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4 records (took 0.021 seconds)

    1.
    发明专利
    失效

    公开(公告)号：JPH05241330A

    公开(公告)日：1993-09-21

    申请号：JP1221091

    申请日：1991-02-01

    Applicant: BASF AG

    Inventor： MANFUREETO TSUYURUGAA ,  GEERUHARUTO BURETSUKUMAN ,  EREONOORE BIYUSHIYUGESU ,  GEERUHARUTO BAUAA

    IPC: B41N1/16 ,  G03F7/00 ,  G03F7/16 ,  G03F7/18

    Abstract: PURPOSE: To make it possible to produce an endless printing plate body with which an ink holding characteristic and an ink transfer characteristic are made easily reproducibly adjustable as desired by image forming exposure and development of an endless photosensitive recording layer suitable for production of the endless printing plate body by providing a method which is as simple as possible and is usable in multiple applications for the purpose of forming the endless recording layer described above. CONSTITUTION: Specified surface patterns are imparted by a roller treatment to the photosensitive polymer endless recording layer during the time of curing of the recording layer, thereby, the purposes are achieved in a known method for forming the endless solid recording layer of a photosensitive polymer on a cylindrical surface for production of the endless printing plate body by endlessly forming the layer of the photosensitive polymer recording material for forming the recording layer on the cylindrical surface in a fluid state and curing the layer thereon.

    RADIATION-SENSITIVE MIXTURE
    3.
    发明专利
    RADIATION-SENSITIVE MIXTURE 失效

    公开(公告)号：JPH03102356A

    公开(公告)日：1991-04-26

    申请号：JP21729290

    申请日：1990-08-20

    Applicant: BASF AG

    Inventor： FURIIDORITSUHI ZAITSU ,  EERITSUHI BETSUKU ,  YOOAHIMU ROOZAA ,  EREONOORE BIYUSHIYUGESU ,  GIYUNTAA SHIYURUTSU ,  TOOMASU TSUBUETSUTSU

    IPC: C08G18/28 ,  C08G18/32 ,  C08K5/09 ,  C08L33/02 ,  C08L35/00 ,  C08L75/02 ,  G03F7/027 ,  G03F7/038 ,  G03F7/039

    Abstract: PURPOSE: To enhance the photosensitivity and the development processability of a photosensitive layer and to render additional posttreatment unnecessary by using the mixture including a specified ureido-containing reaction product. CONSTITUTION: This mixture comprises the ureido-containing reaction product (A), and an ethylenically mono- or poly-unsaturated organic compound and a photopolymerization initiator or its composition to be selectively added, and the like. The compound (A) to be used is prepared by mixing a di- or poly- isocyanate compound and an organic compound having a primary or secondary amino group (a), and a hydroxy-group-having compound to be selectively added in a specified proportion and allowing each to react with each other, and as the compound (a), the compounds of the formula as shown on the right and the like are preferably, used and in the formula, R is an alkylene or arylene group and the like; R' is an H atom or an alkyl group or the like; and X is an O or S atom or the like.

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