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公开(公告)号:AU2012251445B2
公开(公告)日:2015-08-20
申请号:AU2012251445
申请日:2012-04-25
Applicant: BASF SE
Inventor: FISCHER WALTER , BASBAS ABDEL-ILAH , SCHONING KAI-UWE , TARTARINI CINZIA , HOLZL WERNER , ROTZINGER BRUNO
IPC: C08K5/1535 , C07D307/38 , C08K5/15 , C08K5/151
Abstract: A composition, which comprises a) an organic material susceptible to oxidative, thermal or light-induced degradation; and b) a compound of formula I (Formula I) (I) wherein R
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公开(公告)号:CA2835007A1
公开(公告)日:2012-11-08
申请号:CA2835007
申请日:2012-04-25
Applicant: BASF SE
Inventor: FISCHER WALTER , BASBAS ABDEL-ILAH , SCHONING KAI-UWE , TARTARINI CINZIA , HOLZL WERNER , ROTZINGER BRUNO
IPC: C08K5/1535 , C07D307/38 , C08K5/15 , C08K5/151
Abstract: A composition, which comprises a) an organic material susceptible to oxidative, thermal or light-induced degradation; and b) a compound of formula I (Formula I) (I) wherein R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 are independently from each other H, C1-C8-alkyl, C4-C8-cycloalkyl, phenyl, C1-C4-alkoxy or halogen; n is 1, 2, 3, or 4; and when n is 1 A is -C(=0)-OR'1,-C(=0)-N(R'2)(R'3), -CN, phenyl, which is unsubstituted or substituted by one or more C1-C8-alkyl, C4-C8-alkoxy, C5-C7-cycloalkyl or halogen, -H or -S02-phenyl; when n is 2 A is -C(=0)-0-Z1-O-C(=0)-, -C(=0)-N(R" 1)-Z2-N(R"2)-C(=0)- or piperazine-N,N'-biscarbonyl.
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公开(公告)号:MY158943A
公开(公告)日:2016-11-30
申请号:MYPI2012003861
申请日:2011-03-02
Applicant: BASF SE
Inventor: MEIER HANS-RUDOLF , SCHONING KAI-UWE , HINDALEKAR SHRIRANG BHIKAJI
IPC: C07D211/94 , C08K5/3435
Abstract: A COMPOUND OF THE FORMULA (A) WHEREIN THE RADICALS R₁ ARE INDEPENDENTLY OF ONE ANOTHER METHYL, ETHYL OR N-PROPYL, AND X IS C₂-C₈ALKYLENE OR C₂-C₈ALKYLENE INTERRUPTED BY SULFUR, IS USEFUL FOR STABILIZING AN ORGANIC MATERIAL AGAINST DEGRADATION INDUCED BY LIGHT, HEAT OR OXIDATION.
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公开(公告)号:CA2916530A1
公开(公告)日:2015-01-15
申请号:CA2916530
申请日:2014-07-03
Applicant: BASF SE
Inventor: PETER WOLFGANG , BRAIG ADALBERT , BERENS ULRICH , SCHONING KAI-UWE , GROB MARKUS , TARTARINI CINZIA , WEYLAND TANIA
IPC: C07D211/02 , C07D211/14 , C07D211/44
Abstract: The present invention relates to symmetric diesters of hydroxyalkyl-4-hydroxy- tetraalkylpiperidine compounds and their use as light stabilizers. They are compatible with and soluble in coating formulations of different polarity.
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公开(公告)号:CO6700850A2
公开(公告)日:2013-06-28
申请号:CO13122975
申请日:2013-05-20
Applicant: BASF SE
Inventor: MENOZZI EDOARDO , SCHONING KAI-UWE
IPC: C07D401/14 , C08K5/3492
Abstract: Un compuesto de la fórmula (I), donde uno o dos radicales de los radicales R1 son independientemente uno de otro alquiloxi C1-C20 o cicloalquiloxi C3-C12 y los restantes radicales R1 son, independientemente uno de otro, hidrógeno, alquilo C1-C20 o cicloalquilo C3-C12; los radicales R0 y R2 son independientemente uno de otro hidrógeno, alquilo C1-C20, cicloalquilo C3-C12 o un grupo de la fórmula (II-a) con R3 siendo hidrógeno, alquilo C1-C20, cicloalquilo C3-C12, C1-C20 alquiloxi o C3-C12 cicloalquiloxi; Y es alquileno C2-C12; m es 0 o 1; n es 1, 2 o 3; cuando n es 1, X es hidrógeno, alquilo Cl-C2O, cicloalquilo C3-C12 o un grupo de la fórmula (II-a); cuando n es 2, X es alquileno C2-C12; cuando n es 3, X es un grupo N(Z-)3 siendo Z alquileno C2-C12.
