-
Patent Agency Ranking
公开(公告)号：ES2111601T3
公开(公告)日：1998-03-16
申请号：ES92120404
申请日：1992-11-30
Applicant: BASF AG
Inventor： HOESSEL PETER DR , HOFFMANN GERHARD DR , LANGEN JUERGEN DR , REINECKE HOLGER DR
Abstract: The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with x-rays, where the polymers employed are aliphatic polyesters.
-
公开(公告)号：DE59209181D1
公开(公告)日：1998-03-12
申请号：DE59209181
申请日：1992-11-30
Applicant: BASF AG
Inventor： HOESSEL PETER DR , HOFFMANN GERHARD DR , LANGEN JUERGEN DR , REINECKE HOLGER DR
Abstract: The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with x-rays, where the polymers employed are aliphatic polyesters.
-
公开(公告)号：AT163096T
公开(公告)日：1998-02-15
申请号：AT92120404
申请日：1992-11-30
Applicant: BASF AG
Inventor： HOESSEL PETER DR , HOFFMANN GERHARD DR , LANGEN JUERGEN DR , REINECKE HOLGER DR
Abstract: The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with x-rays, where the polymers employed are aliphatic polyesters.
-
公开(公告)号：DE4227868A1
公开(公告)日：1994-02-24
申请号：DE4227868
申请日：1992-08-22
Applicant: BASF AG
Inventor： WUENSCH THOMAS DR , HOFFMANN GERHARD DR , HOESSEL PETER DR , LANGEN JUERGEN DR , REINECKE HOLGER DR
Abstract: In selective dissolution of homo- or copolyoxymethylene (I), irradiated with actinic radiation, the liq. organic developer medium consists of a phenol deriv. (II) with free phenolic OH gps. and at least one other substit. in the phenol ring. Synchrotron radiation is used. To make micro-mouldings, (I) is irradiated selectively with actinic parallel radiation from x-ray sources in an erosion depth of 10-2000 microns with lateral dimensions to less than 10 microns and developed in (II). USE/ADVANTAGE - The process is used for making micro-mouldings with high aspect ratio (claimed). Cpds. of (II) type are less toxic than phenol, have less odour, are readily available and give structures of better quality.
-
公开(公告)号：DE4141352A1
公开(公告)日：1993-06-17
申请号：DE4141352
申请日：1991-12-14
Applicant: BASF AG
Inventor： HOESSEL PETER DR , HOFFMANN GERHARD DR , LANGEN JUERGEN DR , REINECKE HOLGER DR
Abstract: The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with x-rays, where the polymers employed are aliphatic polyesters.
-
-
-
-
Search Results
5
records
(took 0.019 seconds)
