Use of aliphatic carboxylic acids or anhydride(s)

    公开(公告)号:DE4141272A1

    公开(公告)日:1993-06-17

    申请号:DE4141272

    申请日:1991-12-14

    Applicant: BASF AG

    Abstract: Use of carboxlic acids (I) of formula (I) (where R1, R2, R3 are H, OH, COOH, ot 1-6C alkyl; and x, y, z are 0-6) and/or anhydrides (IA) of at least one (I) to inhibit formation or growth of water trees in ethylene (homo- and/or co-) polymers (II) under influence of strong electric fields. (A) Electrically insulating mixts. (III) based on (II) contg. on (III), 0.01-5% (all pts. wt.) at least one (I) and/or at least one (IA); and (B) Electrically semiconducting mixts. (IV) based on (II), contg. on (IV), (B1) 10-50% electrically conductive pigment; (B2) 0.01-5% at least one (I) and/or at least one (IA), are also claimed. (I) is pref. acetic, propionic, butyric, isobutyric, valeric, isovaleric, pivalic, lauric, myristic, palmitic, stearic, malonic succinic, glutaric, adipic, pimelic, suberic, azelaic, sebacic, malic, tartaric, racemic, tartronic, mesoxalic or citric acid and (IA) is anhydride of one of these acids and/or mixed anhydride of at least two of these acids, and is esp. citric acid and/or its anhydride.

    Use of aliphatic carboxylic acids or anhydride(s)

    公开(公告)号:DE4115751A1

    公开(公告)日:1992-11-19

    申请号:DE4115751

    申请日:1991-05-15

    Applicant: BASF AG

    Abstract: Use of carboxlic acids (I) of formula (I) (where R1, R2, R3 are H, OH, COOH, ot 1-6C alkyl; and x, y, z are 0-6) and/or anhydrides (IA) of at least one (I) to inhibit formation or growth of water trees in ethylene (homo- and/or co-) polymers (II) under influence of strong electric fields. (A) Electrically insulating mixts. (III) based on (II) contg. on (III), 0.01-5% (all pts. wt.) at least one (I) and/or at least one (IA); and (B) Electrically semiconducting mixts. (IV) based on (II), contg. on (IV), (B1) 10-50% electrically conductive pigment; (B2) 0.01-5% at least one (I) and/or at least one (IA), are also claimed. (I) is pref. acetic, propionic, butyric, isobutyric, valeric, isovaleric, pivalic, lauric, myristic, palmitic, stearic, malonic succinic, glutaric, adipic, pimelic, suberic, azelaic, sebacic, malic, tartaric, racemic, tartronic, mesoxalic or citric acid and (IA) is anhydride of one of these acids and/or mixed anhydride of at least two of these acids, and is esp. citric acid and/or its anhydride.

    5.
    发明专利
    未知

    公开(公告)号:DE3830007A1

    公开(公告)日:1990-03-15

    申请号:DE3830007

    申请日:1988-09-03

    Applicant: BASF AG

    Abstract: A high molecular weight ethylene copolymer is prepared by high-pressure copolymerization of ethylene with an alpha , beta -ethylenically unsaturated carboxylic acid, carboxylic anhydride or a derivative thereof in the presence of a tertiary organic monoamine, preferably from 10 to 100 mol % thereof, based on the unsaturated carboxylic acid used, and can be used for preparing adhesion promoters and cable sheathing.

    6.
    发明专利
    未知

    公开(公告)号:DE59209521D1

    公开(公告)日:1998-11-19

    申请号:DE59209521

    申请日:1992-04-23

    Applicant: BASF AG

    Abstract: Carboxylic acids of the general formula I where the indices and the variables have the following meanings: R , R and R : independently of one another, a hydrogen atom and a hydroxyl, carboxyl and C1- to C6-alkyl group, x, y and z: independently of one another, 0 or an integer from 1 to 6, and/or their anhydrides are capable of permanently suppressing the formation of water trees in electrical medium- and high-voltage cables containing electrically insulating and/or electrically semiconducting layers based on ethylene homopolymers and/or copolymers. This is even the case if the layers concerned contain water-soluble, basic salts. Accordingly, polymeric mixtures based on ethylene homopolymers and/or copolymers containing the abovementioned carboxylic acids and/or their anhydrides are eminently suitable for manufacturing the electrically insulating and electrically semiconducting layers such as those used in electrical medium- and high-voltage cables.

    Use of aliphatic carboxylic acids or anhydride(s)

    公开(公告)号:DE4141273A1

    公开(公告)日:1993-06-17

    申请号:DE4141273

    申请日:1991-12-14

    Applicant: BASF AG

    Abstract: Use of carboxlic acids (I) of formula (I) (where R1, R2, R3 are H, OH, COOH, ot 1-6C alkyl; and x, y, z are 0-6) and/or anhydrides (IA) of at least one (I) to inhibit formation or growth of water trees in ethylene (homo- and/or co-) polymers (II) under influence of strong electric fields. (A) Electrically insulating mixts. (III) based on (II) contg. on (III), 0.01-5% (all pts. wt.) at least one (I) and/or at least one (IA); and (B) Electrically semiconducting mixts. (IV) based on (II), contg. on (IV), (B1) 10-50% electrically conductive pigment; (B2) 0.01-5% at least one (I) and/or at least one (IA), are also claimed. (I) is pref. acetic, propionic, butyric, isobutyric, valeric, isovaleric, pivalic, lauric, myristic, palmitic, stearic, malonic succinic, glutaric, adipic, pimelic, suberic, azelaic, sebacic, malic, tartaric, racemic, tartronic, mesoxalic or citric acid and (IA) is anhydride of one of these acids and/or mixed anhydride of at least two of these acids, and is esp. citric acid and/or its anhydride.

    Use of aliphatic carboxylic acids or anhydride(s)

    公开(公告)号:DE4135201A1

    公开(公告)日:1992-11-19

    申请号:DE4135201

    申请日:1991-05-15

    Applicant: BASF AG

    Abstract: Use of carboxlic acids (I) of formula (I) (where R1, R2, R3 are H, OH, COOH, ot 1-6C alkyl; and x, y, z are 0-6) and/or anhydrides (IA) of at least one (I) to inhibit formation or growth of water trees in ethylene (homo- and/or co-) polymers (II) under influence of strong electric fields. (A) Electrically insulating mixts. (III) based on (II) contg. on (III), 0.01-5% (all pts. wt.) at least one (I) and/or at least one (IA); and (B) Electrically semiconducting mixts. (IV) based on (II), contg. on (IV), (B1) 10-50% electrically conductive pigment; (B2) 0.01-5% at least one (I) and/or at least one (IA), are also claimed. (I) is pref. acetic, propionic, butyric, isobutyric, valeric, isovaleric, pivalic, lauric, myristic, palmitic, stearic, malonic succinic, glutaric, adipic, pimelic, suberic, azelaic, sebacic, malic, tartaric, racemic, tartronic, mesoxalic or citric acid and (IA) is anhydride of one of these acids and/or mixed anhydride of at least two of these acids, and is esp. citric acid and/or its anhydride.

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