METHOD OF MANUFACTURING SUBSTRATE FOR LIQUID DISCHARGE HEAD
    2.
    发明公开
    METHOD OF MANUFACTURING SUBSTRATE FOR LIQUID DISCHARGE HEAD 审中-公开
    一种用于生产基板的液体排出头

    公开(公告)号:EP2473354A4

    公开(公告)日:2014-03-26

    申请号:EP10813596

    申请日:2010-07-29

    Applicant: CANON KK

    Abstract: Provided is a method of manufacturing a substrate for a liquid discharge head including a first face, energy generating elements which generate the energy to be used to discharge a liquid to a second face opposite to the first face, and liquid supply ports for supplying the liquid to the energy generating elements. The method includes preparing a silicon substrate having, at the first face, an etching mask layer having an opening corresponding to a portion where the liquid supply ports are to be formed, and having first recesses provided within the opening, and second recesses provided in the region of the second face where the liquid supply ports are to be formed, the first recesses and the second recesses being separated from each other by a portion of the substrate; and etching the silicon substrate by crystal anisotropic etching from the opening of the first face to form the liquid supply ports.

    4.
    发明专利
    未知

    公开(公告)号:DE69826769T2

    公开(公告)日:2006-03-09

    申请号:DE69826769

    申请日:1998-07-02

    Applicant: CANON KK

    Abstract: A method for manufacturing an orifice plate used for a liquid discharge provided with discharge port for discharging liquid comprises the steps of preparing a non-conductive plate having recessed portion formed on the circumference of the flat portion corresponding to the discharge port, forming a first conductive material peelable from the non-conductive plate only in the recessed portion of the non-conductive plate, forming a plate member by plating the first conductive material with a second conductive material by electroforming method after the formation of the first conductive material, and obtaining the orifice plate having the discharge port by peeling off the plate member from the non-conductive plate. With the method thus arranged, it is possible to materialize the same precision as in the glass mask used for photolithography, and make the variation of orifice areas smaller for the formation of highly densified orifices.

    5.
    发明专利
    未知

    公开(公告)号:DE69815470T2

    公开(公告)日:2004-01-15

    申请号:DE69815470

    申请日:1998-11-13

    Applicant: CANON KK

    Abstract: An ink jet recording head is provided with a heat-generating resistance layer for generating thermal energy used for ink discharge, and a wiring electrode layer electrically connected to the heat-generating resistance layer, also provided on a substrate with an electro-thermal converting element, an insulating protective layer covering the electro-thermal converting element, and an external electrical connection portion electrically connected to the electro-thermal converting element and to be adhered to an external wiring for applying a voltage to the electro-thermal converting element. Further, the external electrical connection portion is formed by a film grown by electroless plating from the wiring electrode layer through a through hole formed in the insulating protective layer.

    7.
    发明专利
    未知

    公开(公告)号:AT208275T

    公开(公告)日:2001-11-15

    申请号:AT96302614

    申请日:1996-04-15

    Applicant: CANON KK

    Abstract: A liquid ejecting head for ejecting a liquid by generation of a bubble, comprises a first liquid flow path in fluid communication with an ejection outlet, a second liquid flow path having a heat generating element for applying heat to the liquid to generate a bubble in said liquid, and a supply path for supplying the liquid to above said heat generating element from an upstream side of said heat generating element in a direction along said heat generating element, a movable member disposed as facing the heat generating element, displaced to a side of said first liquid flow path, based on a pressure generated when said heat generating element is driven, and having a free end, and a guide path for flowing the liquid above said heat generating element in said second liquid flow path.

    8.
    发明专利
    未知

    公开(公告)号:DE69330199D1

    公开(公告)日:2001-06-13

    申请号:DE69330199

    申请日:1993-12-20

    Applicant: CANON KK

    Abstract: An Al layer of wiring material is etched using an alkaline aqueous solution. There are provided a method for producing a thin film resistor, in which only the Al layer can be selectively etched independent of a resistor layer using the alkaline aqueous solution, an anti-sticking means for film-forming apparatus having the structure which can prevent a drop in yield due to particles, even with less frequency of cleaning for a film-forming chamber, and a film-forming apparatus provided with the anti-sticking means. When the wiring electrode layer mainly containing Al is etched by the alkaline aqueous solution, only the Al layer can be selectively etched without etching the resistor layer, which can reduce a change in resistance of resistor, improve the yield and the productivity, and raise the reliability of the thin film resistor. Also, when the anti-sticking means having a tongued-and-grooved surface is set in the film-forming chamber of the film-forming apparatus, the film-forming material is deposited in a discontinuous manner on the anti-sticking means, which can delay the time of film exfoliation, in turn extend the cycle of cleaning for the anti-sticking plate, and prevent the drop in yield due to the film exfoliation.

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