公开(公告)号：US3926636A

公开(公告)日：1975-12-16

申请号：US39224273

申请日：1973-08-28

Applicant: BASF AG

Inventor： BARZYNSKI HELMUT ,  MARX MATTHIAS ,  STORCK GERHARD ,  SAENGER DIETRICH

IPC: C08K5/00 ,  C08G18/46 ,  C08G18/62 ,  C08G63/685 ,  C08G63/91 ,  C08K5/29 ,  C08K5/32 ,  C08K5/3412 ,  C08L33/00 ,  C08L33/02 ,  C08L33/04 ,  C08L67/00 ,  C08L77/00 ,  C08L101/02 ,  G03F7/038 ,  G03C1/70

CPC classification number: C08G18/6283 ,  C08G18/463 ,  C08G63/6854 ,  C08G63/914 ,  C08K5/29 ,  C08K5/34 ,  G03F7/038 ,  Y10S430/121 ,  C08L101/02

Abstract: A light-curable composition consisting of: (A) a substance containing at least two aromatic or heteroaromatic onitrocarbinol ester groups of the general formula:

IN WHICH Y is an aromatic or heteroaromatic ring system and X is hydrogen or alkyl, aryl alkaryl or aralkyl; and (B) a compound having et laest two aziridine groups or isocyanate groups in the molecule. The photocurable composition of the invention is particularly suitable for the production of coatings and printing plates.

公开(公告)号：ES2053485T3

公开(公告)日：1994-08-01

申请号：ES87111931

申请日：1987-08-18

Applicant: BASF AG

Inventor： GOERRISSEN HEINER DR ,  SAENGER DIETRICH ,  SCHUETTE WILHELM DR ,  WALTER MANFRED DR

IPC: C08K3/34 ,  C08L59/00 ,  C08L75/00 ,  C08L75/04

公开(公告)号：DE3783292D1

公开(公告)日：1993-02-11

申请号：DE3783292

申请日：1987-08-18

Applicant: BASF AG

Inventor： GOERRISSEN HEINER DR ,  SAENGER DIETRICH ,  SCHUETTE WILHELM DR ,  WALTER MANFRED DR

IPC: C08K3/34 ,  C08L59/00 ,  C08L75/00 ,  C08L75/04

Abstract: Moulding compsns. consist of (A) at least one polyoxymethylene homo- and/or copolymer, (B) at least one thermoplastic polyurethane elastomer and (C) opt. additives and (D) 0.005-2 wt.% w.r.t. the total wt. of (A) plus (B), of at least one alkaline earth silicate as additive to improve heat-stability. (D) has formula MO.xSiO2.nH2O (I) where M = alkaline earth metal, esp. Ca or Mg; X = no. 1.4-10 and n = at least zero.

公开(公告)号：CA1147195A

公开(公告)日：1983-05-31

申请号：CA353156

申请日：1980-06-02

Applicant: BASF AG

Inventor： SAENGER DIETRICH ,  BARZYNSKI HELMUT

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  H01L21/027 ,  G03F7/10

Abstract: O.Z. 0050/033896 A positive working photosensitive film resist material suitable for multiple image-wise exposure comprises, on a dimensionally stable base film, a photosensitive coating which contains (a) a polymer which possesses aromatic or hetero-aromatic o-nitrocarbinol ester groups (for example o-nitrobenzyl acrylate units) and which can be washed out, after exposure, with an alkaline solvent, and (b) a transparent plasticizer compatible with (a). The product may be used as photopolymer dry film resist material in the production of electrical conductor boards, chemically milled fine-line parts, and identification plates.