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公开(公告)号:JPS63196649A
公开(公告)日:1988-08-15
申请号:JP2216688
申请日:1988-02-03
Applicant: BASF AG
Inventor: HAINAA GERISEN , GEERUHARUTO TSUAITORAA , DEIITORIHI ZENGAA , GEERUHARUTO HAINTSU
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公开(公告)号:JPS6356553A
公开(公告)日:1988-03-11
申请号:JP20197187
申请日:1987-08-14
Applicant: BASF AG
Inventor: HAINAA GERISEN , DEIITORIHI ZENGAA , BUIRUHERUMU SHIYUTE , MANFUREETO BUARUTAA
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3.Operation method with negative for manufacturing relief image or resist pattern 失效
Title translation: 负责制作放大图像或电阻图案的操作方法公开(公告)号:JPS5953838A
公开(公告)日:1984-03-28
申请号:JP15174183
申请日:1983-08-22
Applicant: Basf Ag
Inventor: RAINHORUTO IYOTSUTO REIRAA , DEIITORIHI ZENGAA , UBUE KURINSUMAN
CPC classification number: G03F7/2022 , G03F7/0045 , G03F7/039 , G03F7/38
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4.Manufacture of gravure plate body having synthetic resin pl-ate layer 失效
Title translation: 具有合成树脂层的复合板体的制造公开(公告)号:JPS5968747A
公开(公告)日:1984-04-18
申请号:JP15174283
申请日:1983-08-22
Applicant: Basf Ag
Inventor: YOON RINHI , RAINHORUTO IYOTSUTO REIRAA , DEIITORIHI ZENGAA
CPC classification number: G03F7/039 , G03F7/0045 , G03F7/2022 , G03F7/38 , Y10S430/128 , Y10S430/136
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5.Positive operation for manufacturing relief image or resist pattern 失效
Title translation: 用于制造放大图像或电阻图案的正确操作公开(公告)号:JPS5967536A
公开(公告)日:1984-04-17
申请号:JP15174083
申请日:1983-08-22
Applicant: Basf Ag
Inventor: RAINHORUTO IYOTSUTO REIRAA , DEIITORIHI ZENGAA
CPC classification number: G03F7/0045 , G03F7/039 , Y10S522/904
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公开(公告)号:JPS55164824A
公开(公告)日:1980-12-22
申请号:JP7025180
申请日:1980-05-28
Applicant: BASF AG
Inventor: DEIITORIHI ZENGAA , HERUMUUTO BARUTSUINSUKI
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