MEMORY AND MANUFACTURING METHOD THEREFOR

    公开(公告)号:US20250063714A1

    公开(公告)日:2025-02-20

    申请号:US18714798

    申请日:2022-12-20

    Abstract: Provided is a memory. The memory includes: a plurality of memory cells, word lines, and bit lines; wherein each of the memory cells comprises: a first transistor, wherein a first source of the first transistor is electrically connected to the bit line; a second transistor, connected in series to the first transistor; and a capacitor, electrically connected to a second drain of the second transistor. The first transistor and the second transistor are both n-type transistors or p-type transistors, and a first gate of the first transistor and a second gate of the second transistor are electrically connected to the word line.

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