公开(公告)号：DE2429177A1

公开(公告)日：1976-01-22

申请号：DE2429177

申请日：1974-06-18

Applicant: BASF AG

Inventor： STECK WERNER DR ,  WUNSCH GERD DR ,  DEIGNER PAUL DR ,  OSTERTAG WERNER DR ,  UHL KARL DR ING

IPC: C09D5/23 ,  C23C16/40 ,  C23C16/56 ,  H01F10/20 ,  H01F41/14 ,  C23C11/08 ,  G11B5/62

Abstract: In the prodn. of thin cohesive magnetic films based on Fe oxides and opt. Co oxides or their redn. prods. on substrates by gas plating, with thermal decompsn., with complex cpds. (I) of Fe and opt. Co and/or Ni on the hot substrate surface in the presence of O2 and redn. of the oxide film with H2, a crystalline metal oxide film is deposited on the surface at 150-300 degrees C in the presence of an inert gas or inert gas-H2 stream contg. 0.05-1.3 vol.% O2 or 0.25-6.5% air and the oxide film is reduced to a magnetic oxide or metallic film with H2 or H2 mixts. at 250-400 degrees C. Binder-free magnetic films with good adhesion and reproducible magnetic properties can be produced using only 2 stages and under conditions suitable for the Al discs normally used as substrate, for which thermal treatment above 300 degrees C and esp. above 380 degrees C is excluded.

公开(公告)号：DE2218306A1

公开(公告)日：1973-10-25

申请号：DE2218306

申请日：1972-04-15

Applicant: BASF AG

Inventor： DEIGNER PAUL DR ,  LOESER WERNER DR ,  ALTMUELLER HELMUT ,  SCHOETTLE KLAUS ,  UHL KARL DR ING ,  GAWLIK PETER DR ING

IPC: C25D7/00 ,  C23C14/06 ,  G11B5/72 ,  G11B5/74 ,  H01F10/00

Abstract: 1417521 Coated magnetic recording media BADISCHE ANILIN-& SODA-FABRIK AG 13 April 1973 [15 April 1972] 17821/73 Heading C7F A magnetic recording medium comprises a dimensionally stable base coated with a ferromagnetic metal film at least 600 Š thick which in turn is coated with WC. The base may be a disc of Al or Al alloy or a sheet of polyimide or poly(amideimide) and the ferromagnetic layer may be Co-P, or a P, B, or N- containing layer of Co-Ni, Co-Fe, or Co-Ni-Fe, typically 600-6000 Š thick, produced by electro-plating, electroless deposition or vacuum vapour deposition. The WC layer, produced e.g. by electron beam evaporation, may be up to 2500 Š, e.g. 80-1500 Š, and provides wearresistance.

公开(公告)号：DE2161083A1

公开(公告)日：1973-06-14

申请号：DE2161083

申请日：1971-12-09

Applicant: BASF AG

Inventor： MICHEL HANS-JUERGEN DR ,  UHL KARL DR ING ,  SEIBERTH HANS DR ING ,  LOEWENBERG GUSTAV DIPL ING ,  REIMER DIETER

IPC: H01F1/06 ,  G11B5/845 ,  G11B5/84