公开(公告)号：WO2008080958A3

公开(公告)日：2008-11-20

申请号：PCT/EP2007064596

申请日：2007-12-28

Applicant: BASF SE ,  BEHRENS SVEN HOLGER ,  LIU YAQIAN ,  KERN GUENTER ,  DEBUS HEIDRUN

Inventor： BEHRENS SVEN HOLGER ,  LIU YAQIAN ,  KERN GUENTER ,  DEBUS HEIDRUN

IPC: C09G1/02 ,  C09K3/14 ,  H01L21/306

CPC classification number: C09G1/02 ,  C09K3/1409 ,  C09K3/1463 ,  H01L21/31053

Abstract: A composition for polishing surfaces, the composition comprising the following components: a) at least one inorganic abrasive component (S), comprising a lanthanide oxide, b) at least one organic dispersant component made of polymer (P), c) at least one organic gelling agent (G), such as gellan gum, d) water as the solvent or dispersing medium, and e) optionally further adjuvants and additives, has high stability.

Abstract translation: 一种用于抛光表面，其包含以下组分的组合物：a）至少一种无机磨料成分（S），其包含镧系元素氧化物，b）根据聚合物（P）的至少一种有机分散剂，c）至少一种有机胶凝剂（G） 如结冷胶，d）水作为溶剂或分散介质，以及e）任选地进一步的助剂和添加剂，具有高的稳定性。

公开(公告)号：AT555175T

公开(公告)日：2012-05-15

申请号：AT07858192

申请日：2007-12-28

Applicant: BASF SE

Inventor： BEHRENS SVEN ,  LIU YAQIAN ,  KERN GUENTER ,  DEBUS HEIDRUN

IPC: C09G1/02 ,  C09K3/14 ,  H01L21/306

Abstract: Composition for polishing surfaces comprises a lanthanide oxide abrasive, a polymeric dispersant, a polysaccharide gelling agent and water. An independent claim is also included for polishing a surface of a semiconductor component by applying a composition as above to the surface and, when a desired planarization has been achieved, rinsing off abrasion products together with the composition.

公开(公告)号：DE102006061891A1

公开(公告)日：2008-07-03

申请号：DE102006061891

申请日：2006-12-28

Applicant: BASF SE

Inventor： BEHRENS SVEN HOLGER ,  LIU YAQIAN ,  KERN GUENTER ,  DEBUS HEIDRUN

IPC: C09G1/02 ,  H01L21/302

Abstract: Composition for polishing surfaces comprises a lanthanide oxide abrasive, a polymeric dispersant, a polysaccharide gelling agent and water. An independent claim is also included for polishing a surface of a semiconductor component by applying a composition as above to the surface and, when a desired planarization has been achieved, rinsing off abrasion products together with the composition.