公开(公告)号：CZ20012348A3

公开(公告)日：2001-11-14

申请号：CZ20012348

申请日：1999-12-17

Applicant: BAE SYSTEMS PLC

Inventor： FELL CHRISTOPHER PAUL ,  TOWNSEND KEVIN ,  STURLAND IAN

IPC: G01C19/56 ,  G01C19/5684

Abstract: A vibrating structure gyroscope having a silicon substantially planar ring vibrating structure (1) capacitive means for imparting drive motion to and sensing motion of the vibrating structure (1), and a screen layer (15) surrounding the capacitive means is made by depositing photoresist material (9) on a glass or silicon substrate (7), hardening, patterning and developing the photoresist (9) to expose areas of the substrate (7), etching the exposed areas to form cavities (10) therein, stripping any remaining photoresist material (9) attaching a silicon layer (8) to the cavitated substrate (7) depositing a layer of aluminium on the silicon layer (8), depositing photoresist material on the aluminium layer, hardening, patterning and developing the photoresist layer to expose areas of the aluminium layer, etching the exposed areas of the aluminium layer to leave regions of aluminium on the silicon layer providing bond pads (11, 12, 13 and 14), stripping the remaining photoresist from the aluminium layer, depositing another layer of photoresist material on the silicon layer (8) over the remaining deposited aluminium layer regions, hardening, patterning and developing the layer of photoresist material to expose areas of the silicon layer (8) and deep reactive ion etching the exposed areas of the silicon layer (8) to form therefrom the substantially planar ring vibrating structure (1) mounted by a hub (4) above the cavities (10).

公开(公告)号：NO20013151A

公开(公告)日：2001-08-22

申请号：NO20013151

申请日：2001-06-22

Applicant: BAE SYSTEMS PLC

Inventor： FELL CHRISTOPHER PAUL ,  TOWNSEND KEVIN ,  STURLAND IAN

IPC: G01C19/5684 ,  G01C19/56

CPC classification number: G01C19/5684

公开(公告)号：HU0104694A2

公开(公告)日：2002-03-28

申请号：HU0104694

申请日：1999-12-17

Applicant: BAE SYSTEMS PLC

Inventor： FELL CHRISTOPHER PAUL ,  STURLAND IAN ,  TOWNSEND KEVIN

IPC: G01C19/56 ,  G01C19/5684

Abstract: A vibrating structure gyroscope having a silicon substantially planar ring vibrating structure (1) capacitive means for imparting drive motion to and sensing motion of the vibrating structure (1), and a screen layer (15) surrounding the capacitive means is made by depositing photoresist material (9) on a glass or silicon substrate (7), hardening, patterning and developing the photoresist (9) to expose areas of the substrate (7), etching the exposed areas to form cavities (10) therein, stripping any remaining photoresist material (9) attaching a silicon layer (8) to the cavitated substrate (7) depositing a layer of aluminium on the silicon layer (8), depositing photoresist material on the aluminium layer, hardening, patterning and developing the photoresist layer to expose areas of the aluminium layer, etching the exposed areas of the aluminium layer to leave regions of aluminium on the silicon layer providing bond pads (11, 12, 13 and 14), stripping the remaining photoresist from the aluminium layer, depositing another layer of photoresist material on the silicon layer (8) over the remaining deposited aluminium layer regions, hardening, patterning and developing the layer of photoresist material to expose areas of the silicon layer (8) and deep reactive ion etching the exposed areas of the silicon layer (8) to form therefrom the substantially planar ring vibrating structure (1) mounted by a hub (4) above the cavities (10).

公开(公告)号：NO20013151L

公开(公告)日：2001-08-22

申请号：NO20013151

申请日：2001-06-22

Applicant: BAE SYSTEMS PLC

Inventor： FELL CHRISTOPHER PAUL ,  TOWNSEND KEVIN ,  STURLAND IAN

IPC: G01C19/56 ,  G01C19/5684

Abstract: A vibrating structure gyroscope having a silicon substantially planar ring vibrating structure (1) capacitive means for imparting drive motion to and sensing motion of the vibrating structure (1), and a screen layer (15) surrounding the capacitive means is made by depositing photoresist material (9) on a glass or silicon substrate (7), hardening, patterning and developing the photoresist (9) to expose areas of the substrate (7), etching the exposed areas to form cavities (10) therein, stripping any remaining photoresist material (9) attaching a silicon layer (8) to the cavitated substrate (7) depositing a layer of aluminium on the silicon layer (8), depositing photoresist material on the aluminium layer, hardening, patterning and developing the photoresist layer to expose areas of the aluminium layer, etching the exposed areas of the aluminium layer to leave regions of aluminium on the silicon layer providing bond pads (11, 12, 13 and 14), stripping the remaining photoresist from the aluminium layer, depositing another layer of photoresist material on the silicon layer (8) over the remaining deposited aluminium layer regions, hardening, patterning and developing the layer of photoresist material to expose areas of the silicon layer (8) and deep reactive ion etching the exposed areas of the silicon layer (8) to form therefrom the substantially planar ring vibrating structure (1) mounted by a hub (4) above the cavities (10).

