Abstract:
AN IMPROVED PROCESS FOR THE PRODUCTION OF ACRYLIC ACID BY HEATING RESIDUES CONTAINING ACRYLOYLHYDRACRYLIC ACID, B-ACETOXYPROPIONIC ACID, HYDRACRYLIC ACID, DIHYDRACRYLIC ACID AND POLYMERIZED HYDRACRYLIC ACIDS, SUCH AS ARE OBTAINED IN WORKING UP ACRYLIC ACIDS, AT TEMPERATURE OF FROM 130* TO 250*C. IN THE PRESENCE OF CATALYST, THE IMPROVEING A SECONDARY OR TERTIARY AMINO GROUP, OR A TERTIARY PHOSPHINE. ACRYLIC ACID, AS SUCH AND IN THE FORM OF ITS ESTERS, IS USED FOR THE PRODUCTION OF POLYMERS.
Abstract:
Ethylenically unsaturated polymerizable monomers are stabilized against unwanted polymerization by the addition of from about 0.0001% to 2% by weight of a substituted oxadiazole of the general formula or or a mixture of such oxadiazoles, wherein each of x1 to x5 represents a halogen atom or one of the radicals -N(R)2, -OR or -R, and R represents a hydrogen atom or an alkyl, cycloalkyl, aralkyl or aryl radical or an aryl radical which is substituted by nitro groups, or in which the substituents x2 and x3 together represent a methylenedioxy group. Specified monomers which are stabilized are vinyl chloride, vinylidene chloride, 2-chloro-buta-1,3-diene, styrene, a -methyl styrene, vinyl toluenes, vinyl pyridines, vinyl imidazoles, vinyl pyrrolidone, vinyl carbazole, acrylic and methacrylic acids and their esters with linear, branched and cycloaliphatic alcohols containing 1-20 carbon atoms, acrylamide, methacrylamide, acrylonitrile, vinyl esters of carboxylic acids containing 2-20 carbon atoms, divinyl ether, tert-butyl vinyl ether, methyl vinyl ketone, tert-butyl vinyl ketone, and vinyl sulphonic and vinyl phosphonic acids and their salts. The monomers may be diluted with solvents such as cyclohexane, octane, benzene and toluene. Numerous examples of suitable oxadiazoles are given. Examples are given of the stabilization of monomers. Example (3) describes polymerization of the monomers.
Abstract:
Ethylenically unsaturated polymerizable monomers are stabilized against unwanted polymerization by the addition of from about 0.0001% to 2% by weight of a substituted oxadiazole of the general formula or or a mixture of such oxadiazoles, wherein each of x1 to x5 represents a halogen atom or one of the radicals -N(R)2, -OR or -R, and R represents a hydrogen atom or an alkyl, cycloalkyl, aralkyl or aryl radical or an aryl radical which is substituted by nitro groups, or in which the substituents x2 and x3 together represent a methylenedioxy group. Specified monomers which are stabilized are vinyl chloride, vinylidene chloride, 2-chloro-buta-1,3-diene, styrene, a -methyl styrene, vinyl toluenes, vinyl pyridines, vinyl imidazoles, vinyl pyrrolidone, vinyl carbazole, acrylic and methacrylic acids and their esters with linear, branched and cycloaliphatic alcohols containing 1-20 carbon atoms, acrylamide, methacrylamide, acrylonitrile, vinyl esters of carboxylic acids containing 2-20 carbon atoms, divinyl ether, tert-butyl vinyl ether, methyl vinyl ketone, tert-butyl vinyl ketone, and vinyl sulphonic and vinyl phosphonic acids and their salts. The monomers may be diluted with solvents such as cyclohexane, octane, benzene and toluene. Numerous examples of suitable oxadiazoles are given. Examples are given of the stabilization of monomers. Example (3) describes polymerization of the monomers.