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    착화제를 포함하는 주석-은 합금 전기도금용 조성물
    1.
    发明公开
    착화제를 포함하는 주석-은 합금 전기도금용 조성물 审中-公开

    公开(公告)号：KR20200135481A

    公开(公告)日：2020-12-02

    申请号：KR20207030511

    申请日：2019-03-22

    Applicant: BASF SE

    Inventor： FRITZSCHE KATHARINA ,  KREMZOW GRAW DORIS ,  ARNOLD MARCO ,  FLUEGEL ALEXANDER

    IPC: C25D3/32 ,  C07D213/32 ,  C07D277/26 ,  C07D401/14 ,  C07D409/14 ,  C07D417/14 ,  C25D3/60 ,  C25D3/64 ,  C25D5/02 ,  H05K3/42

    Abstract: (a) 주석이온및 은이온을포함하는금속이온및 (b) 하기식 C1, C2 또는 C3 의적어도하나의착화제를포함하는수성조성물 TIFFpct00056.tif32125 식중에서 X1, X3 는 OH 에의해치환또는비치환될수 있는, 선형또는분지형 C1-C12 알칸디일로부터독립적으로선택되고; X21, X22 는, X1 (이는또한 -X5-COOR12, -X5-SO2-O-R12, 식 -(O-CH2-CHR11)z-OH 의 C2 내지 C6 폴리옥시알킬렌기, 또는이의조합에의해치환될수 있음), 및 -X1-NH-CO-X6-CO-NH-X1- 로부터독립적으로선택되고; X31, X32 는화학결합및 X1 으로부터독립적으로선택되고; X41, X42 는 X1 으로부터독립적으로선택되고; X5 는선형또는분지형 C1 내지 C10 알킬이고; X6 는 X1 및 2가 5 또는 6원방향족기로부터선택되고; R1, R2 는, --COOR12 또는 -SO2-O-R12 에의해치환될수 있는, 1 개의 N 원자또는 2 개의 N 원자 (적어도하나의 C 원자에의해분리됨) 를포함하는 1가 5 또는 6원방향족 N-복소환기, 및 C1-C6-알킬기로의 N-알킬화에의해수득되는그의유도체로부터독립적으로선택되고, 상기방향족 N-복소환기는선택적으로, X21 가적어도하나의 OH 에의해치환된다는조건하에, 1개의 S 원자를더 포함할수 있고; R3, R4 는 1 개의 N 원자및 1 개의 O 원자를포함하는 1가 5 또는 6원지방족 N-복소환기로부터독립적으로선택되고; D1 는 S, O 및 NR10 로부터독립적으로선택되고; D2 는 (a) 1 또는 2 개의 S 원자를포함하는 2가 5 또는 6원지방족복소환고리시스템, 또는 (b) 적어도 2 개의 N 원자및 선택적으로 1 또는 2 개의 S 원자를포함하는 5 또는 6원방향족복소환고리시스템이고; D3 는 S 및 NR10 으로부터독립적으로선택되고; n 은 0 내지 5 의정수이고; z 는 1 내지 50 의정수이고; R10 은 H 및선형또는분지형 C1-C12 알킬로부터선택되고; R11 은 H 및선형또는분지형 C1 내지 C6 알킬로부터선택되고; 그리고 R12 은 R10 및양이온으로부터선택된다.

    COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT
    8.
    发明专利
    COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT 未知

    公开(公告)号：SG11201503617VA

    公开(公告)日：2015-06-29

    申请号：SG11201503617V

    申请日：2013-10-30

    Applicant: BASF SE

    Inventor： KIENLE MARCEL PATRIK ,  MAYER DIETER ,  RÖGER-GÖPFERT CORNELIA ,  HAAG ALEXANDRA ,  EMNET CHARLOTTE ,  FLÜGEL ALEXANDER ,  ARNOLD MARCO

    IPC: C08G73/14 ,  C25D3/38

    Abstract: A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide, said polyaminoamide comprising the structural unit represented by formula I or derivatives of the polyaminoamide of formula I obtainable by complete or partial protonation, N-functionalization or N-quaternization with a non-aromatic reactant, wherein D6 is, for each repeating unit 1 to s independently, a divalent group selected from a saturated or unsaturated C1-C20 organic radical, D7 is, for each repeating unit 1 to s independently, a divalent group selected from straight chain or branched C2-C20 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, R1 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R2, may form a divalent group D8, and R2 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R1, may form a divalent group D8, and D8 is selected from straight chain or branched C1-C18 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, s is an integer from 1 to 250, R10 is selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl.

    COMPOSITION FOR TIN OR TIN ALLOY ELECTROPLATING COMPRISING SUPPRESSING AGENT
    9.
    发明专利
    COMPOSITION FOR TIN OR TIN ALLOY ELECTROPLATING COMPRISING SUPPRESSING AGENT 未知

    公开(公告)号：SG11202009106XA

    公开(公告)日：2020-11-27

    申请号：SG11202009106X

    申请日：2019-04-11

    Applicant: BASF SE

    Inventor： FLUEGEL ALEXANDER ,  ARNOLD MARCO ,  ENGELHARDT NADINE ,  KIENLE MARCEL PATRIK

    IPC: C25D3/32 ,  C25D3/60 ,  H01L21/288 ,  H01L23/00

    Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula IwhereinX1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety,R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight,R11 is selected from H, R11, R40,R13, R14 are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13;X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally beinterrupted by O, S or NR43;R40 is H or a linear or branched C1-C20 alkyl,R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.

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