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公开(公告)号：JPH03102356A
公开(公告)日：1991-04-26
申请号：JP21729290
申请日：1990-08-20
Applicant: BASF AG
Inventor： FURIIDORITSUHI ZAITSU , EERITSUHI BETSUKU , YOOAHIMU ROOZAA , EREONOORE BIYUSHIYUGESU , GIYUNTAA SHIYURUTSU , TOOMASU TSUBUETSUTSU
IPC: C08G18/28 , C08G18/32 , C08K5/09 , C08L33/02 , C08L35/00 , C08L75/02 , G03F7/027 , G03F7/038 , G03F7/039
Abstract: PURPOSE: To enhance the photosensitivity and the development processability of a photosensitive layer and to render additional posttreatment unnecessary by using the mixture including a specified ureido-containing reaction product. CONSTITUTION: This mixture comprises the ureido-containing reaction product (A), and an ethylenically mono- or poly-unsaturated organic compound and a photopolymerization initiator or its composition to be selectively added, and the like. The compound (A) to be used is prepared by mixing a di- or poly- isocyanate compound and an organic compound having a primary or secondary amino group (a), and a hydroxy-group-having compound to be selectively added in a specified proportion and allowing each to react with each other, and as the compound (a), the compounds of the formula as shown on the right and the like are preferably, used and in the formula, R is an alkylene or arylene group and the like; R' is an H atom or an alkyl group or the like; and X is an O or S atom or the like.
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2.发明专利
公开(公告)号：JPH0397718A
公开(公告)日：1991-04-23
申请号：JP21729090
申请日：1990-08-20
Applicant: BASF AG
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公开(公告)号：JPH03106917A
公开(公告)日：1991-05-07
申请号：JP21729190
申请日：1990-08-20
Applicant: BASF AG
Inventor： FURIIDORITSUHI ZAITSU , EERITSUHI BETSUKU , YOOAHIMU ROOZAA , EREONOORU BIYUSHIYUGESU , GIYUNTAA SHIYURUTSU , TOOMASU TSUBUETSUTSU
IPC: C08F2/46 , C08F2/54 , C08F290/00 , C08F299/00 , C08G18/67 , G03F7/027 , G03F7/038 , G03F7/039
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公开(公告)号：JPH0397717A
公开(公告)日：1991-04-23
申请号：JP21728990
申请日：1990-08-20
Applicant: BASF AG
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