公开(公告)号：SG11201509518WA

公开(公告)日：2015-12-30

申请号：SG11201509518W

申请日：2014-05-26

Applicant: BASF SE

Inventor： NOLLER BASTIAN MARTEN ,  SIX MANUEL

IPC: C09G1/02 ,  B24B37/04 ,  H01L21/02 ,  H01L21/306

公开(公告)号：SG11201704506UA

公开(公告)日：2017-06-29

申请号：SG11201704506U

申请日：2015-12-04

Applicant: BASF SE ,  BASF (CHINA) COMPANY LTD

Inventor： SIEBERT DR MAX ,  LAUTER DR MICHAEL ,  LAN YONGQING ,  REICHARDT DR ROBERT ,  MUENCH ALEXANDRA ,  SIX MANUEL ,  DANIEL GERALD ,  NOLLER DR BASTIAN MARTEN ,  HUANG KEVIN ,  USMAN IBRAHIM SHEIK ANSAR

IPC: C09G1/02 ,  C09K3/14

Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising: (A) inorganic particles, (B) a compound of general formula (I) (C) an aqueous medium wherein the composition (Q) has a pH of from 2 to 6.