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    RADIOSENSITIVE POLYMER AND POSITIVE PROCESSING RECORDING MATERIAL
    3.
    发明专利
    RADIOSENSITIVE POLYMER AND POSITIVE PROCESSING RECORDING MATERIAL 失效

    公开(公告)号：JPH02302758A

    公开(公告)日：1990-12-14

    申请号：JP10548190

    申请日：1990-04-23

    Applicant: BASF AG

    Inventor： RAINHORUTO SHIYUBUARUMU

    IPC: C08G64/00 ,  C08G75/00 ,  C08G77/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30 ,  H01L21/312 ,  H01L21/47

    Abstract: PURPOSE: To obtain a photoresist material which shows uniform distribution of photoactive groups in a resist layer and has high photosensitivity and can be developed in a dry state by incorporating an acid unstable group and an onium salt group having non-nucleophilic counter ion into the main chain of a polymer. CONSTITUTION: This radiation sensitive polymer contains an acid unstable group and an onium salt group having a non-nucleophilic counter ion in the main chain of the polymer. It is preferable that the radiation-sensitive polymer contains units expressed by formulae (I) and (III) or units expressed by (II) and (III). In formulae, R , R are independently alkylene groups having 1 to 9 carbon atoms, R is an alkyl group, especially having 1 to 9 carbon atoms, R is an aliphatic or aromatic hydrocarbon having three bonds, R , R are alkyl groups, R is an alkylene group, especially having 2 to 10 carbon atoms, and further, R further represents a bivalent silicon-contg. group, and X is a halogen. This polymer is excellent in resistance against oxygen plasma, and if necessary, it can be subjected to dry development.

    RADIOSENSITIVE MIXTURE
    4.
    发明专利
    RADIOSENSITIVE MIXTURE 失效

    公开(公告)号：JPH02177031A

    公开(公告)日：1990-07-10

    申请号：JP31552389

    申请日：1989-12-06

    Applicant: BASF AG

    Inventor： ZON GUIEN KIMU ,  GEERUHARUTO HOFUMAN ,  RAINHORUTO SHIYUBUARUMU ,  HORUSUTO BINDAA ,  RUDORUFU SHIYUUMAHAA

    IPC: B41M5/26 ,  G03F7/004 ,  G03F7/039 ,  G11B7/00 ,  G11B7/004 ,  G11B7/24

    Abstract: PURPOSE: To improve reproducibility and resolution by using specific compds. in order to suppress the dissolution of a binder in an aq alkaline soln. CONSTITUTION: The good reproducibility and high resolution are obtd. by using the binder or binder mixture which is soluble in the aq. alkaline soln. and is the monoketal of a β-dicarbonyl compd. of formula I. In the formula I; R and R may be the same as or different from each other and respectively signify alkyl, cycloalkyl, aralkyl and, in some cases, aryl substd. with alkyl or halogen. R signifies hydrogen, halogen, alkyl, cycloalkyl, aralkyl, and, in some cases, aryl substd. with alkyl or halogen. Or R together with R , R with R or R with R may form a 5- or 6-membered ring; R and R may be the same as or different from each other and respectively signify alkyl, cycloalkyl or aralkyl or R and R may combine to form a 5- or 5-membered ring.

    MANUFACTURE OF RADIATION SENSITIVE MIXTURE AND RELIEF PATTERN
    5.
    发明专利
    MANUFACTURE OF RADIATION SENSITIVE MIXTURE AND RELIEF PATTERN 失效