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公开(公告)号:AU2015216958A1
公开(公告)日:2016-08-25
申请号:AU2015216958
申请日:2015-02-13
Applicant: BASF SE
Inventor: HOLZL WERNER , ROTZINGER BRUNO , SCHONING KAI-UWE , KING ROSWELL EASTON
IPC: C08K5/523 , C08K5/5393 , C08L23/00
Abstract: The invention relates to a composition comprising an organic material susceptible to oxidative, thermal or light-induced degradation and a compound of formula l-P, 1-O or I-M. Further embodiments are a compound of formula l-P, l-O or l-M, a process for protection of the organic material by the compound, the use of the compound for stabilizing the organic material, an additive composition comprising the compound, a process for manufacturing the compound and intermediates involved therein.
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公开(公告)号:CA2939748A1
公开(公告)日:2015-08-20
申请号:CA2939748
申请日:2015-02-13
Applicant: BASF SE
Inventor: HOLZL WERNER , ROTZINGER BRUNO , SCHONING KAI-UWE , KING ROSWELL EASTON
IPC: C08K5/523 , C08K5/5393 , C08L23/00
Abstract: The invention relates to a composition comprising an organic material susceptible to oxidative, thermal or light-induced degradation and a compound of formula l-P, 1-O or I-M. Further embodiments are a compound of formula l-P, l-O or l-M, a process for protection of the organic material by the compound, the use of the compound for stabilizing the organic material, an additive composition comprising the compound, a process for manufacturing the compound and intermediates involved therein.
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公开(公告)号:AU2015216958B2
公开(公告)日:2018-08-30
申请号:AU2015216958
申请日:2015-02-13
Applicant: BASF SE
Inventor: HOLZL WERNER , ROTZINGER BRUNO , SCHONING KAI-UWE , KING ROSWELL EASTON
IPC: C08K5/523 , C08K5/5393 , C08L23/00
Abstract: The invention relates to a composition comprising an organic material susceptible to oxidative, thermal or light-induced degradation and a compound of formula l-P, 1-O or I-M. Further embodiments are a compound of formula l-P, l-O or l-M, a process for protection of the organic material by the compound, the use of the compound for stabilizing the organic material, an additive composition comprising the compound, a process for manufacturing the compound and intermediates involved therein.
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公开(公告)号:AU2014288890B9
公开(公告)日:2018-05-10
申请号:AU2014288890
申请日:2014-07-03
Applicant: BASF SE
Inventor: PETER WOLFGANG , BRAIG ADALBERT , BERENS ULRICH , SCHONING KAI-UWE , GROB MARKUS , TARTARINI CINZIA , WEYLAND TANIA
IPC: C07D211/02 , C07D211/14 , C07D211/44
Abstract: The present invention relates to symmetric diesters of hydroxyalkyl-4-hydroxy- tetraalkylpiperidine compounds and their use as light stabilizers. They are compatible with and soluble in coating formulations of different polarity.
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公开(公告)号:AU2012251445A1
公开(公告)日:2013-12-05
申请号:AU2012251445
申请日:2012-04-25
Applicant: BASF SE
Inventor: FISCHER WALTER , BASBAS ABDEL-ILAH , SCHONING KAI-UWE , TARTARINI CINZIA , HOLZL WERNER , ROTZINGER BRUNO
IPC: C08K5/1535 , C07D307/38 , C08K5/15 , C08K5/151
Abstract: A composition, which comprises a) an organic material susceptible to oxidative, thermal or light-induced degradation; and b) a compound of formula I (Formula I) (I) wherein R
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