1.
    发明专利
    未知

    公开(公告)号:DE3817009A1

    公开(公告)日:1989-11-30

    申请号:DE3817009

    申请日:1988-05-19

    Applicant: BASF AG

    Abstract: The invention relates to a radiation-sensitive mixture and to a process for the formation of relief patterns. The radiation-sensitive mixture contains (a) a polymeric binder which is insoluble in water and soluble in aqueous-alkaline solutions, and (b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation, the polymeric binder (a) containing 5 to 35 mol% of copolymerised or co-condensed monomer units having acid-sensitive groupings, or the acid-sensitive groupings having been introduced by a polymer-analogous reaction. It is suitable for the formation of relief patterns.

Patent Agency Ranking