公开(公告)号：GB2147113A

公开(公告)日：1985-05-01

申请号：GB8420726

申请日：1984-08-15

Applicant: CANON KK

Inventor： MATSUKI TOSHIO

IPC: G03B27/54 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/00

Abstract: An exposure apparatus for exposing a wafer to a circuit pattern formed on a reticle. The exposure apparatus includes a reticle stage for holding the reticle, a wafer stage for holding the wafer, a projection optical system for projecting the image of the circuit pattern onto the wafer, an illumination system for illuminating the reticle, the illumination system having a light source for providing an illumination light beam and optical elements for guiding the illumination light beam along an illumination light path, and a stop disposed in the illumination light path and at a position which is optically conjugate, with respect to the optical elements, with a plane in which the circuit pattern is placed, to intercept a part of the illumination light so that the area of the reticle which is not used for the pattern transfer is shielded from the illumination light without disposing any element in contact with or in the proximity of the reticle.

公开(公告)号：DE2419675A1

公开(公告)日：1974-11-21

申请号：DE2419675

申请日：1974-04-24

Applicant: CANON KK

Inventor： KOBAYASHI TATSUMI ,  ITO TADASHI ,  KAMEI YOSHIHIDE ,  ODA TERUHISA ,  MATSUKI TOSHIO

IPC: C23C14/04 ,  B05D5/02 ,  B05D5/06 ,  C08J7/00 ,  C08J7/04 ,  C23C18/16 ,  C23C18/22 ,  C23C18/34 ,  C23C18/40 ,  C23C18/44 ,  C23C18/52 ,  C23C3/02

公开(公告)号：GB2147113B

公开(公告)日：1988-05-18

申请号：GB8420726

申请日：1984-08-15

Applicant: CANON KK

Inventor： MATSUKI TOSHIO

IPC: G03B27/54 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/00

Abstract: An exposure apparatus for exposing a wafer to a circuit pattern formed on a reticle. The exposure apparatus includes a reticle stage for holding the reticle, a wafer stage for holding the wafer, a projection optical system for projecting the image of the circuit pattern onto the wafer, an illumination system for illuminating the reticle, the illumination system having a light source for providing an illumination light beam and optical elements for guiding the illumination light beam along an illumination light path, and a stop disposed in the illumination light path and at a position which is optically conjugate, with respect to the optical elements, with a plane in which the circuit pattern is placed, to intercept a part of the illumination light so that the area of the reticle which is not used for the pattern transfer is shielded from the illumination light without disposing any element in contact with or in the proximity of the reticle.

公开(公告)号：DE3430752A1

公开(公告)日：1985-03-14

申请号：DE3430752

申请日：1984-08-21

Applicant: CANON KK

Inventor： MATSUKI TOSHIO

IPC: G03B27/54 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: An exposure apparatus for exposing a wafer to a circuit pattern formed on a reticle. The exposure apparatus includes a reticle stage for holding the reticle, a wafer stage for holding the wafer, a projection optical system for projecting the image of the circuit pattern onto the wafer, an illumination system for illuminating the reticle, the illumination system having a light source for providing an illumination light beam and optical elements for guiding the illumination light beam along an illumination light path, and a stop disposed in the illumination light path and at a position which is optically conjugate, with respect to the optical elements, with a plane in which the circuit pattern is placed, to intercept a part of the illumination light so that the area of the reticle which is not used for the pattern transfer is shielded from the illumination light without disposing any element in contact with or in the proximity of the reticle.

公开(公告)号：JPH10127035A

公开(公告)日：1998-05-15

申请号：JP29457196

申请日：1996-10-16

Applicant: CANON KK

Inventor： KAMATA SHIGETO ,  MATSUKI TOSHIO

IPC: G03F9/00 ,  B23Q5/28 ,  H01L21/027 ,  H01L21/68 ,  H02K9/00 ,  H02K41/02

Abstract: PROBLEM TO BE SOLVED: To prevent eddy current or other problem from appearing in a cooling jacket for cooling coils of a linear motor and then lowering a driving efficiency. SOLUTION: A moving member 41 of a Y linear motor 40 of a wafer stage is a hollow frame having a pair of magnets 41a which face each other and an opening to pass a stator 41 through. The stator 42 has a row of coils 42a housed in a cooling jacket 42. Each of the coils 42a is cooled boy a refrigerant which flows in a channel 42d of the cooling jacket 42b. By forming the cooling jacket 42b from an insulator such as ceramic, and eddy current is prevented.

