中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

8 records (took 0.024 seconds)

    MANUFACTURE OF MICRO-PATTERN FORMED BODY
    2.
    发明专利
    MANUFACTURE OF MICRO-PATTERN FORMED BODY 失效

    公开(公告)号：JPH06204126A

    公开(公告)日：1994-07-22

    申请号：JP17151593

    申请日：1993-07-12

    Applicant: BASF AG

    Inventor： PEETAA HESERU ,  GEERUHARUTO HOFUMAN

    IPC: B01J19/00 ,  B29C35/08 ,  B29C59/16 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  H01L21/027

    Abstract: PURPOSE: To provide a method, which brings a bond of an arbitrary polymer with a carrier without limiting the kind of a polymer in the same manner as a conventional method and moreover, brings this bond within at least several hours and if circumstances requires, accurately and reprodubibly in the time of the order of minute. CONSTITUTION: In a method of manufacturing a microscopic pattern, which has a pattern depth in the extent of several μms to 1 mm, by a method wherein X-rays are applied to a polymer and the image formation part to be exposed of the polymer is removed, the polymer prior to the exposure of the image formation part is molten in a state that it is pressed, whereby the polymer is mounted on a conductive carrier in a layer thickness in the extent of several μms to one mm and is made to secure to the carrier.

    MANUFACTURE OF MICROSTRUCTURE ELEMENT
    3.
    发明专利
    MANUFACTURE OF MICROSTRUCTURE ELEMENT 失效

    公开(公告)号：JPH06177015A

    公开(公告)日：1994-06-24

    申请号：JP21878793

    申请日：1993-09-02

    Applicant: BASF AG

    Inventor： PEETAA HESERU ,  OSUKARU SHIYUTEFUAN ,  GEERUHARUTO HOFUMAN ,  YURUGEN RANGEN

    IPC: B29C35/08 ,  B29C43/18 ,  B29C59/16 ,  B29C70/78 ,  B81B1/00 ,  B81C1/00 ,  G03F7/16 ,  G03F7/20 ,  H01L21/027

    Abstract: PURPOSE: To provide a method in which all desired polymers can be processed, so that a polymer/substrate complex having durability can be obtained, and to form this polymer with exactness and reproducibility in an extremely short time such that a highly exact layer thickness can be obtained for the entire area, and cracks are not generated. CONSTITUTION: This method for manufacturing a microstructural element, having a structure depth ranging from several μm to a mm with image formation radiation by X-rays of a polymer and the removal of an image formation radiated polymer band. Before the image formation radiation, a polymer 6 is formed on a conductive substrate 5, and the polymer is exactly fixed to it in a layer thickness, ranging from several μms to a mm by pressure-fusion with a pressurizing member 1 in a frame 2.

Patent Agency Ranking