PHOTOSENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATING MATERIAL
    1.
    发明公开
    PHOTOSENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATING MATERIAL 有权
    感光开发商可溶性抗REFLEX涂层材料

    公开(公告)号:EP2841513A4

    公开(公告)日:2016-10-19

    申请号:EP13781341

    申请日:2013-04-22

    CPC classification number: G03F7/091 G03F7/095 H01L21/266

    Abstract: Photosensitive, developer-soluble bottom anti-reflective coatings are described. Compositions and methods of forming the same are also disclosed along with resulting microelectronic structures. The anti-reflective compositions comprise a multi-functional epoxy compound having multiple epoxy moieties pendant therefrom and one or more crosslinkable chromophores bonded thereto. The compounds are dispersed or dissolved in a solvent system with a vinyl ether crosslinker and can be used to create crosslinkable and de-crosslinkable coatings for microelectronics fabrication.

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