    公开(公告)号：JPH0218565A

    公开(公告)日：1990-01-22

    申请号：JP11525589

    申请日：1989-05-10

    Applicant: BASF AG

    Inventor： RAINHORUTO SHIYUBUARUMU ,  HORUSUTO BINDAA

    IPC: G03F7/023 ,  C08L61/08 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: PURPOSE: To develope a radiation sensitive mixture with an alkali aq. solution and to increase transparency in a short wave ultraviolet range by blending a specific polymer binder with a specific organic compound. CONSTITUTION: The mixture contains the polymer binder (A) solube in the alkali aq. solution and the organic compound (B) having a group to be increased in the solubity to the water based alkali developer by an acid and to be split by the acid and a group forming a strong acid by radiation. And as the component A, a polymerization (condensation) product containing 5-40mol% monomer unit (a) having a group expressed by formula I or a polymer in which the quantity of the group expressed by formula I is introduced by polymerization like reaction is used. As the component (A), a single polymer of p-hycdrosytene or a copolymer of p-hydroxystyrene and the unit (a), a novolak containing a cresol component having a prescribed structure or the like is preferably used and as the component (B), a compound expressed by a formula II is preferably used. Where in the formulas, R expresses a 5-9C group, each of R -R expresses an aliphatic, an aromatic group or the like and X↑O-expresses an ion pair.

    RADIATION-SENSITIVE COMPOSITION FOR POSITIVE PROCESSING AND MANUFACTURE OF RELIEF STRUCTURE USING IT
    6.
    发明专利
    RADIATION-SENSITIVE COMPOSITION FOR POSITIVE PROCESSING AND MANUFACTURE OF RELIEF STRUCTURE USING IT 失效

    公开(公告)号：JPH09127700A

    公开(公告)日：1997-05-16

    申请号：JP24082196

    申请日：1996-09-11

    Applicant: BASF AG

    Inventor： RAINHORUTO SHIYUBUARUMU ,  DEIRUKU FUNHOFU ,  HORUSUTO BINDAA

    IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To obtain good photosensitivity, to prevent loss in the layer thickness and to improve the contrast by incorporating a specified low mol.wt. org. compd. and tow kinds of org. compds. SOLUTION: This compsn. contains at least one kind of (a1) water-insoluble polymer binder which has an unstable group with acid and becomes soluble with an alkali soln. by the effect of acid, or (a2.1) a water-insoluble polymer binder which is soluble with an alkali soln. and (a2.2) a low mol.wt. org. compd. which increases the solubility with an alkali soln. by the effect of acid, and at least one kind of (b) org. compd. which forms acid by the effect of chemical active rays, and (c) one or more kinds of other org. compds. different from the compd. above described. The one or more components (a1) to (c) are expressed by a bonding group of formula I, especially by formula II, R'''' contains hydrogen or halogen group, or the component (c) is expressed by formula II and R is 1-6C alkyl group and n is 1 to 6.

    RADIATION SENSITIVE MIXTURE FOR PHOTOSENSITIVE LAYER FORMING MATERIAL
    8.
    发明专利
    RADIATION SENSITIVE MIXTURE FOR PHOTOSENSITIVE LAYER FORMING MATERIAL 失效

    公开(公告)号：JPS6435433A

    公开(公告)日：1989-02-06

    申请号：JP16277088

    申请日：1988-07-01

    Applicant: BASF AG

    Inventor： RAINHORUTO SHIYUBUARUMU ,  ANDOREASU BETOHIYAA ,  HORUSUTO BINDAA

    IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

    Abstract: PURPOSE: To improve the photochemical reactivity by forming a photosensitive layer from a mixture of a polymer binder which is insoluble with water and soluble with a water-based alkali solvent and an org. compd. which has an acid decomposing group and can be changed into strong acid by irradiation. CONSTITUTION: The radiation-sensitive mixture is prepared from a polymer binder which is insoluble with water and insoluble with a water-based alkali solvent phenolic resin such as a novolac polymer and an org. compd. having an acid decomposing group which forms strong acid by irradiation such as a compd. having onium salt group and t-butylcarbonate group. The mixture is applied to form a thin film on a base body, and the thin film is heated to remove the residual solvent, exposed for an image and heated again. By this treatment, the exposed part has complete durability against a water-base alkali soln., while durability in the unexposed part decreases. Thus, the obtd. radiation- sensitive compsn. has high photochemical reactivity in a wide sensitivity range.

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