公开(公告)号：JPS54116946A

公开(公告)日：1979-09-11

申请号：JP2382478

申请日：1978-03-02

Applicant: CANON KK

Inventor： SHIRAI NAOKI ,  MATSUKI TOSHIO

IPC: C03C17/32 ,  G02B3/00

Abstract: PURPOSE:To omit the special manual paint scraping step by providing the step of applying a shielding paint to the edge of a lens before the final lens polishing step so that the paint blotting the lens sides is removed by the subsequent scraping polishment. CONSTITUTION:A black shielding paint such as a paint of an epoxyresin or a paint of two-liquid urethane type is sprayed to the edge of the lens which has been subjected to the molding and rough rubbing treatments, and the lens thus prepared is polished after heated and dried. Thus, it is possible to easily remove the paint blotting the lens sides while shortening the working time.

公开(公告)号：JPH0618165B2

公开(公告)日：1994-03-09

申请号：JP1217486

申请日：1986-01-24

Applicant: CANON KK

Inventor： MATSUKI TOSHIO ,  YAMAMURA MITSUGI

IPC: H01L21/30 ,  G03F7/20 ,  H01L21/027

公开(公告)号：JPS62171123A

公开(公告)日：1987-07-28

申请号：JP1217486

申请日：1986-01-24

Applicant: CANON KK

Inventor： MATSUKI TOSHIO ,  YAMAMURA MITSUGI

IPC: H01L21/30 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To enable the alteration of focal depth and the fine adjustment of image formation characteristics of an image contrast and the like, by making variable the stops of both illumination optical system and projection optical system, and by changing the respective numerical apertures of these optical systems as desired. CONSTITUTION:A local remote selection switch 91 provided on a stop control unit 9 is switched over onto the remote side, and a necessary NA value is keyed in by an input keyboard 71 of a console 7. Then the NA value is stored in a memory 72 of the console 7 and transmitted to a control box 8. The value is converted by a main body control CPU 81 into an instruction voltage for driving a stop mechanism which corresponds to the NA value, and it is inputted to driving circuits 54 and 34 to drive actuators 52 and 32. Actual amounts of driving are fed back to the driving circuits 54 and 34 by the respective detection sensors 53 and 33 of an illumination optical system 5 and a projection optical system 3, and stops are positioned on the basis of these amounts. Fine image formation performance such as an image contrast can also be obtained by controlling stop diameters of both the projection optical system and the illumination optical system and by varying a value of sigma which i defined by sigma=NA of illumination optical system/NA of projection lens.

公开(公告)号：JPS6045252A

公开(公告)日：1985-03-11

申请号：JP15247483

申请日：1983-08-23

Applicant: CANON KK

Inventor： MATSUKI TOSHIO

IPC: G03B27/54 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To execute completely light shielding of an area except a pattern of a reticle by an illuminating system formed by placing a light shielding means on an optically conjugate surface to a circuit pattern surface of the reticle. CONSTITUTION:A light shielding device is placed to that its light shielding surface A becomes a relation to a pattern surface B of a reticle 22 by condenser lenses 19, 21, can be interlocked and turned with a rotation of the reticle 22 in order to align a rotating direction with a wafer which is placed and exposed under the reticle, by a driving mechanism, and also can be moved in the optical axis direction in order to maintain said conjugate relation, in case when the reticle 22 is replaced with a reticle which is different in thickness of its transparent part of glass, etc., and its refractive power is varied.

公开(公告)号：JP2002010618A

公开(公告)日：2002-01-11

申请号：JP2000181254

申请日：2000-06-16

Applicant: CANON KK

Inventor： MATSUKI TOSHIO

IPC: G12B5/00 ,  G03F7/20 ,  H01L21/027 ,  H02K9/19 ,  H02K41/02

Abstract: PROBLEM TO BE SOLVED: To provide a stage device and an exposure device which use a linear motor which eliminates an influence on a positioning accuracy, thermal deformation of structure, measurement error of a laser interferometer and the like by suppressing heating of coil of linear motor, and the manufacturing method and the like of the devices. SOLUTION: In the linear motor which has a coil and a jacket which covers the coil and of which internal space a coolant is supplied, the jacket has a structure of a double jacket consisting of inside jacket sheets 4, 4' and outside jacket sheets 7, 7'. Heat generated from the coil 1 is conducted to the inside jacket sheets 4, 4' by closely fixing the inside jacket sheets 4, 4' and the coil 1, and the heat generated from the coil 1 is released outside by the coolant flowing through the double jacket.