公开(公告)号：JPH03153256A

公开(公告)日：1991-07-01

申请号：JP28451090

申请日：1990-10-24

Applicant: BASF AG

Inventor： ZON GUIEN KIMU

IPC: G03F7/039

Abstract: PURPOSE: To obtain a photosensitive layer which can be developed with a water- alkali soln. and has high transparency for short wavelength UV rays by using a specified binder which is insoluble with water and soluble with a water-alkali soln., and a compd. which produces strong acid by irradiation to constitute the mixture. CONSTITUTION: This mixture is composed of a binder which is insoluble with water and soluble with a water-alkali soln., and a compd. which produces strong acid by irradiation. As the binder, a phenolic resin is used, in which 5 to 50% of the phenylic hydroxyl groups in the resin are substituted with β-halide alkylcarbonate groups. Thereby, the obtd. mixture can be developed with a water-alkaline soln. and has radiation sensitivity with high transparency for short wavelength UV rays.

公开(公告)号：JPH04219757A

公开(公告)日：1992-08-10

申请号：JP4483491

申请日：1991-03-11

Applicant: BASF AG

Inventor： ZON GUIEN KIMU

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To obtain the radiation sensitive positive composition high in sensitivity by using a phenol resin binder soluble not in water but in an alkali and prepared by substituting phenolic hydroxyl groups with acetal groups. CONSTITUTION: The radiation sensitive composition comprises (a) the binder or its mixture soluble not in water but in an alkali, and (b) a compound to be allowed to form a strong acid by irradiation with radiation. The binder (a) is the phenol resin having 20-70% of its hydroxyl groups substituted by a group represented by the formula in which each of R and R is an alkyl group; R is an H atom or an alkyl group; and each of R and R may combine with each other together with -(CH2 )m - to form ring; and (m) is an integer of 3-6. It is preferred for the phenol resin (a) to have an average molecular weight of 300-20000g/mol, especially, 300-2000g/mol.

公开(公告)号：JPH02177031A

公开(公告)日：1990-07-10

申请号：JP31552389

申请日：1989-12-06

Applicant: BASF AG

Inventor： ZON GUIEN KIMU ,  GEERUHARUTO HOFUMAN ,  RAINHORUTO SHIYUBUARUMU ,  HORUSUTO BINDAA ,  RUDORUFU SHIYUUMAHAA

IPC: B41M5/26 ,  G03F7/004 ,  G03F7/039 ,  G11B7/00 ,  G11B7/004 ,  G11B7/24

Abstract: PURPOSE: To improve reproducibility and resolution by using specific compds. in order to suppress the dissolution of a binder in an aq alkaline soln. CONSTITUTION: The good reproducibility and high resolution are obtd. by using the binder or binder mixture which is soluble in the aq. alkaline soln. and is the monoketal of a β-dicarbonyl compd. of formula I. In the formula I; R and R may be the same as or different from each other and respectively signify alkyl, cycloalkyl, aralkyl and, in some cases, aryl substd. with alkyl or halogen. R signifies hydrogen, halogen, alkyl, cycloalkyl, aralkyl, and, in some cases, aryl substd. with alkyl or halogen. Or R together with R , R with R or R with R may form a 5- or 6-membered ring; R and R may be the same as or different from each other and respectively signify alkyl, cycloalkyl or aralkyl or R and R may combine to form a 5- or 5-membered ring.

公开(公告)号：JPH03170544A

公开(公告)日：1991-07-24

申请号：JP28740290

申请日：1990-10-26

Applicant: BASF AG

Inventor： ZON GUIEN KIMU

IPC: C08G8/08 ,  C08K5/00 ,  C08K5/02 ,  C08K5/1535 ,  C08K5/34 ,  C08K5/36 ,  C08L61/04 ,  C08L61/10 ,  C09D161/04 ,  C09D161/10 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

公开(公告)号：JPH03153257A

公开(公告)日：1991-07-01

申请号：JP28451190

申请日：1990-10-24

Applicant: BASF AG

Inventor： ZON GUIEN KIMU

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To form a layer which can be developed with an alkaline soln. and has photosensitivity for short wavelength UV rays and to produce a relief structure by adding an org. compd. (c) containing carbamate units which can be decomposed by acid to a mixture. CONSTITUTION: This mixture contains a binder or a binder mixture (a) which is inactive with water and soluble with an alkaline soln., and a compd. (b) which produces strong acid by irradiation, to which an org. compd. having a carbamate unit expressed by formula I which can be decomposed by acid is added. Otherwise, the component (a) or the component (c) has a carbamate unit of formula I which can be decomposed by acid. Thereby, a radiation- sensitive system having high activity which can be developed with the alkaline soln. and is suitable for the production of a relief structure for short wavelength UV rays is obtd.

