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    착화제를 포함하는 주석-은 합금 전기도금용 조성물
    1.
    发明公开
    착화제를 포함하는 주석-은 합금 전기도금용 조성물 审中-公开

    公开(公告)号：KR20200135481A

    公开(公告)日：2020-12-02

    申请号：KR20207030511

    申请日：2019-03-22

    Applicant: BASF SE

    Inventor： FRITZSCHE KATHARINA ,  KREMZOW GRAW DORIS ,  ARNOLD MARCO ,  FLUEGEL ALEXANDER

    IPC: C25D3/32 ,  C07D213/32 ,  C07D277/26 ,  C07D401/14 ,  C07D409/14 ,  C07D417/14 ,  C25D3/60 ,  C25D3/64 ,  C25D5/02 ,  H05K3/42

    Abstract: (a) 주석이온및 은이온을포함하는금속이온및 (b) 하기식 C1, C2 또는 C3 의적어도하나의착화제를포함하는수성조성물 TIFFpct00056.tif32125 식중에서 X1, X3 는 OH 에의해치환또는비치환될수 있는, 선형또는분지형 C1-C12 알칸디일로부터독립적으로선택되고; X21, X22 는, X1 (이는또한 -X5-COOR12, -X5-SO2-O-R12, 식 -(O-CH2-CHR11)z-OH 의 C2 내지 C6 폴리옥시알킬렌기, 또는이의조합에의해치환될수 있음), 및 -X1-NH-CO-X6-CO-NH-X1- 로부터독립적으로선택되고; X31, X32 는화학결합및 X1 으로부터독립적으로선택되고; X41, X42 는 X1 으로부터독립적으로선택되고; X5 는선형또는분지형 C1 내지 C10 알킬이고; X6 는 X1 및 2가 5 또는 6원방향족기로부터선택되고; R1, R2 는, --COOR12 또는 -SO2-O-R12 에의해치환될수 있는, 1 개의 N 원자또는 2 개의 N 원자 (적어도하나의 C 원자에의해분리됨) 를포함하는 1가 5 또는 6원방향족 N-복소환기, 및 C1-C6-알킬기로의 N-알킬화에의해수득되는그의유도체로부터독립적으로선택되고, 상기방향족 N-복소환기는선택적으로, X21 가적어도하나의 OH 에의해치환된다는조건하에, 1개의 S 원자를더 포함할수 있고; R3, R4 는 1 개의 N 원자및 1 개의 O 원자를포함하는 1가 5 또는 6원지방족 N-복소환기로부터독립적으로선택되고; D1 는 S, O 및 NR10 로부터독립적으로선택되고; D2 는 (a) 1 또는 2 개의 S 원자를포함하는 2가 5 또는 6원지방족복소환고리시스템, 또는 (b) 적어도 2 개의 N 원자및 선택적으로 1 또는 2 개의 S 원자를포함하는 5 또는 6원방향족복소환고리시스템이고; D3 는 S 및 NR10 으로부터독립적으로선택되고; n 은 0 내지 5 의정수이고; z 는 1 내지 50 의정수이고; R10 은 H 및선형또는분지형 C1-C12 알킬로부터선택되고; R11 은 H 및선형또는분지형 C1 내지 C6 알킬로부터선택되고; 그리고 R12 은 R10 및양이온으로부터선택된다.

    2.
    发明专利
    未知

    公开(公告)号：AT538126T

    公开(公告)日：2012-01-15

    申请号：AT06701700

    申请日：2006-01-09

    Applicant: BASF SE

    Inventor： SOMMERLADE REINHARD H ,  FRITZSCHE KATHARINA ,  FISCHER WALTER

    IPC: C07F9/50

    Abstract: A process for the preparation of bis-acylphosphanes of formula R1P(COR2)2 wherein R1 is unsubstituted phenyl or phenyl substituted by one to five halogen, C1-C8-alkyl, C1-C8-alkylthio and/or C1-C8-alkoxy; R2 is C1-C18-alkyl or C2-C18-alkenyl; C1-C18-alkyl or C2-C18-alkenyl substituted once or more than once by halogen -OR10, -OCO-R10, -OCO-Hal, -COO-R10, -N(R11)-CO-R10, -N(R11)-CO-Hal, -CO-NR11R10, -CH-CH-CO-OR10 or -CH-CH-phenyl; -C(C1-C4alkyl)=C(C1-C4alkyl)-CO-OR10 or -C(C1-C4alkyl)=C(C1-C4alkyl)-phenyl; C5-C12cycloalkyl, C2-C18alkenyl, phenyl-C1-C4alkenyl, phenyl, naphthyl, biphenyl or a 5- or 6-membered -O-, S- or N-containing heterocyclic ring, the radicals phenyl, naphthyl, biphenyl or the 5- or 6-membered -0-, S- or N-containing heterocyclic ring being unsubstituted or substituted by one to five halogen, C1-C8alkyl, C1-C8alkoxy and/or C1-C8alkylthio; the process comprises the steps in a) selective reduction of dichlorophenylphosphanes of the formula R1P(CI)2 by means of hydrogen at a temperature in the range from 20 to 200° C. and under hydrogen pressure of atmospheric pressure to 20 bar in the presence of a hydrogenation catalyst, a tert. aliphatic amine or an aromatic amine and in the presence of a non protic solvent which is unreactive under the hydrogenation conditions to obtain cyclic phenylphosphanes (R1P)n (n=4 to 6); or b) selective reduction of R1P(CI)2 by means of hydrogen at a temperature in the range from 80 to 250° C. and under hydrogen pressure of 25 to 250 bar in the presence of a hydrogenation catalyst, a tert. aliphatic amine or an aromatic amine and in the presence of a non protic solvent which is unreactive under the hydrogenation conditions to obtain R1PH2; c) subsequent reaction with an acid halide of formula in the presence of an apropriate base R2COHal wherein R2 is as defined above.

    5.
    发明专利
    未知

    公开(公告)号：AT529469T

    公开(公告)日：2011-11-15

    申请号：AT06807643

    申请日：2006-10-30

    Applicant: BASF SE

    Inventor： FRITZSCHE KATHARINA ,  FISCHER WALTER ,  BENKHOFF JOHANNES ,  POWELL KARIN ,  SIMON DIRK

    IPC: C08K5/07 ,  C07C49/825 ,  C07D209/48 ,  C07D249/22

    Abstract: The instant invention relates to new photolatent compounds of the formula I wherein R1 and R2 are each independently of the other C1-C10alkyl or C3-C8cycloalkyl, R3 is hydrogen or C1-C4alkyl, and wherein the photochemically cleaved group R4OH is selected from the group consisting of fragrances, UV absorbers, anti-microbials, anti-fogging agents and clarifiers; with the proviso that, when R1 and R2 are tert-butyl and R3 is hydrogen, R4 is not methyl or phenyl.

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