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1.发明公开PROCESS FOR REMOVING BULK MATERIAL LAYER FROM SUBSTRATE AND CHEMICAL MECHANICAL POLISHING AGENT SUITABLE FOR THIS PROCESS 审中-公开VERFAHREN ZUR ENTFERNUNG EINER MATERIALMASSESCHICHT VON EINEM SUBSTRAT UND CHEMISCH-MECHANISCHES REINIGUNGSMITTELFÜRDIESES VERFAHREN
公开(公告)号：EP2507332A4
公开(公告)日：2017-08-02
申请号：EP10832737
申请日：2010-11-25
Applicant: BASF SE
Inventor： RAMAN VIJAY IMMANUEL , LI YUZHUO , BRANDS MARIO , LAN YONGQING , RUSHING KENNETH , RAMJI KARPAGAVALLI
IPC: C09G1/02 , B01J13/14 , C09K3/14 , H01L21/321
CPC classification number: H01L21/3212 , C09G1/02 , C09K3/1436 , C09K3/1463
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