公开(公告)号：JPH04281455A

公开(公告)日：1992-10-07

申请号：JP19779491

申请日：1991-08-07

Applicant: BASF AG

Inventor： ZON GUIEN KIMU

IPC: C08G2/00 ,  G03F7/004 ,  G03F7/029 ,  G03F7/032 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To form a high-activity radiation sensitive mixture for forming a layer developable with an aq. alkaline liquid by sensing short-wavelength UV rays. CONSTITUTION: This radiation sensitive mixture contains (a) a binder or binder mixture which is insoluble in water but is soluble in an alkali and (b) a compd. which forms a strong acid by irradiation with radiations, and further, contains (c) and org. compd. which is condensable in the presence of an acid and is expressed by the general formula (I) R'O-CH2 -OR" (R' and R" respectively mean an alkyl, an haloalkyl, an aryl or an alalkyl which may be the same as or different from each other). Otherwise the compsn.-component (a) described above has at least one piece of the groups of the following general formula (II) R'O-CH2 -O- (R' has the meanings describe above).

公开(公告)号：JPH04232953A

公开(公告)日：1992-08-21

申请号：JP12121991

申请日：1991-05-27

Applicant: BASF AG

Inventor： ZON GUIEN KIMU

IPC: G03F7/004 ,  C08G8/38 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027

Abstract: PURPOSE: To develop and provide a new condensate suitable as a binder for a radiation-sensitive compsn. with high activity to form a layer which has photosensitivity in a short wavelength UV region and can be developed with an alkali soln. CONSTITUTION: This product is expressed by formula, wherein R is a hydrogen atom or acid unstable group, R , R , R may be same or different and are hydrogen, OH, alkyl groups of 1 to 4 carbon number or radical group bonded to a polymer chain. One of R to R has one or more groups bonded to the polymer chain. This condensate is obtd. from a polymer having phenol groups and a dimethylol or polymethylol compd. in the presence of acid.

公开(公告)号：JPH04215662A

公开(公告)日：1992-08-06

申请号：JP2464991

申请日：1991-02-19

Applicant: BASF AG

Inventor： ZON GUIEN KIMU

IPC: G03F7/004 ,  G03F7/023 ,  G03F7/029 ,  G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To economically obtain a positive photoresist having good reproducibility and high resolving power by a short-wave UV. CONSTITUTION: This radiation-sensitive mixture consists of a polymer binder composed mainly of novolac base insoluble in water and soluble in an aq. alkaline soln. or a polymer binder mixture, an onium salt generating a strong acid when exposed to radiation and a pyrocatechol derivative suppressing the solubility of the polymer base in the aq. alkaline soln.

公开(公告)号：JPH04151665A

公开(公告)日：1992-05-25

申请号：JP41515690

申请日：1990-12-27

Applicant: BASF AG

Inventor： ZON GUIEN KIMU

IPC: C08L61/08 ,  G03F7/004 ,  G03F7/012 ,  G03F7/029 ,  G03F7/032 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To form an image of a submicron unit by consisting of a binder insoluble in water and soluble in an alkaline aq. solution, a compound generating a strong acid by the irradiation and an organic compound capable of condensation in the presence of an acid and containing at least one phenolic hydroxyl group in all composition components. CONSTITUTION: This radiation sensitive mixture consists of a combination of the binder insoluble in water and soluble in the alkaline aq. solution or the binder mixture, the compound generating the acid by the irradiation and the organic compound (c) capable of the condensation in the presence of the acid and the all of the components have at least one of the phenolic hydroxyl group. The radiation sensitive mixture obtained in this way has high sensitivity and excellent structural property and particularly is prominent in remarkably excellent adhesion to the surface of silica and has excellent reproducibility and the image forming structural physical property of a relief produced thereby is extremely excellent in submicron unit.

公开(公告)号：JPH03189652A

公开(公告)日：1991-08-19

申请号：JP33099790

申请日：1990-11-30

Applicant: BASF AG

Inventor： ZON GUIEN KIMU

IPC: G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To form a layer sensitive to UV ray of short wavelength by incorporating a compd. represented by a specified formula into a binder insoluble in water but soluble in an aq. alkali soln. CONSTITUTION: At least one kind of compd. having a component represented by the formula is used in a radiation sensitive mixture consisting of a binder or its mixture insoluble in water but soluble in an aq. alkali soln. and a compd. forming a strong acid at the time of irradiation to obtain the objective high activity radiation sensitive mixture developable with an aq. alkali soln., having thermal stability even to plasma and forming a layer sensitive to UV of short wavelength. In the formula, R is 1-5C alkyl and (n) is 2, 3 or 4.