公开(公告)号：DE68927146T2

公开(公告)日：1997-02-06

申请号：DE68927146

申请日：1989-09-29

Applicant: CANON KK

Inventor： MATSUI SHIN ,  KARIYA TAKAO ,  MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  H01L21/677 ,  H01L21/68

公开(公告)号：DE60142862D1

公开(公告)日：2010-09-30

申请号：DE60142862

申请日：2001-03-09

Applicant: CANON KK

Inventor： MATSUI SHIN

IPC: H01L21/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H01L21/683 ,  H01L21/687

公开(公告)号：DE60136119D1

公开(公告)日：2008-11-27

申请号：DE60136119

申请日：2001-03-09

Applicant: CANON KK

Inventor： MATSUI SHIN

IPC: H01L21/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H01L21/683 ,  H01L21/687 ,  H02N13/00

Abstract: A semiconductor substrate holding device comprises a base member (1) capable of removably holding a plate (2) having a contact member (7) adapted to come into contact with a semiconductor substrate(3) and a sensor arranged to identify an identification sign provided on said plate (2). A controller (21) is arranged to select the plate based on an identification signal from said sensor, and the controller is arranged to select said plate based on information on type of said substrate.

公开(公告)号：DE69727112T2

公开(公告)日：2004-07-08

申请号：DE69727112

申请日：1997-10-23

Applicant: CANON KK

Inventor： TERASHIMA SHIGERU ,  MURAKI MASATO ,  OKUNUKI MASAHIKO ,  MIYAKE AKIRA ,  MATSUI SHIN

IPC: H01J37/317 ,  H01J37/30 ,  H01L21/30 ,  H01J37/302 ,  H01J37/304

Abstract: An electron beam exposure apparatus for projecting an image formed by electron beams onto a wafer (114) via a reduction electron optical system (108), irradiates collimated electron beams toward an aperture board (104) having an arcuated aperture (201) sandwiched between two arcs having, as the center, the axis of the reduction electron optical system (108), and exposes the wafer (114) with electron beams having an arcuated sectional shape that have been transmitted through the aperture (201).

公开(公告)号：DE69727112D1

公开(公告)日：2004-02-12

申请号：DE69727112

申请日：1997-10-23

Applicant: CANON KK

Inventor： TERASHIMA SHIGERU ,  MURAKI MASATO ,  OKUNUKI MASAHIKO ,  MIYAKE AKIRA ,  MATSUI SHIN

IPC: H01J37/317 ,  H01J37/30 ,  H01L21/30 ,  H01J37/302 ,  H01J37/304

Abstract: An electron beam exposure apparatus for projecting an image formed by electron beams onto a wafer (114) via a reduction electron optical system (108), irradiates collimated electron beams toward an aperture board (104) having an arcuated aperture (201) sandwiched between two arcs having, as the center, the axis of the reduction electron optical system (108), and exposes the wafer (114) with electron beams having an arcuated sectional shape that have been transmitted through the aperture (201).

公开(公告)号：DE68927146D1

公开(公告)日：1996-10-17

申请号：DE68927146

申请日：1989-09-29

Applicant: CANON KK

Inventor： MATSUI SHIN ,  KARIYA TAKAO ,  MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  H01L21/677 ,  H01L21/68

公开(公告)号：JPH10281110A

公开(公告)日：1998-10-20

申请号：JP10401797

申请日：1997-04-08

Applicant: CANON KK

Inventor： MATSUI SHIN

IPC: F15B15/14 ,  G05D3/00 ,  H02N15/00

Abstract: PROBLEM TO BE SOLVED: To suppress a stick slip phenomenon extremely by constituting in a noncontact state at least either a piston block and a cylinder tube or a cylinder tube and a slider. SOLUTION: Force is generated in a direction opposed to polarizing force of a radial direction by pressure of air injected from an air bearing pad 111 to as to balance inquiry force of both magnet trains with each other with an optimal clearance without being brought into contact both magnet trains with a cylinder tube. Both magnet trains are connected to each other magnetically without being brought into contact with each other mechanically. Since the connecting relation between thrust directions of a piston 103 and a movable part 108 is only magnetic rigidity without friction, the movable part 108 on which nonlinear disturbance is not applied is formed. In a stage device in which positioning having high accuracy is demanded, an actuator such as linear motor is used at the same time.

