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    COMPOSITION FOR POLISHING SURFACE MADE OF SILICON DIOXIDE
    1.
    发明申请
    COMPOSITION FOR POLISHING SURFACE MADE OF SILICON DIOXIDE 审中-公开
    组成抛光二氧化硅表面

    公开(公告)号：WO2008080958A3

    公开(公告)日：2008-11-20

    申请号：PCT/EP2007064596

    申请日：2007-12-28

    Applicant: BASF SE ,  BEHRENS SVEN HOLGER ,  LIU YAQIAN ,  KERN GUENTER ,  DEBUS HEIDRUN

    Inventor： BEHRENS SVEN HOLGER ,  LIU YAQIAN ,  KERN GUENTER ,  DEBUS HEIDRUN

    IPC: C09G1/02 ,  C09K3/14 ,  H01L21/306

    CPC classification number: C09G1/02 ,  C09K3/1409 ,  C09K3/1463 ,  H01L21/31053

    Abstract: A composition for polishing surfaces, the composition comprising the following components: a) at least one inorganic abrasive component (S), comprising a lanthanide oxide, b) at least one organic dispersant component made of polymer (P), c) at least one organic gelling agent (G), such as gellan gum, d) water as the solvent or dispersing medium, and e) optionally further adjuvants and additives, has high stability.

    Abstract translation: 一种用于抛光表面，其包含以下组分的组合物：a）至少一种无机磨料成分（S），其包含镧系元素氧化物，b）根据聚合物（P）的至少一种有机分散剂，c）至少一种有机胶凝剂（G） 如结冷胶，d）水作为溶剂或分散介质，以及e）任选地进一步的助剂和添加剂，具有高的稳定性。

    2.
    发明专利
    未知

    公开(公告)号：AT555175T

    公开(公告)日：2012-05-15

    申请号：AT07858192

    申请日：2007-12-28

    Applicant: BASF SE

    Inventor： BEHRENS SVEN ,  LIU YAQIAN ,  KERN GUENTER ,  DEBUS HEIDRUN

    IPC: C09G1/02 ,  C09K3/14 ,  H01L21/306

    Abstract: Composition for polishing surfaces comprises a lanthanide oxide abrasive, a polymeric dispersant, a polysaccharide gelling agent and water. An independent claim is also included for polishing a surface of a semiconductor component by applying a composition as above to the surface and, when a desired planarization has been achieved, rinsing off abrasion products together with the composition.

    COPOLYMERS AS SCALE INHIBITORS
    4.
    发明专利
    COPOLYMERS AS SCALE INHIBITORS 未知

    公开(公告)号：CA2648696A1

    公开(公告)日：2007-11-08

    申请号：CA2648696

    申请日：2007-04-26

    Applicant: BASF SE

    Inventor： FRANZ DIANA ,  KONRAD ROUVEN ,  GUZMANN MARCUS ,  LIU YAQIAN

    IPC: C08F220/00

    Abstract: The present invention relates to copolymers which are obtainable from the free radical copolymerization of at least (a) a monoethylenically unsaturated carboxylic acid having 3 to 6 carbon atoms or the anhydride thereof with (b) a reaction mixture comprising a component of the general structural formula where R1, R2, R3, R4, independently of one another, are H or C1- to C4-alkyl, n and m, independently of one another, are an integer from 1 to 100 and R5 is H or methyl, a process for the preparation of the polymer according to the invention and the use thereof as a scale inhibitor.

    Copolymers as scale inhibitors
    6.
    发明专利
    Copolymers as scale inhibitors 未知

    公开(公告)号：AU2007245674A1

    公开(公告)日：2007-11-08

    申请号：AU2007245674

    申请日：2007-04-26

    Applicant: BASF SE

    Inventor： FRANZ DIANA ,  GUZMANN MARCUS ,  LIU YAQIAN ,  KONRAD ROUVEN

    IPC: C08F220/00

    Abstract: The present invention relates to copolymers which are obtainable from the free radical copolymerization of at least (a) a monoethylenically unsaturated carboxylic acid having 3 to 6 carbon atoms or the anhydride thereof with (b) a reaction mixture comprising a component of the general structural formula where R1, R2, R3, R4, independently of one another, are H or C1- to C4-alkyl, n and m, independently of one another, are an integer from 1 to 100 and R5 is H or methyl, a process for the preparation of the polymer according to the invention and the use thereof as a scale inhibitor.

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