1.
    发明专利
    未知

    公开(公告)号:DE59004022D1

    公开(公告)日:1994-02-10

    申请号:DE59004022

    申请日:1990-10-04

    Applicant: BASF AG

    Abstract: Preparation of cyclohexanetrionecarboxylic acid thiol esters of the formula I in which R and R represent optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, benzyl or phenyl, and R additionally denotes hydrogen, by reacting a cyclohexanetrione compound II with hydroxylamine or hydroxylamine O-sulphonic acid in an inert solvent at temperatures from 0 to 150 DEG C to give cyclohexanetrione compounds III subsequently reacting the compounds III with a mercaptan IV R -SH IV in the presence of an anhydrous acid HX to give cyclohexanetrione imidothioester salts V where X represents the acid radical, and hydrolysing the compounds V to give the cyclohexanetrione carboxylic acid thiol esters I.

    2.
    发明专利
    未知

    公开(公告)号:DK1078916T3

    公开(公告)日:2003-01-06

    申请号:DK00115618

    申请日:2000-07-20

    Applicant: BASF AG

    Abstract: Preparation of N-acyl derivatives (I) using readily available starting materials. N-acyl derivatives of formula R -C(O)N(H)C(R )X (I) are prepared by reacting, in the presence of a compound of formula R -COOH (II), a carbonic acid amide of formula R -CONH2 (III) and a glyoxalmonoacetal derivative of formula R C(O)C(OR )OR (IV). R , R = H or optionally substituted alkyl or aryl; R ,R = 1 - 12C alkyl; and X = CH(OR ) or COOR . An Independent claim is also included for a compound of formula R -C(O)N(H)C(R )C(OR )OR (V).

    3.
    发明专利
    未知

    公开(公告)号:ES2062245T3

    公开(公告)日:1994-12-16

    申请号:ES90118944

    申请日:1990-10-04

    Applicant: BASF AG

    Abstract: Preparation of cyclohexanetrionecarboxylic acid thiol esters of the formula I in which R and R represent optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, benzyl or phenyl, and R additionally denotes hydrogen, by reacting a cyclohexanetrione compound II with hydroxylamine or hydroxylamine O-sulphonic acid in an inert solvent at temperatures from 0 to 150 DEG C to give cyclohexanetrione compounds III subsequently reacting the compounds III with a mercaptan IV R -SH IV in the presence of an anhydrous acid HX to give cyclohexanetrione imidothioester salts V where X represents the acid radical, and hydrolysing the compounds V to give the cyclohexanetrione carboxylic acid thiol esters I.

    4.
    发明专利
    未知

    公开(公告)号:DK0422493T3

    公开(公告)日:1994-01-24

    申请号:DK90118944

    申请日:1990-10-04

    Applicant: BASF AG

    Abstract: Preparation of cyclohexanetrionecarboxylic acid thiol esters of the formula I in which R and R represent optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, benzyl or phenyl, and R additionally denotes hydrogen, by reacting a cyclohexanetrione compound II with hydroxylamine or hydroxylamine O-sulphonic acid in an inert solvent at temperatures from 0 to 150 DEG C to give cyclohexanetrione compounds III subsequently reacting the compounds III with a mercaptan IV R -SH IV in the presence of an anhydrous acid HX to give cyclohexanetrione imidothioester salts V where X represents the acid radical, and hydrolysing the compounds V to give the cyclohexanetrione carboxylic acid thiol esters I.

    6.
    发明专利
    未知

    公开(公告)号:AT229495T

    公开(公告)日:2002-12-15

    申请号:AT00115618

    申请日:2000-07-20

    Applicant: BASF AG

    Abstract: Preparation of N-acyl derivatives (I) using readily available starting materials. N-acyl derivatives of formula R -C(O)N(H)C(R )X (I) are prepared by reacting, in the presence of a compound of formula R -COOH (II), a carbonic acid amide of formula R -CONH2 (III) and a glyoxalmonoacetal derivative of formula R C(O)C(OR )OR (IV). R , R = H or optionally substituted alkyl or aryl; R ,R = 1 - 12C alkyl; and X = CH(OR ) or COOR . An Independent claim is also included for a compound of formula R -C(O)N(H)C(R )C(OR )OR (V).

    7.
    发明专利
    未知

    公开(公告)号:DE3934205A1

    公开(公告)日:1991-04-18

    申请号:DE3934205

    申请日:1989-10-13

    Applicant: BASF AG

    Abstract: Preparation of cyclohexanetrionecarboxylic acid thiol esters of the formula I in which R and R represent optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, benzyl or phenyl, and R additionally denotes hydrogen, by reacting a cyclohexanetrione compound II with hydroxylamine or hydroxylamine O-sulphonic acid in an inert solvent at temperatures from 0 to 150 DEG C to give cyclohexanetrione compounds III subsequently reacting the compounds III with a mercaptan IV R -SH IV in the presence of an anhydrous acid HX to give cyclohexanetrione imidothioester salts V where X represents the acid radical, and hydrolysing the compounds V to give the cyclohexanetrione carboxylic acid thiol esters I.

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