公开(公告)号：JPH10172879A

公开(公告)日：1998-06-26

申请号：JP32677096

申请日：1996-12-06

Applicant: CANON KK

Inventor： MATSUI SHIN ,  MURAKI MASATO ,  TERAJIMA SHIGERU ,  MIYAKE AKIRA ,  OKUNUKI MASAHIKO

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To improve the throughput by using an arcuate electron beam, means for correcting the aberration of the electron beam and means for scanning a wafer and mask. SOLUTION: A light 2 from an optical source or sec. optical source 1 enters an aperture 4 by an illuminating optical system 3. The aperture 4 cuts the light into an arcuate region and guides it to a mask 5 having light-transmitting and -opaque parts. The mask 5 is irradiated with the light having the arcuate illuminating region to project a pattern of the mask on a photoelectric conversion plane PE through a projection optical system PL. A photoelectric converter member composed of this conversion plane PE and light-transmitting member S radiates an electron beam according to the pattern image on the mask 5. This beam is accelerated by accelerating electrodes to form an image on a wafer 14 through a reduced electron-optical system where the beam aberration is corrected by an aberration correcting optical system 7.

公开(公告)号：JPH09275062A

公开(公告)日：1997-10-21

申请号：JP10480596

申请日：1996-04-03

Applicant: CANON KK

Inventor： MATSUI SHIN ,  CHIBA YUJI ,  TANAKA YUTAKA

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To suppress runout error or exposuring inequality by supporting an alignment measuring part which performs position adjusting measurement of a wafer and a mask, a position measuring means of a wafer stage part and the mask by a different supporting system from a stepper main body, even if each X-ray axis side and an aligner main unit slip out of positions. SOLUTION: An auto-alignment unit 139 is supported by an AA frame 143 and is provided on an AA tilt stage which can be driven to a rotating direction around an axis of two axes perpendicularly crossing an exposuring axis and on an AA stage 156 which can be transferred to the two-axis directions crossing exposureing light axis and to the rotating direction around the X-ray axis via an AA fixing member 157. A laser interference meter 148 which is a position measuring means for a wafer six-axis stage 142 is fixed with interference meter fixing member 158 which is expanding member of AA fixing member 157, a mask 123 is supported by a mask fastener and is composed of a different supporting system from an aligner main unit 109 used as a stepper.

公开(公告)号：JPH07142559A

公开(公告)日：1995-06-02

申请号：JP23237593

申请日：1993-08-25

Applicant: CANON KK

Inventor： CHIBA YUJI ,  MARUMO KOJI ,  MATSUI SHIN ,  HARA SHINICHI ,  MIZUSAWA NOBUTOSHI ,  IWAMOTO KAZUNORI ,  TANAKA YUTAKA ,  KUROSAWA HIROSHI

IPC: B23Q3/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  H01L21/68

Abstract: PURPOSE:To realize a substrate holder not only capable of ensuring sufficient suction force even in a decompression chamber but also capable of miniaturizing a mechanism rolling a substrate and an exposure device using the substrate holder. CONSTITUTION:A bearing 1b supported to a baseplate 1 rotatably supports a rotor 3 unified with a first suction plate 4, and the rotor 3 is rotated by a DC servomotor 7. A second suction plate 6 arranged outside the first suction plate 4 is supported to the baseplate 1 through a double acting cylinder 5. The second suction plate is retreated by the double acting cylinder 5, and the central section of a substrate is sucked onto the first suction plate 4. The positional displacement of the substrate is detected, the DC servomotor 7 is driven, the first suction plate 4 is turned, the positional displacement of the substrate is removed, the double acting cylinder 5 is driven, the second suction plate 6 is moved forward, and the outer circumferential section of the substrate is sucked.