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    3.
    发明专利
    未知

    公开(公告)号：DE60315177T2

    公开(公告)日：2008-04-10

    申请号：DE60315177

    申请日：2003-05-13

    Applicant: BREWER SCIENCE INC

    Inventor： XU GU ,  MEADOR JIMMY D ,  BEHAVE MANDER R ,  DESHPANDE SHREERAM V ,  NOWAK KELLY A

    IPC: C08F212/08 ,  C09D101/00 ,  C09D129/08 ,  G02B1/11 ,  G03F7/09 ,  H01L21/768

    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

    4.
    发明专利
    未知

    公开(公告)号：DE60315177D1

    公开(公告)日：2007-09-06

    申请号：DE60315177

    申请日：2003-05-13

    Applicant: BREWER SCIENCE INC

    Inventor： XU GU ,  MEADOR JIMMY D ,  BEHAVE MANDER R ,  DESHPANDE SHREERAM V ,  NOWAK KELLY A

    IPC: C08F212/08 ,  C09D101/00 ,  C09D129/08 ,  G02B1/11 ,  G03F7/09 ,  H01L21/768

    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

    ANTI-REFLECTIVE COATINGS AND DUAL DAMASCENE FILL COMPOSITIONS COMPRISING STYRENE-ALLYL ALCOHOL COPOLYMERS
    5.
    发明申请
    ANTI-REFLECTIVE COATINGS AND DUAL DAMASCENE FILL COMPOSITIONS COMPRISING STYRENE-ALLYL ALCOHOL COPOLYMERS 审中-公开
    包含苯乙烯 - 烯醇共聚物的抗反射涂层和双层填料组合物

    公开(公告)号：WO2004040369A3

    公开(公告)日：2004-07-08

    申请号：PCT/US0315164

    申请日：2003-05-13

    Applicant: BREWER SCIENCE INC

    Inventor： XU GU ,  MEADOR JIMMY D ,  BHAVE MANDAR R ,  DESHPANDE SHREERAM V ,  NOWAK KELLY A

    IPC: C09D101/00 ,  C09D129/08 ,  G02B1/11 ,  G03F7/09 ,  H01L21/768 ,  C08F12/02 ,  C08F16/36 ,  C08F20/10 ,  C08F212/00

    CPC classification number: H01L21/76808 ,  G02B1/111 ,  G03F7/091 ,  Y10S430/136 ,  Y10S430/151

    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

    Abstract translation: 提供了具有改进流动性能的新型抗反射或填充组合物。 除了苯乙烯 - 烯丙醇聚合物之外，组合物还包含苯乙烯 - 烯丙醇聚合物，优选至少一种其他聚合物（例如纤维素聚合物）。 本发明的组合物可以用于在双镶嵌工艺的后续蚀刻期间保护接触或通孔免于降解。 本发明的组合物也可以用于基底（例如硅晶片）以形成具有高蚀刻速率的抗反射涂层，该蚀刻速率最小化或防止后续光致抗蚀剂曝光和显影期间的反射。

    ANTI-REFLECTIVE COATINGS AND DUAL DAMASCENE FILL COMPOSITIONS COMPRISING STYRENE-ALLYL ALCOHOL COPOLYMERS
    6.
    发明公开
    ANTI-REFLECTIVE COATINGS AND DUAL DAMASCENE FILL COMPOSITIONS COMPRISING STYRENE-ALLYL ALCOHOL COPOLYMERS 有权
    ANREREFLEXBESCHICHTUNGEN UND DAMASCENE-FÜLLZUSAMMENSETZUNGEN，ENTHALTEND STYROL-ALLYLALKOHOL-COPOLYMERE

    公开(公告)号：EP1554322A4

    公开(公告)日：2005-10-05

    申请号：EP03809914

    申请日：2003-05-13

    Applicant: BREWER SCIENCE INC

    Inventor： XU GU ,  MEADOR JIMMY D ,  BHAVE MANDER R ,  DESHPANDE SHREERAM V ,  NOWAK KELLY A

    IPC: C09D101/00 ,  C09D129/08 ,  G02B1/11 ,  G03F7/09 ,  H01L21/768 ,  C08F212/08

    CPC classification number: H01L21/76808 ,  G02B1/111 ,  G03F7/091 ,  Y10S430/136 ,  Y10S430/151

    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

    Abstract translation: 提供了具有改进流动性能的新型抗反射或填充组合物。 除了苯乙烯 - 烯丙醇聚合物之外，组合物还包含苯乙烯 - 烯丙醇聚合物，优选至少一种其他聚合物（例如纤维素聚合物）。 本发明的组合物可以用于在双镶嵌工艺的后续蚀刻期间保护接触或通孔免于降解。 本发明的组合物也可以用于基底（例如硅晶片）以形成具有高蚀刻速率的抗反射涂层，该蚀刻速率最小化或防止后续光致抗蚀剂曝光和显影期间的反射。

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