21/35 ,  H01L21/66

CPC classification number: H01L22/12 ,  G01N21/3563 ,  G01N21/9501 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A system and method of non-contact measurement of the dopant content of semiconductor material by reflecting infrared (IR) radiation off of the material and splitting the radiation into two beams, passing each beam through pass band filters of differing wavelength ranges, comparing the level of energy passed through each filter and calculating the dopant content by referencing a correlation curve made up of known wafer dopant content for that system.