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公开(公告)号：DE69229647T2
公开(公告)日：1999-12-16
申请号：DE69229647
申请日：1992-01-10
Applicant: CANON KK
Inventor： KITAOKA ATSUSHI , SAITOH KENJI
IPC: G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30
Abstract: A method of aligning a mask and a wafer is disclosed, wherein the method includes a step for providing the mask with first and second patterns each having an optical power and providing the wafer with first and second marks each having an optical power, wherein the first pattern and the first mark are cooperable with each other to produce, in response to irradiation of a radiation beam, a first beam which is displaceable at a first magnification with a positional deviation of the wafer with respect to the mask, and wherein the second pattern and the second mark are cooperable with each other to produce, in response to irradiation of a radiation beam, a second beam which is displaceable at a second magnification, larger than the first magnification, with a positional deviation of the wafer with respect to the mask; a first detecting step for projecting a radiation beam to the mask, whereby the first beam is produced through cooperation of the first pattern and the first mark, and for detecting a positional deviation of the wafer with respect to the mask on the basis of the first beam; a first aligning step for preparatively aligning the wafer with the mask in accordance with the detection by the first detecting step; a second detecting step for projecting, after the first aligning step, a radiation beam to the mask whereby the second beam is produced through cooperation of the second pattern and the second mark, and for detecting a residual positional deviation of the wafer with respect to the mask on the basis of the second beam; and a second aligning step for precisely aligning the wafer with the mask in accordance with the detection by the second detection step.
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公开(公告)号：DE69229647D1
公开(公告)日：1999-09-02
申请号：DE69229647
申请日：1992-01-10
Applicant: CANON KK
Inventor： KITAOKA ATSUSHI , SAITOH KENJI
IPC: G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30
Abstract: A method of aligning a mask and a wafer is disclosed, wherein the method includes a step for providing the mask with first and second patterns each having an optical power and providing the wafer with first and second marks each having an optical power, wherein the first pattern and the first mark are cooperable with each other to produce, in response to irradiation of a radiation beam, a first beam which is displaceable at a first magnification with a positional deviation of the wafer with respect to the mask, and wherein the second pattern and the second mark are cooperable with each other to produce, in response to irradiation of a radiation beam, a second beam which is displaceable at a second magnification, larger than the first magnification, with a positional deviation of the wafer with respect to the mask; a first detecting step for projecting a radiation beam to the mask, whereby the first beam is produced through cooperation of the first pattern and the first mark, and for detecting a positional deviation of the wafer with respect to the mask on the basis of the first beam; a first aligning step for preparatively aligning the wafer with the mask in accordance with the detection by the first detecting step; a second detecting step for projecting, after the first aligning step, a radiation beam to the mask whereby the second beam is produced through cooperation of the second pattern and the second mark, and for detecting a residual positional deviation of the wafer with respect to the mask on the basis of the second beam; and a second aligning step for precisely aligning the wafer with the mask in accordance with the detection by the second detection step.
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公开(公告)号：JP2001351842A
公开(公告)日：2001-12-21
申请号：JP2000168136
申请日：2000-06-05
Applicant: CANON KK
Inventor： INE HIDEKI , SUZUKI TAKEHIKO , KITAOKA ATSUSHI
Abstract: PROBLEM TO BE SOLVED: To detect a position highly precisely and stably regardless of reflectance change of an observation object. SOLUTION: Illumination light which is made incoherent and illuminates a pattern surface on an observation object by using coherent light, and reference light which is made incoherent are formed, a light amount of reference light is dimmed corresponding to reflectance of a pattern surface, reflection light from a pattern surface and reference light are combined and imaged on a photoelectric conversion element and a pattern position is measured from the imaged interference image signal.
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公开(公告)号：JP2002299221A
公开(公告)日：2002-10-11
申请号：JP2001103635
申请日：2001-04-02
Applicant: CANON KK
Inventor： KITAOKA ATSUSHI
Abstract: PROBLEM TO BE SOLVED: To provide an X-ray aligner which enhances the utilization efficiency of the total radiation energy of X-rays, more than that of the conventional one. SOLUTION: The aligner comprises a point source X-ray source 101; a first to third collimators 110-130 for changing at least either the angle or the intensity of X-rays generated by the X-ray source 101; a means for moving at least one of a first to third masks 113-133 or one of first to third wafers 114-134; a first aligner unit 119 for transferring a pattern of the first mask 113 to the first wafer 114 using the X-rays radiated from the first collimator 110; a second aligner unit 129 for transferring a pattern of the second mask 123 to the second wafer 124, using the X-rays radiated from the second collimator 120; and a third aligner unit 139 for transferring a pattern of the third mask 133 to the third wafer 134, using the X-rays radiated from the third collimator 130.
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公开(公告)号：JPH07272997A
公开(公告)日：1995-10-20
申请号：JP5649294
申请日：1994-03-28
Applicant: CANON KK
Inventor： KITAOKA ATSUSHI , KUNO MITSUTOSHI , MARUMO KOJI
IPC: H01L21/677 , G03F7/20 , H01L21/027 , H01L21/683 , H01L21/68
Abstract: PURPOSE:To reduce power consumption during service interruption by using a pump having at least necessary evacuating performance. CONSTITUTION:The vacuum suction operation of a wafer chuck 4 and wafer hand 10 is driven by both a main pump 15 and backup pump 58. Their evacuating performance depends on the size of wafer, coefficient of friction on the suction surface, resistance of throttle valve, distance between the chuck 4 and hand 10 at the time of delivery of the wafer 5, etc. Present example necessitates a vacuum suction performance enough to evacuate up to a lower pressure by 100Torr than that within a stage housing chamber 1. However, the delivery operation for the wafer 5 is stopped during service interruption, so the evacuating performance of the pump 58 is set as to generate a lower pressure by 20Torr than that within the chamber 1. Therefore, the power consumption during service interruption can be reduce.
