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公开(公告)号:AU2003300771A8
公开(公告)日:2004-05-25
申请号:AU2003300771
申请日:2003-05-13
Applicant: BREWER SCIENCE INC
Inventor: DESHPANDE SHREERAM V , NOWAK KELLY A , BHAVE MANDER R , XU GU , MEADOR JIMMY D
IPC: C09D101/00 , C09D129/08 , G02B1/11 , G03F7/09 , H01L21/768 , C08F12/02 , C08F20/10 , C08F212/00 , C08F16/36
Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
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公开(公告)号:AU4752901A
公开(公告)日:2002-02-25
申请号:AU4752901
申请日:2001-03-15
Applicant: BREWER SCIENCE INC
Inventor: XU GU , BREWER DAN W , LIMMER TIMOTHY , STRODER MIKE , FOWLER SHELLY , MAYO JONATHON
Abstract: New polymers, compositions comprising these polymers, and methods of using these compositions are provided. The polymers comprise styrene and maleic anhydride monomers with at least some of the maleic anhydride monomers having certain functional groups bonded thereto. Preferred functional groups include those derived from adhesion promoters (e.g., 2-aminophenol), photoinitiators (e.g., 4-aminoacetophenone), and solubilizers (e.g., 4-aminobenzoic acid). The polymers can be incorporated according to conventional processes into compositions which are then used to form a color filter to be used in a liquid crystal display. The final color filter has a high resolution, is highly resistant to solvents typically used in the color filter manufacturing process, is strongly adhered to the color filter substrate, has superior optical clarity, is highly soluble in a wide range of alkali developers, and has excellent heat and UV light stability.
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公开(公告)号:SG175217A1
公开(公告)日:2011-11-28
申请号:SG2011074903
申请日:2010-03-19
Applicant: BREWER SCIENCE INC
Inventor: TRICHUR RAMACHANDRAN K , TANG TINGJI , XU GU , ZHONG XING-FU , HONG WENBIN , FLAIM TONY D , YESS KIMBERLY
Abstract: New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.
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公开(公告)号:AU2003300771A1
公开(公告)日:2004-05-25
申请号:AU2003300771
申请日:2003-05-13
Applicant: BREWER SCIENCE INC
Inventor: XU GU , MEADOR JIMMY D , BEHAVE MANDER R , DESHPANDE SHREERAM V , NOWAK KELLY A
IPC: C09D101/00 , C09D129/08 , G02B1/11 , G03F7/09 , H01L21/768
Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
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公开(公告)号:SG11201605469PA
公开(公告)日:2016-08-30
申请号:SG11201605469P
申请日:2015-01-06
Applicant: BREWER SCIENCE INC
Inventor: BAI DONGSHUN , XU GU , BLUMENSHINE DEBBIE
IPC: H01L21/58
Abstract: The invention broadly relates to cyclic olefin polymer bonding compositions and release compositions, to be used independently or together, that enable thin wafer handling during microelectronics manufacturing, especially during a full-wafer mechanical debonding process. The release compositions comprise compositions made from siloxane polymers and copolymers blended in a polar solvent, and that are stable at room temperature for longer than one month. The cyclic olefin polymer bonding compositions provide high thermal stability, can be bonded to fully-treated carrier wafers, can be mechanically or laser debonded after high-temperature heat treatment, and are easily removed with an industrially-acceptable solvent. Wafers bonded according to the invention demonstrate lower overall post-grind stack TTV compared to other commercial bonding materials and can survive 200° C. PECVD processing.
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公开(公告)号:SG2014012512A
公开(公告)日:2014-06-27
申请号:SG2014012512
申请日:2010-03-19
Applicant: BREWER SCIENCE INC
Inventor: TANG TINGJI , XU GU , ZHONG XING-FU , HONG WENBIN , FLAIM TONY D , YESS KIMBERLY , TRICHUR RAMACHANDRAN K
Abstract: New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.
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公开(公告)号:DE60315177T2
公开(公告)日:2008-04-10
申请号:DE60315177
申请日:2003-05-13
Applicant: BREWER SCIENCE INC
Inventor: XU GU , MEADOR JIMMY D , BEHAVE MANDER R , DESHPANDE SHREERAM V , NOWAK KELLY A
IPC: C08F212/08 , C09D101/00 , C09D129/08 , G02B1/11 , G03F7/09 , H01L21/768
Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
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公开(公告)号:DE60315177D1
公开(公告)日:2007-09-06
申请号:DE60315177
申请日:2003-05-13
Applicant: BREWER SCIENCE INC
Inventor: XU GU , MEADOR JIMMY D , BEHAVE MANDER R , DESHPANDE SHREERAM V , NOWAK KELLY A
IPC: C08F212/08 , C09D101/00 , C09D129/08 , G02B1/11 , G03F7/09 , H01L21/768
Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
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公开(公告)号:AT368060T
公开(公告)日:2007-08-15
申请号:AT03809914
申请日:2003-05-13
Applicant: BREWER SCIENCE INC
Inventor: XU GU , MEADOR JIMMY , BEHAVE MANDER , DESHPANDE SHREERAM , NOWAK KELLY
IPC: C08F212/08 , C09D101/00 , C09D129/08 , G02B1/11 , G03F7/09 , H01L21/768
Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
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公开(公告)号:WO0057247A8
公开(公告)日:2001-03-15
申请号:PCT/US0007463
申请日:2000-03-21
Applicant: BREWER SCIENCE INC
Inventor: MEADOR JIM D , NOWAK KELLY A , XU GU
IPC: G03F7/11 , C08F8/00 , C08F220/32 , C08F283/10 , C09D133/06 , G03F7/09 , G03C1/492
CPC classification number: C08F8/00 , C08F283/10 , C09D133/062 , G03F7/091 , C08F20/00 , C08L2666/14 , C08L2666/28
Abstract: Anti-reflective coating compositions having improved etch rate, inter alia, are prepared from certain acrylic polymers and copolymers, such as, glycidyl methacrylate reacted with non-polycyclic carboxylic acid dyes and non-polycyclic phenolic dyes, all light absorbing at a wavelength of 193 nm.
Abstract translation: 具有改善的蚀刻速率的抗反射涂料组合物,特别是由某些丙烯酸聚合物和共聚物制备,例如与非多环羧酸染料和非多环酚类染料反应的甲基丙烯酸缩水甘油酯,所有光在波长193处吸光 纳米。
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