公开(公告)号：DE69919036T2

公开(公告)日：2004-11-25

申请号：DE69919036

申请日：1999-12-17

Applicant: BAE SYSTEMS PLC FARNBOROUGH

Inventor： FELL CHRISTOPHER PAUL ,  TOWNSEND KEVIN ,  STURLAND IAN

IPC: G01C19/56 ,  G01C19/5684

Abstract: A vibrating structure gyroscope having a silicon substantially planar ring vibrating structure (1) capacitive means for imparting drive motion to and sensing motion of the vibrating structure (1), and a screen layer (15) surrounding the capacitive means is made by depositing photoresist material (9) on a glass or silicon substrate (7), hardening, patterning and developing the photoresist (9) to expose areas of the substrate (7), etching the exposed areas to form cavities (10) therein, stripping any remaining photoresist material (9) attaching a silicon layer (8) to the cavitated substrate (7) depositing a layer of aluminium on the silicon layer (8), depositing photoresist material on the aluminium layer, hardening, patterning and developing the photoresist layer to expose areas of the aluminium layer, etching the exposed areas of the aluminium layer to leave regions of aluminium on the silicon layer providing bond pads (11, 12, 13 and 14), stripping the remaining photoresist from the aluminium layer, depositing another layer of photoresist material on the silicon layer (8) over the remaining deposited aluminium layer regions, hardening, patterning and developing the layer of photoresist material to expose areas of the silicon layer (8) and deep reactive ion etching the exposed areas of the silicon layer (8) to form therefrom the substantially planar ring vibrating structure (1) mounted by a hub (4) above the cavities (10).

公开(公告)号：HU223540B1

公开(公告)日：2004-09-28

申请号：HU0104694

申请日：1999-12-17

Applicant: BAE SYSTEMS PLC

Inventor： FELL CHRISTOPHER PAUL ,  TOWNSEND KEVIN ,  STURLAND IAN

IPC: G01C19/56 ,  G01C19/5684

Abstract: A vibrating structure gyroscope having a silicon substantially planar ring vibrating structure (1) capacitive means for imparting drive motion to and sensing motion of the vibrating structure (1), and a screen layer (15) surrounding the capacitive means is made by depositing photoresist material (9) on a glass or silicon substrate (7), hardening, patterning and developing the photoresist (9) to expose areas of the substrate (7), etching the exposed areas to form cavities (10) therein, stripping any remaining photoresist material (9) attaching a silicon layer (8) to the cavitated substrate (7) depositing a layer of aluminium on the silicon layer (8), depositing photoresist material on the aluminium layer, hardening, patterning and developing the photoresist layer to expose areas of the aluminium layer, etching the exposed areas of the aluminium layer to leave regions of aluminium on the silicon layer providing bond pads (11, 12, 13 and 14), stripping the remaining photoresist from the aluminium layer, depositing another layer of photoresist material on the silicon layer (8) over the remaining deposited aluminium layer regions, hardening, patterning and developing the layer of photoresist material to expose areas of the silicon layer (8) and deep reactive ion etching the exposed areas of the silicon layer (8) to form therefrom the substantially planar ring vibrating structure (1) mounted by a hub (4) above the cavities (10).

公开(公告)号：AT272206T

公开(公告)日：2004-08-15

申请号：AT99962348

申请日：1999-12-17

Applicant: BAE SYSTEMS PLC

Inventor： FELL CHRISTOPHER PAUL ,  TOWNSEND KEVIN ,  STURLAND IAN

IPC: G01C19/56 ,  G01C19/5684

Abstract: A vibrating structure gyroscope having a silicon substantially planar ring vibrating structure (1) capacitive means for imparting drive motion to and sensing motion of the vibrating structure (1), and a screen layer (15) surrounding the capacitive means is made by depositing photoresist material (9) on a glass or silicon substrate (7), hardening, patterning and developing the photoresist (9) to expose areas of the substrate (7), etching the exposed areas to form cavities (10) therein, stripping any remaining photoresist material (9) attaching a silicon layer (8) to the cavitated substrate (7) depositing a layer of aluminium on the silicon layer (8), depositing photoresist material on the aluminium layer, hardening, patterning and developing the photoresist layer to expose areas of the aluminium layer, etching the exposed areas of the aluminium layer to leave regions of aluminium on the silicon layer providing bond pads (11, 12, 13 and 14), stripping the remaining photoresist from the aluminium layer, depositing another layer of photoresist material on the silicon layer (8) over the remaining deposited aluminium layer regions, hardening, patterning and developing the layer of photoresist material to expose areas of the silicon layer (8) and deep reactive ion etching the exposed areas of the silicon layer (8) to form therefrom the substantially planar ring vibrating structure (1) mounted by a hub (4) above the cavities (10).