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Patent Agency Ranking
公开(公告)号：JPH07191757A
公开(公告)日：1995-07-28
申请号：JP34783393
申请日：1993-12-24
Applicant: CANON KK
Inventor： KITAOKA ATSUSHI , KUROSAWA HIROSHI
IPC: G03F9/00 , B23Q15/013 , G03F7/20 , G05B23/02 , G05D3/00 , H01L21/027 , H01L21/68
Abstract: PURPOSE:To prevent the moving body of a positioning stage device from colliding against a supporting frame. CONSTITUTION:A Y stage 2 is moved upward and downward in the supporting frame 1 by a Y motor driven cylinder 5. When the Y stage 2 comes near to the ceiling surface 1b or the bottom surface 1c of the supporting frame l, the position of the Y state 2 is detected by a distance sensor 10a or 10b, and the moving speed of the Y stage is detected from this detected value. The permissible value of the moving speed at the position is calculated on the basis of the detected position of the Y state 2 and its moving speed, and if it is below the detected moving speed, an abnormality signal is generated, and the driving of the Y motor driven cylinder 5 is stopped, and simultaneously, a dynamic brake is actuated.
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公开(公告)号：JPH04236442A
公开(公告)日：1992-08-25
申请号：JP1687391
申请日：1991-01-18
Applicant: CANON KK
Inventor： KITAOKA ATSUSHI , KUNO MITSUTOSHI
IPC: H01L21/66
Abstract: PURPOSE:To detect an orientation flat with high accuracy by a method wherein the position of an edge is measured while a semiconductor wafer is turned at a uniform speed. CONSTITUTION:A semiconductor wafer 1 is placed on a chuck 2 for orientation- flat detection use; said chuck 2 for orientation-flat detection use is turned, by using a theta-stage 3 for orientation-flat detection use, at a uniform speed by at least a one-turn portion of the peripheral edge of said semiconductor wafer 1. While it is turned at the uniform speed, the peripheral edge part of the semiconductor wafer is irradiated with light which is emitted by a light-emitting diode 6. The image of the peripheral edge part is formed by using a line sensor 7. A stored charge at said line sensor 7 is extracted. The position of an edge covering one circumference of the peripheral edge of the semiconductor wafer 1 is measured on the basis of said stored charge. An orientation flat is detected from the position of the edge.
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公开(公告)号：JPH0566109A
公开(公告)日：1993-03-19
申请号：JP2051492
申请日：1992-01-09
Applicant: CANON KK
Inventor： KITAOKA ATSUSHI , SAITO KENJI
IPC: G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30
Abstract: PURPOSE:To allow highly precise positioning by receiving a rough detecting means and a fine detecting means in the same pickup head. CONSTITUTION:Rough and fine alignment projecting system and light receiving system sensors for transverse deviation detecting system and interval detecting system are integrated into an alignment pickup head 24. The optical beam emitted from the head 24 is projected onto an evaluation mark setting part on a mask 1 and a wafer 2, reflected or diffracted thereby, and emitted again to the head 24. A stage control part 22 drives a stage 21 at the time of starting alignment and interval control to conduct the position movement for the lighting and detection of the mark 20 on the mask 1 and the waver 2. The optical beam emitted from the mark 20 is divided into two light fluxes by a detecting lens 36, entered to light receiving elements 38, 39 to form rough and fine alignment signals, performing transverse deviation and space measurements.
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公开(公告)号：JP2001103370A
公开(公告)日：2001-04-13
申请号：JP27680599
申请日：1999-09-29
Applicant: CANON KK
Inventor： KITAOKA ATSUSHI
Abstract: PROBLEM TO BE SOLVED: To solve a problem that a conventional image pickup device have had a different light receiving time depending on lines. SOLUTION: The image pickup device employing imaging devices arranged two-dimensionally that store image signals for a prescribed storage time and read the stored image signals by each line, adopts lines #5-#10, from which data are read, that are a part of total lines and sets the start of a lighting period of a light source to form the image signals to be the same as the start of storage of the line #10 designated among the lines #5-#10.
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公开(公告)号：JPH11327652A
公开(公告)日：1999-11-26
申请号：JP13924198
申请日：1998-05-07
Applicant: CANON KK
Inventor： KITAOKA ATSUSHI , MATSUI SHIN
IPC: H01L21/68 , G03F7/20 , G05D3/12 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To prevent the positioning error due to the disturbance of a coarse movement stage among positioning errors by performing correction driving of coarse movement and fine movement stages when an output of a fine movement stage drive quantity detecting means becomes a prescribed value when neither the coarse movement nor fine movement stage moves and is driven. SOLUTION: When neither coarse movement nor fine movement stage moves and is driven, a laser interference device 112 as a fine movement stage drive quantity detecting means detects the position of an object on a fine movement stage and inputs this detection output to an interference device controller 113. The controller 113 outputs range data S107 by the interference device to a servo controller 108 and the controller 108 outputs a drive pulse to a fine movement controller 109 so that the data S107 that is feedbacked can be a prescribed target value. When it becomes the prescribed target value with the drive pulse, the coarse movement and fine movement stages are subjected to correction driving.
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