UREA RESIN COMPOSITION FOR FLOOR AND METHOD FOR APPLYING THE SAME

    公开(公告)号:JP2004256601A

    公开(公告)日:2004-09-16

    申请号:JP2003046659

    申请日:2003-02-25

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To obtain a resin material for floors which is satisfactory in solvent resistance, chemical resistance, water resistance, curability, scratch resistance, and workability. SOLUTION: The subject method for applying a urea resin composition comprises collision-mixing a coating material (A) comprising an isocyanate with a coating material (B) containing a bis(N-alkylaminocyclohexyl)methane in an NCO/NH ratio of 0.8 to 1.4 under conditions in which the viscosity difference between the coating material (A) and the coating material (B) is at most 500 cPs, spraying the mixture onto the floor, and reacting and curing it thereon. COPYRIGHT: (C)2004,JPO&NCIPI

    METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT

    公开(公告)号:JP2003234473A

    公开(公告)日:2003-08-22

    申请号:JP2002029793

    申请日:2002-02-06

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To provide a method for easily manufacturing an organic semiconductor element having an arbitrary shape. SOLUTION: A method for manufacturing an organic semiconductor element constituted of a gate insulating layer, a gate electrode, a source electrode, a drain electrode, and an organic semiconductor layer includes a process (1) for forming a conductive polymer antecedent monomer layer, a process (2) for holding the monomer layer at a prescribed temperature, and a process (3) for applying oxidizer solution to the desired position of the monomer layer to obtain a polymer layer with desired conductivity. COPYRIGHT: (C)2003,JPO

    セラミックス造形用粉体、セラミックス造形物、およびその製造方法

    公开(公告)号:JP2019019051A

    公开(公告)日:2019-02-07

    申请号:JP2018130952

    申请日:2018-07-10

    Applicant: CANON KK

    Abstract: 【課題】安定した造形が可能で、造形精度が確保された三次元造形物を得ることができるレーザー造形用粉体およびその使用方法を提供する。【解決手段】レーザー光の照射部における粉体を逐次焼結または溶融して凝固させることを繰り返して造形物を得るためのセラミックス造形用粉体であって、前記粉体は複数の組成物を含み、前記組成物の少なくとも1種類の組成物が、他の組成物より前記レーザー光に対し相対的に高い吸収を示す吸収体であり、前記レーザー光の照射により前記吸収体の少なくとも一部が前記レーザー光に対する吸収が相対的に低い他の組成物へ変化することを特徴とする粉体、および前記粉体を使用することを特徴とする粉体の使用方法。【選択図】なし

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