公开(公告)号：AU762989B2

公开(公告)日：2003-07-10

申请号：AU1872000

申请日：1999-12-17

Applicant: BAE SYSTEMS PLC

Inventor： FELL CHRISTOPHER PAUL ,  TOWNSEND KEVIN ,  STURLAND IAN

IPC: G01C19/56 ,  G01C19/5684

Abstract: A vibrating structure gyroscope having a silicon substantially planar ring vibrating structure (1) capacitive means for imparting drive motion to and sensing motion of the vibrating structure (1), and a screen layer (15) surrounding the capacitive means is made by depositing photoresist material (9) on a glass or silicon substrate (7), hardening, patterning and developing the photoresist (9) to expose areas of the substrate (7), etching the exposed areas to form cavities (10) therein, stripping any remaining photoresist material (9) attaching a silicon layer (8) to the cavitated substrate (7) depositing a layer of aluminium on the silicon layer (8), depositing photoresist material on the aluminium layer, hardening, patterning and developing the photoresist layer to expose areas of the aluminium layer, etching the exposed areas of the aluminium layer to leave regions of aluminium on the silicon layer providing bond pads (11, 12, 13 and 14), stripping the remaining photoresist from the aluminium layer, depositing another layer of photoresist material on the silicon layer (8) over the remaining deposited aluminium layer regions, hardening, patterning and developing the layer of photoresist material to expose areas of the silicon layer (8) and deep reactive ion etching the exposed areas of the silicon layer (8) to form therefrom the substantially planar ring vibrating structure (1) mounted by a hub (4) above the cavities (10).

公开(公告)号：NO20013151D0

公开(公告)日：2001-06-22

申请号：NO20013151

申请日：2001-06-22

Applicant: BAE SYSTEMS PLC

Inventor： FELL CHRISTOPHER PAUL ,  TOWNSEND KEVIN ,  STURLAND IAN

IPC: G01C19/56 ,  G01C19/5684 ,  G01C

Abstract: A vibrating structure gyroscope having a silicon substantially planar ring vibrating structure (1) capacitive means for imparting drive motion to and sensing motion of the vibrating structure (1), and a screen layer (15) surrounding the capacitive means is made by depositing photoresist material (9) on a glass or silicon substrate (7), hardening, patterning and developing the photoresist (9) to expose areas of the substrate (7), etching the exposed areas to form cavities (10) therein, stripping any remaining photoresist material (9) attaching a silicon layer (8) to the cavitated substrate (7) depositing a layer of aluminium on the silicon layer (8), depositing photoresist material on the aluminium layer, hardening, patterning and developing the photoresist layer to expose areas of the aluminium layer, etching the exposed areas of the aluminium layer to leave regions of aluminium on the silicon layer providing bond pads (11, 12, 13 and 14), stripping the remaining photoresist from the aluminium layer, depositing another layer of photoresist material on the silicon layer (8) over the remaining deposited aluminium layer regions, hardening, patterning and developing the layer of photoresist material to expose areas of the silicon layer (8) and deep reactive ion etching the exposed areas of the silicon layer (8) to form therefrom the substantially planar ring vibrating structure (1) mounted by a hub (4) above the cavities (10).

公开(公告)号：AU1872000A

公开(公告)日：2000-07-31

申请号：AU1872000

申请日：1999-12-17

Applicant: BAE SYSTEMS PLC

Inventor： FELL CHRISTOPHER PAUL ,  TOWNSEND KEVIN ,  STURLAND IAN

IPC: G01C19/56 ,  G01C19/5684

Abstract: A vibrating structure gyroscope having a silicon substantially planar ring vibrating structure (1) capacitive means for imparting drive motion to and sensing motion of the vibrating structure (1), and a screen layer (15) surrounding the capacitive means is made by depositing photoresist material (9) on a glass or silicon substrate (7), hardening, patterning and developing the photoresist (9) to expose areas of the substrate (7), etching the exposed areas to form cavities (10) therein, stripping any remaining photoresist material (9) attaching a silicon layer (8) to the cavitated substrate (7) depositing a layer of aluminium on the silicon layer (8), depositing photoresist material on the aluminium layer, hardening, patterning and developing the photoresist layer to expose areas of the aluminium layer, etching the exposed areas of the aluminium layer to leave regions of aluminium on the silicon layer providing bond pads (11, 12, 13 and 14), stripping the remaining photoresist from the aluminium layer, depositing another layer of photoresist material on the silicon layer (8) over the remaining deposited aluminium layer regions, hardening, patterning and developing the layer of photoresist material to expose areas of the silicon layer (8) and deep reactive ion etching the exposed areas of the silicon layer (8) to form therefrom the substantially planar ring vibrating structure (1) mounted by a hub (4) above the cavities (10).