公开(公告)号：JPH032757A

公开(公告)日：1991-01-09

申请号：JP4140090

申请日：1990-02-23

Applicant: BASF AG

Inventor： BUORUFUGANGU HIYUMAA ,  BUARUTAA DOBURAA ,  DEIITAA RITOMAN

IPC: G03F7/004 ,  G03F7/027 ,  G03F7/031 ,  G03F7/032

Abstract: PURPOSE: To obtain a photoresist and a relief printing plate having a sharp relief structure by incorporating 0.01-6wt.% of N-nitrosodiphenylamine and/or hydroquinone monomethyl ether into a photopolymerizable recording layer and specifying the weight ratio of these. CONSTITUTION: The photopolymerizable recording layer contains the following compds. (b41) and (b42) at least as a photosensitivity controlling agent (b4) by 0.01-6wt.% of the photopolymerizable recording layer. The compd. (b41) is selected from isoalloxazines and/or alloxazines, while the compd. (b42) is potassium salt of N-nitrocyclohexylhydroxylamine, N-nitrodiphenylamine and/or hydroquinone monomethyl ether. The weight ratio (b41):(b42) is specified to 1:2 to 1:1000. Thereby, a photoresist and a relief printing plate having a sharp relief structure can be obtd.

公开(公告)号：JPH02179890A

公开(公告)日：1990-07-12

申请号：JP28507889

申请日：1989-11-02

Applicant: BASF AG

Inventor： DEIITAA HERUMERINGU ,  RAINAA BETSUKAA ,  BUARUTAA DOBURAA

IPC: C07C49/17 ,  C25B3/10

Abstract: Method for the preparation of dihydroxydiones of the general formula R-CO-CH(OH)-CH(OH)-CO-R I in which R stands for an alkyl radical, in which an aldehyde of the general formula … … in which R has the abovementioned meaning, is electrolysed in a water- containing electrolyte which has a pH of less than 7.