公开(公告)号：AT444316T

公开(公告)日：2009-10-15

申请号：AT02797325

申请日：2002-12-13

Applicant: BREWER SCIENCE INC

Inventor： DESHPANDE SHREERAM

IPC: C08F220/68 ,  C08F8/14 ,  C08F24/00 ,  C08F34/02 ,  C08G59/14 ,  C08G59/32 ,  C08G59/42 ,  C08G59/62 ,  C08G63/68 ,  C08G63/91 ,  C08G65/329 ,  C09D133/02 ,  C09D163/00 ,  C09D167/00 ,  C09D171/02 ,  C09D201/02 ,  G03F7/00 ,  G03F7/09

Abstract: New polymers and new anti-reflective compositions containing such polymers are provided. The compositions comprise a polymer (e.g., epoxy cresol novolac resins) bonded with a chromophore (4-hydroxybenzoic acid, trimellitic anhydride). The inventive compositions can be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

公开(公告)号：AT368060T

公开(公告)日：2007-08-15

申请号：AT03809914

申请日：2003-05-13

Applicant: BREWER SCIENCE INC

Inventor： XU GU ,  MEADOR JIMMY ,  BEHAVE MANDER ,  DESHPANDE SHREERAM ,  NOWAK KELLY

IPC: C08F212/08 ,  C09D101/00 ,  C09D129/08 ,  G02B1/11 ,  G03F7/09 ,  H01L21/768

Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.