公开(公告)号：JPH06211649A

公开(公告)日：1994-08-02

申请号：JP28912693

申请日：1993-11-18

Applicant: BASF AG

Inventor： KURAUSU HARUTO ,  HARUTOMUUTO HIPUSUTO ,  YURUGEN DEMUBOFUSUKII ,  RAINHARUTO SHIYUPENGURAA ,  ERUNSUTO FURAIKU

IPC: A61K9/32 ,  A61K9/22 ,  A61K9/28 ,  A61K9/50 ,  A61K9/52 ,  A61K47/34

Abstract: PURPOSE: To prepare the subject agent which shows reproducible and uniform release behavior irrespective of layer thickness and is pollution-free and capable of having a high content of active substance. CONSTITUTION: This agent comprises nuclei (carrier) each containing or consisting of a pharmaceutically-active substance, and at least one coating layer which is firmly deposited on the surface of each of the nuclei so as to hinder the active substance from being diffused and also has a 0.01 to 10 μm thickness and the formation of which comprises coating the active substance carrier with a chemical network structure by using a plasma-aided chemical deposition technique. This coating layer contains at least elemental silicon and elemental carbon, preferably in amounts sufficient to provide a 1 to 40 atom % Si content and a 60 to 99 atom % C content, respectively. This preparation of the agent comprises forming the coating layer on the active substance carrier under certain moving conditions by concurrently performing deposition of the coating layer constituents and formation of the chemical network structure in an enclosed space through plasma-aided decomposition of a gaseous mixture contg. at least one organosilicic compound (preferably, hexamethyldisiloxane).