公开(公告)号：WO2017053128A1

公开(公告)日：2017-03-30

申请号：PCT/US2016/051494

申请日：2016-09-13

Applicant: BENCHMARK TECHNOLOGIES

Inventor： TU, Yuqiang ,  REYNOLDS, Patrick

IPC: G03F7/20 ,  G03F1/78 ,  H01L21/027

CPC classification number: G01J4/04 ,  G03F1/44 ,  G03F7/70566 ,  G03F7/70641

Abstract: Methods and apparatus for characterizing a beam parameter associated with an electromagnetic beam of a light source. The light source exposes a phase-shifted target through a set of focal distances relative to a focal plane of a substrate. At each focal distance of the set, registration values are measured and used to determine one or more registration slopes as a function of focal distance. The registration slopes are compared with baseline registration slopes to characterize the current relative state of the beam parameter in question. Beam parameters that may be characterized in this manner include degree of polarization and polarization rotation relative to an initial polarization direction. Phase shift test patterns advantageously used for beam characterization are described.

Abstract translation: 用于表征与光源的电磁束相关联的光束参数的方法和装置。 光源通过相对于基板的焦平面的一组焦距来曝光相移的目标。 在组的每个焦距处，测量对准值并用于确定作为焦距的函数的一个或多个配准斜率。 将配准斜率与基线配准斜率进行比较，以表征所讨论的梁参数的当前相对状态。 可以以这种方式表征的光束参数包括相对于初始偏振方向的偏振度和偏振旋转度。 描述有利地用于光束表征的相移测试图案。