1.
    发明专利
    未知

    公开(公告)号:BRPI0508602A

    公开(公告)日:2007-07-31

    申请号:BRPI0508602

    申请日:2005-03-16

    Applicant: BASF AG

    Abstract: The invention relates to a process for preparing semicarbazone compounds of the formula I, where R1 and R2 are each independently hydrogen, halogen, CN, C1-C4-alkyl, C1-C4-alkoxy, C1-C4-haloalkyl or C1-C4-haloalkoxy, and R3 is C1-C4-alkoxy, C1-C4-haloalkyl or C1-C4-haloalkoxy, by reacting a hydrazone compound of the general formula II, where R is C1-C4-alkoxy, amino, C1-C4-alkylamino or di(C1-C4-alkyl)amino, and R1, R2 are each as defined above, with an aniline compound of the general formula III where R3 is as defined above.

    Method for producing semicarbazones

    公开(公告)号:AU2005223331A1

    公开(公告)日:2005-09-29

    申请号:AU2005223331

    申请日:2005-03-16

    Applicant: BASF AG

    Abstract: The invention relates to a process for preparing semicarbazone compounds of the formula I, where R1 and R2 are each independently hydrogen, halogen, CN, C1-C4-alkyl, C1-C4-alkoxy, C1-C4-haloalkyl or C1-C4-haloalkoxy, and R3 is C1-C4-alkoxy, C1-C4-haloalkyl or C1-C4-haloalkoxy, by reacting a hydrazone compound of the general formula II, where R is C1-C4-alkoxy, amino, C1-C4-alkylamino or di(C1-C4-alkyl)amino, and R1, R2 are each as defined above, with an aniline compound of the general formula III where R3 is as defined above.

    METHOD FOR PRODUCING SEMICARBAZONES

    公开(公告)号:CA2558368A1

    公开(公告)日:2005-09-29

    申请号:CA2558368

    申请日:2005-03-16

    Applicant: BASF AG

    Abstract: The invention relates to a process for preparing semicarbazone compounds of the formula I, where R1 and R2 are each independently hydrogen, halogen, CN, C1-C4-alkyl, C1-C4-alkoxy, C1-C4-haloalkyl or C1-C4-haloalkoxy, and R3 is C1-C4-alkoxy, C1-C4-haloalkyl or C1-C4-haloalkoxy, by reacting a hydrazone compound of the general formula II, where R is C1-C4-alkoxy, amino, C1-C4-alkylamino or di(C1-C4-alkyl)amino, and R1, R2 are each as defined above, with an aniline compound of the general formula III where R3 is as defined above.

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