公开(公告)号：SG11201404229YA

公开(公告)日：2014-08-28

申请号：SG11201404229Y

申请日：2013-01-17

Applicant: BREWER SCIENCE INC

Inventor： SULLIVAN DANIEL M ,  STROUD CHARLYN ,  DAI JINHUA

IPC: H01L21/31 ,  H01L21/027

Abstract: Nonpolymeric compounds, compositions, and methods for forming microelectronic structures, and the structures formed therefrom are provided. The nonpolymeric compounds are ring-opened, epoxide-adamantane derivatives that comprise at least two epoxy moieties and at least one adamantyl group, along with at least one chemical modification group, such as a chromophore, bonded to a respective epoxy moiety. Anti-reflective and/or planarization compositions can be formed using these compounds and used in lithographic processes, including fabrication of microelectronic structures.

公开(公告)号：WO2009018217A3

公开(公告)日：2009-03-26

申请号：PCT/US2008071357

申请日：2008-07-28

Applicant: BREWER SCIENCE INC ,  SULLIVAN DANIEL M ,  HUANG RUNHUI ,  NEEF CHARLES J ,  DAI JINHUA ,  SWOPE MICHAEL B

Inventor： SULLIVAN DANIEL M ,  HUANG RUNHUI ,  NEEF CHARLES J ,  DAI JINHUA ,  SWOPE MICHAEL B

IPC: G03F7/11 ,  C08F212/04 ,  C08F220/10 ,  C08F236/06 ,  G03F7/16

CPC classification number: G03F7/091 ,  C08F212/14 ,  C08F220/14 ,  C08F220/18 ,  C08F220/26 ,  C08F220/34 ,  C08F220/56 ,  C08F226/06 ,  G03F7/11 ,  Y10T428/31678 ,  Y10T428/31855 ,  Y10T428/31935

Abstract: This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalcntly crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.

Abstract translation: 本发明描述了用于平版印刷应用的非共价交联树脂涂料的组合物和方法。 这些材料被设计成在涂覆之后经历改变，从而提供耐溶剂性，并且在某些材料的情况下同时具有水基溶解性。 与共价交联材料相比，非共价相互作用可以更容易地去除这些涂层。 这些类型的材料非常适合沟槽和间隙填充应用，以及抗反射涂层，旋涂碳层和蚀刻掩膜。

公开(公告)号：EP2174189A4

公开(公告)日：2011-01-19

申请号：EP08796726

申请日：2008-07-28

Applicant: BREWER SCIENCE INC

Inventor： SULLIVAN DANIEL M ,  HUANG RUNHUI ,  NEEF CHARLES J ,  DAI JINHUA ,  SWOPE MICHAEL B

IPC: G03F7/11 ,  C08F212/04 ,  C08F220/10 ,  C08F236/06 ,  G03F7/16

CPC classification number: G03F7/091 ,  C08F212/14 ,  C08F220/14 ,  C08F220/18 ,  C08F220/26 ,  C08F220/34 ,  C08F220/56 ,  C08F226/06 ,  G03F7/11 ,  Y10T428/31678 ,  Y10T428/31855 ,  Y10T428/31935

Abstract: This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.

公开(公告)号：EP2841513A4

公开(公告)日：2016-10-19

申请号：EP13781341

申请日：2013-04-22

Applicant: BREWER SCIENCE INC

Inventor： LOWES JOYCE ,  DAI JINHUA ,  GUERRERO ALICE

IPC: G03F7/09 ,  C09D163/00 ,  G02B1/11

CPC classification number: G03F7/091 ,  G03F7/095 ,  H01L21/266

Abstract: Photosensitive, developer-soluble bottom anti-reflective coatings are described. Compositions and methods of forming the same are also disclosed along with resulting microelectronic structures. The anti-reflective compositions comprise a multi-functional epoxy compound having multiple epoxy moieties pendant therefrom and one or more crosslinkable chromophores bonded thereto. The compounds are dispersed or dissolved in a solvent system with a vinyl ether crosslinker and can be used to create crosslinkable and de-crosslinkable coatings for microelectronics fabrication.

公开(公告)号：EP2805347A4

公开(公告)日：2015-07-22

申请号：EP13738476

申请日：2013-01-17

Applicant: BREWER SCIENCE INC

Inventor： SULLIVAN DANIEL M ,  STROUD CHARLYN ,  DAI JINHUA

IPC: G03F7/09 ,  C07C69/76 ,  C07D303/23

CPC classification number: C09D5/006 ,  C07C69/76 ,  C07C69/94 ,  C07C2603/24 ,  C07C2603/74 ,  C07D303/23 ,  G03F7/091 ,  G03F7/094 ,  G03F7/30 ,  G03F7/40 ,  H01L21/0276 ,  Y10T428/265 ,  Y10T428/31511 ,  Y10T428/31525 ,  Y10T428/31529

Abstract: Nonpolymeric compounds, compositions, and methods for forming microelectronic structures, and the structures formed therefrom are provided. The nonpolymeric compounds are ring-opened, epoxide-adamantane derivatives that comprise at least two epoxy moieties and at least one adamantyl group, along with at least one chemical modification group, such as a chromophore, bonded to a respective epoxy moiety. Anti-reflective and/or planarization compositions can be formed using these compounds and used in lithographic processes, including fabrication of microelectronic structures.