公开(公告)号：WO0040775A3

公开(公告)日：2000-11-09

申请号：PCT/EP9910372

申请日：1999-12-24

Applicant: BASF AG ,  HUEFFER STEPHAN ,  DECKERS ANDREAS ,  WEBER WILHELM ,  KLIMESCH ROGER ,  LITTMANN DIETER ,  STURM JUERGEN ,  LERCH GOETZ

Inventor： HUEFFER STEPHAN ,  DECKERS ANDREAS ,  WEBER WILHELM ,  KLIMESCH ROGER ,  LITTMANN DIETER ,  STURM JUERGEN ,  LERCH GOETZ

IPC: C08F2/01 ,  C08F10/00 ,  C23C18/16 ,  C23C18/31 ,  C23C18/34 ,  C23C18/36 ,  C23C18/40 ,  C23C18/48 ,  C23C18/50 ,  C23C18/52 ,  F28F19/02 ,  F28F19/06

CPC classification number: F28F19/02 ,  C23C18/1616 ,  C23C18/1662 ,  C23C18/36 ,  Y10T428/12556 ,  Y10T428/12944 ,  Y10T428/31678

Abstract: The invention relates to a method for coating a reactor. Said method is characterised in that a metal layer or a metal polymer dispersion layer is deposited on the inner surface of the reactor in a currentless manner by contacting the surfaces to a metal electrolytic solution which contains a reduction means and a halogenated polymer in dispersed form in addition to the metal electrolyte. Said halogenated polymer can optionally be deposited.

Abstract translation: 一种通常由表面与金属电解质溶液接触涂覆的反应器，其特征在于，沉积金属层或反应器内部表面上的金属 - 聚合物分散体层方法，其中，除了金属电解质，还原剂和任选地，一个被沉积卤化 含有分散形式的聚合物。

公开(公告)号：AT245210T

公开(公告)日：2003-08-15

申请号：AT99965554

申请日：1999-12-24

Applicant: BASF AG

Inventor： HUEFFER STEPHAN ,  DECKERS ANDREAS ,  WEBER WILHELM ,  KLIMESCH ROGER ,  LITTMANN DIETER ,  STURM JUERGEN ,  LERCH GOETZ

IPC: C08F2/01 ,  C08F10/00 ,  C23C18/16 ,  C23C18/31 ,  C23C18/34 ,  C23C18/36 ,  C23C18/40 ,  C23C18/48 ,  C23C18/50 ,  C23C18/52 ,  F28F19/02 ,  F28F19/06

Abstract: The present invention relates to a process for coating apparatuses and apparatus parts for chemical plant construction-which are taken to mean, for example, apparatus, tank and reactor walls, discharge devices, valves, pumps, filters, compressors, centrifuges, columns, dryers, comminution machines, internals, packing elements and mixing elements-wherein a metal layer or a metal/polymer dispersion layer is deposited in an electroless manner on the apparatus(es) or apparatus part(s) to be coated by bringing the parts into contact with a metal electrolyte solution which, in addition to the metal electrolyte, comprises a reducing agent and optionally the polymer or polymer mixture to be deposited in dispersed form, where at least one polymer is halogenated.

公开(公告)号：DE59906313D1

公开(公告)日：2003-08-21

申请号：DE59906313

申请日：1999-12-24

Applicant: BASF AG

Inventor： HUEFFER STEPHAN ,  DECKERS ANDREAS ,  WEBER WILHELM ,  KLIMESCH ROGER ,  LITTMANN DIETER ,  STURM JUERGEN ,  LERCH GOETZ

IPC: C08F2/01 ,  C08F10/00 ,  C23C18/16 ,  C23C18/31 ,  C23C18/34 ,  C23C18/36 ,  C23C18/40 ,  C23C18/48 ,  C23C18/50 ,  C23C18/52 ,  F28F19/02 ,  F28F19/06

Abstract: The present invention relates to a process for coating apparatuses and apparatus parts for chemical plant construction-which are taken to mean, for example, apparatus, tank and reactor walls, discharge devices, valves, pumps, filters, compressors, centrifuges, columns, dryers, comminution machines, internals, packing elements and mixing elements-wherein a metal layer or a metal/polymer dispersion layer is deposited in an electroless manner on the apparatus(es) or apparatus part(s) to be coated by bringing the parts into contact with a metal electrolyte solution which, in addition to the metal electrolyte, comprises a reducing agent and optionally the polymer or polymer mixture to be deposited in dispersed form, where at least one polymer is halogenated.